Yusuke Shimizu

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Nirasaki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma treatment device
- Patent number 11,011,386
- Issue date May 18, 2021
- Tokyo Electron Limited
- Yusuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,672,622
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Yusuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method for silicon nitride film
- Patent number 8,679,985
- Issue date Mar 25, 2014
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DETECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030012
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEASONING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030014
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20210074550
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190067031
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Yusuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD FOR SILICON NITRIDE FILM
- Publication number 20100197143
- Publication date Aug 5, 2010
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS