Yutaka ADEGAWA

Person

Minami-Ashigara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Optical film, polarizing plate, and image display device
- Patent number 10,459,290
- Issue date Oct 29, 2019
- FUJIFILM Corporation
- Yoshiaki Hisakado
- B32 - LAYERED PRODUCTS
Information Patent Grant
Insulating film, process for producing the same and electronic devi...
- Patent number 8,216,647
- Issue date Jul 10, 2012
- FUJIFILM Corporation
- Yutaka Adegawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Film-forming composition, insulating material-forming composition,...
- Patent number 7,501,185
- Issue date Mar 10, 2009
- FUJIFILM Corporation
- Katsuyuki Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming insulating film and process for producing i...
- Patent number 7,320,828
- Issue date Jan 22, 2008
- FUJIFILM Corporation
- Kensuke Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating-film forming material and insulating film using the same
- Patent number 7,268,201
- Issue date Sep 11, 2007
- FUJIFILM Corporation
- Yutaka Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Intermediate layer composition for multilayer resist process, patte...
- Patent number 7,157,205
- Issue date Jan 2, 2007
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Insulating-film forming material and insulating film using the same
- Patent number 7,144,970
- Issue date Dec 5, 2006
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 6,969,577
- Issue date Nov 29, 2005
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative-working resist composition for electron beams or x-rays
- Patent number 6,887,647
- Issue date May 3, 2005
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electron beam or X-ray negative-working resist composition
- Patent number 6,824,948
- Issue date Nov 30, 2004
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition for far ultraviolet exposure
- Patent number 6,794,108
- Issue date Sep 21, 2004
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,773,862
- Issue date Aug 10, 2004
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,746,813
- Issue date Jun 8, 2004
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 6,720,128
- Issue date Apr 13, 2004
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working resist composition
- Patent number 6,673,512
- Issue date Jan 6, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type negative-working resist composition for...
- Patent number 6,528,233
- Issue date Mar 4, 2003
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silver halide photographic material
- Patent number 5,932,406
- Issue date Aug 3, 1999
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particulate photographic polymer
- Patent number 5,795,709
- Issue date Aug 18, 1998
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, K...
- Publication number 20180224579
- Publication date Aug 9, 2018
- FUJIFILM CORPORATION
- Shuntaro IBUKI
- G02 - OPTICS
Information Patent Application
ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, K...
- Publication number 20160091635
- Publication date Mar 31, 2016
- FUJIFILM CORPORATION
- Shuntaro IBUKI
- B08 - CLEANING
Information Patent Application
WAVE LENGTH CONVERSION MEMBER, BACK LIGHT UNIT, LIQUID CRYSTAL DISP...
- Publication number 20150330602
- Publication date Nov 19, 2015
- FUJIFILM CORPORATION
- Takashi YONEMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
- Publication number 20150323824
- Publication date Nov 12, 2015
- FUJIFILM CORPORATION
- Yoshiaki HISAKADO
- G02 - OPTICS
Information Patent Application
HARDCOAT FILM, METHOD FOR FABRICATING HARDCOAT FILM, ANTIREFLECTION...
- Publication number 20140093741
- Publication date Apr 3, 2014
- FUJIFILM CORPORATION
- Kenichi FUKUDA
- G02 - OPTICS
Information Patent Application
INSULATING FILM, PROCESS FOR PRODUCING THE SAME AND ELECTRONIC DEVI...
- Publication number 20110039037
- Publication date Feb 17, 2011
- FUJIFILM CORPORATION
- Yutaka ADEGAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Insulating film, process for producing the same and electronic devi...
- Publication number 20060204664
- Publication date Sep 14, 2006
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Film-forming composition and insulating film and electronic device...
- Publication number 20060205879
- Publication date Sep 14, 2006
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Film-forming composition, insulating material-forming composition,...
- Publication number 20050276964
- Publication date Dec 15, 2005
- Fuji Photo Film Co., Ltd.
- Katsuyuki Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for film formation, coating solution containing the sam...
- Publication number 20050215732
- Publication date Sep 29, 2005
- Fuji Photo Film Co., Ltd.
- Katsuyuki Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming insulating film and process for producing i...
- Publication number 20050182227
- Publication date Aug 18, 2005
- Fuji Photo Film Co., Ltd.
- Kensuke Morita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Intermediate layer composition for multilayer resist process, patte...
- Publication number 20050003299
- Publication date Jan 6, 2005
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Insulating-film forming material and insulating film using the same
- Publication number 20040198855
- Publication date Oct 7, 2004
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Insulating-film forming material and insulating film using the same
- Publication number 20040198922
- Publication date Oct 7, 2004
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Postitive resist composition
- Publication number 20040180288
- Publication date Sep 16, 2004
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Negative resist composition
- Publication number 20030203305
- Publication date Oct 30, 2003
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20030124456
- Publication date Jul 3, 2003
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030039916
- Publication date Feb 27, 2003
- Fuji Photo Film Co., Ltd.
- Yutaka Adegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Negative-working resist composition for electron beams or X-rays
- Publication number 20020192592
- Publication date Dec 19, 2002
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemical amplification type negative-working resist composition for...
- Publication number 20010036590
- Publication date Nov 1, 2001
- Yutaka Adegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Yutaka ADEGAWA

Person

Patents Grantslast 30 patents

Optical film, polarizing plate, and image display device

Insulating film, process for producing the same and electronic devi...

Film-forming composition, insulating material-forming composition,...

Composition for forming insulating film and process for producing i...

Insulating-film forming material and insulating film using the same

Intermediate layer composition for multilayer resist process, patte...

Insulating-film forming material and insulating film using the same

Positive resist composition

Negative-working resist composition for electron beams or x-rays

Electron beam or X-ray negative-working resist composition

Positive photoresist composition for far ultraviolet exposure

Negative resist composition

Negative resist composition

Positive resist composition

Negative-working resist composition

Chemical amplification type negative-working resist composition for...

Silver halide photographic material

Particulate photographic polymer

Patents Applicationslast 30 patents

ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, K...

ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, K...

WAVE LENGTH CONVERSION MEMBER, BACK LIGHT UNIT, LIQUID CRYSTAL DISP...

OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE

HARDCOAT FILM, METHOD FOR FABRICATING HARDCOAT FILM, ANTIREFLECTION...

INSULATING FILM, PROCESS FOR PRODUCING THE SAME AND ELECTRONIC DEVI...

Insulating film, process for producing the same and electronic devi...

Film-forming composition and insulating film and electronic device...

Film-forming composition, insulating material-forming composition,...

Composition for film formation, coating solution containing the sam...

Composition for forming insulating film and process for producing i...

Intermediate layer composition for multilayer resist process, patte...

Insulating-film forming material and insulating film using the same

Insulating-film forming material and insulating film using the same

Postitive resist composition

Negative resist composition

Negative resist composition

Positive resist composition

Negative-working resist composition for electron beams or X-rays

Chemical amplification type negative-working resist composition for...