Yutaka Kouzuma

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,224,158
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yoshinori Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detecting method and detecting device of gas components and process...
- Patent number 11,835,465
- Issue date Dec 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshifumi Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,557,463
- Issue date Jan 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma processing apparatus
- Patent number 11,515,167
- Issue date Nov 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Sumiko Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and plasma processing apparatus
- Patent number 11,276,579
- Issue date Mar 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion shield plate base for semiconductor manufacturing apparatus
- Patent number D924824
- Issue date Jul 13, 2021
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Vacuum processing apparatus
- Patent number 10,937,635
- Issue date Mar 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,872,779
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Nobuya Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated type ion shield for semiconductor manufacturing apparatus
- Patent number D901407
- Issue date Nov 10, 2020
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Ion shield plate for semiconductor manufacturing apparatus
- Patent number D900760
- Issue date Nov 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Wafer processing method and wafer processing apparatus
- Patent number 10,825,664
- Issue date Nov 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Infrared lamp heater transmission window for semiconductor manufact...
- Patent number D864885
- Issue date Oct 29, 2019
- Hitachi High-Technologies Corporation
- Michiaki Kobayashi
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,325,781
- Issue date Jun 18, 2019
- Hitachi High-Technologies Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 10,290,472
- Issue date May 14, 2019
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operation method of plasma processing apparatus
- Patent number 10,141,207
- Issue date Nov 27, 2018
- Hitachi High-Technologies Corporation
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,282,848
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method in plasma processing apparatus
- Patent number 8,092,637
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297021
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Yoshinori YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY CONTROL DEVICE
- Publication number 20240111313
- Publication date Apr 4, 2024
- Hitachi High-Tech Corporation
- Yoshifumi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...
- Publication number 20240055278
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yoshifumi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210366721
- Publication date Nov 25, 2021
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210358760
- Publication date Nov 18, 2021
- Hitachi High-Technologies Corporation
- Sumiko FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTING METHOD AND DETECTING DEVICE OF GAS COMPONENTS AND PROCESS...
- Publication number 20210231571
- Publication date Jul 29, 2021
- Hitachi High-Technologies Corporation
- Yoshifumi OGAWA
- G01 - MEASURING TESTING
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20210151298
- Publication date May 20, 2021
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200328099
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200006079
- Publication date Jan 2, 2020
- Hitachi High-Technologies Corporation
- Nobuya MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20190237302
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUS
- Publication number 20190198299
- Publication date Jun 27, 2019
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180122665
- Publication date May 3, 2018
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPERATION METHOD OF PLASMA PROCESSING APPARATUS
- Publication number 20180090345
- Publication date Mar 29, 2018
- Hitachi High-Technologies Corporation
- Yutaka KOUZUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20180076051
- Publication date Mar 15, 2018
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20170229290
- Publication date Aug 10, 2017
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20090321017
- Publication date Dec 31, 2009
- Tsunehiko Tsubone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS
- Publication number 20090218316
- Publication date Sep 3, 2009
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20080280451
- Publication date Nov 13, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080236614
- Publication date Oct 2, 2008
- Hitachi High-Technologies Corporation
- Mamoru YAKUSHIJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20080237184
- Publication date Oct 2, 2008
- MAMORU YAKUSHIJI
- H01 - BASIC ELECTRIC ELEMENTS

Yutaka Kouzuma

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing method

Detecting method and detecting device of gas components and process...

Vacuum processing apparatus

Plasma etching method and plasma processing apparatus

Substrate processing method and plasma processing apparatus

Ion shield plate base for semiconductor manufacturing apparatus

Vacuum processing apparatus

Plasma etching method and plasma etching apparatus

Integrated type ion shield for semiconductor manufacturing apparatus

Ion shield plate for semiconductor manufacturing apparatus

Wafer processing method and wafer processing apparatus

Infrared lamp heater transmission window for semiconductor manufact...

Etching method and etching apparatus

Vacuum processing apparatus

Operation method of plasma processing apparatus

Plasma processing method and plasma processing apparatus

Manufacturing method in plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

GAS SUPPLY CONTROL DEVICE

GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

DETECTING METHOD AND DETECTING DEVICE OF GAS COMPONENTS AND PROCESS...

VACUUM PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

VACUUM PROCESSING APPARATUS

WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

OPERATION METHOD OF PLASMA PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

VACUUM PROCESSING APPARATUS

Plasma Processing Apparatus and Plasma Processing Method

MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING