Yusuke Yoshida

Person

Guilderland, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for gate stack formation and etching
- Patent number 12,009,430
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-containing liner process
- Patent number 11,699,741
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 11,398,386
- Issue date Jul 26, 2022
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion mass separation and ion energy control in process pl...
- Patent number 10,998,170
- Issue date May 4, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to protect nitride layers during formation of silicon germa...
- Patent number 10,903,077
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for stability monitoring and improvements to plasma sources...
- Patent number 10,818,482
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of plasma discharge ignition to reduce surface pa...
- Patent number 10,818,502
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Etching Features in a Layer in a Substrate
- Publication number 20240234158
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Indroneil Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Conductive Material Deposition
- Publication number 20240178003
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu Aizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Containing Liner Process
- Publication number 20220384607
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES
- Publication number 20200273711
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR STABILITY MONITORING AND IMPROVEMENTS TO PLASMA SOURCES...
- Publication number 20200105510
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...
- Publication number 20200027736
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Controlling Ion Energy Distribution in Pro...
- Publication number 20190318913
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Ion Mass Separation and Ion Energy Control in Process Pl...
- Publication number 20190318916
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHODS TO REDUCE SURFACE PARTICLE IMPURITIES AFTER A...
- Publication number 20180323045
- Publication date Nov 8, 2018
- TOKYO ELECTRON LIMITED
- Jason Marion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA DISCHARGE IGNITION TO REDUCE SURFACE PARTICLES
- Publication number 20180144946
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS

Yusuke Yoshida

Person

Patents Grantslast 30 patents

Method for gate stack formation and etching

Metal-containing liner process

Plasma etch processes

Method for ion mass separation and ion energy control in process pl...

Methods to protect nitride layers during formation of silicon germa...

Methods for stability monitoring and improvements to plasma sources...

System and method of plasma discharge ignition to reduce surface pa...

Patents Applicationslast 30 patents

Method for Etching Features in a Layer in a Substrate

Method of Conductive Material Deposition

Metal-Containing Liner Process

PLASMA ETCH PROCESSES

METHODS FOR STABILITY MONITORING AND IMPROVEMENTS TO PLASMA SOURCES...

METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...

Apparatus and Method for Controlling Ion Energy Distribution in Pro...

Method for Ion Mass Separation and Ion Energy Control in Process Pl...

MANUFACTURING METHODS TO REDUCE SURFACE PARTICLE IMPURITIES AFTER A...

METHOD OF PLASMA DISCHARGE IGNITION TO REDUCE SURFACE PARTICLES