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Kudamatsu, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Electrostatic chuck and processing apparatus
Patent number
11,955,360
Issue date
Apr 9, 2024
Tocalo Co., Ltd.
Takeshi Takabatake
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
9,343,336
Issue date
May 17, 2016
Hitachi High-Technologies Corporation
Kohei Sato
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
8,920,665
Issue date
Dec 30, 2014
Hitachi High-Technologies Corporation
Kohei Sato
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing equipment and plasma processing method using the...
Patent number
6,624,084
Issue date
Sep 23, 2003
Hitachi, Ltd.
Kenji Maeda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for plasma processing
Patent number
6,156,663
Issue date
Dec 5, 2000
Hitachi, Ltd.
Katsuya Watanabe
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma treating method and apparatus therefor
Patent number
4,943,361
Issue date
Jul 24, 1990
Hitachi, Ltd.
Yutaka Kakehi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processor
Patent number
4,631,106
Issue date
Dec 23, 1986
Hitachi, Ltd.
Norio Nakazato
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ELECTROSTATIC CHUCK AND PROCESSING APPARATUS
Publication number
20230154780
Publication date
May 18, 2023
TOCALO CO., LTD.
Takeshi TAKABATAKE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20150083329
Publication date
Mar 26, 2015
Hitachi High-Technologies Corporation
Kohei Sato
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20140001154
Publication date
Jan 2, 2014
Hitachi High-Technologies Corporation
Kohei Sato
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma Processing Apparatus
Publication number
20120000774
Publication date
Jan 5, 2012
Ken Yoshioka
G05 - CONTROLLING REGULATING
Information
Patent Application
Plasma Processing Apparatus and Plasma Processing Method
Publication number
20090321017
Publication date
Dec 31, 2009
Tsunehiko Tsubone
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20080170969
Publication date
Jul 17, 2008
Ken Yoshioka
G05 - CONTROLLING REGULATING
Information
Patent Application
Sample holding electrode and a plasma processing apparatus using th...
Publication number
20070209933
Publication date
Sep 13, 2007
Ken Yoshioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus with resonance countermeasure function
Publication number
20070181254
Publication date
Aug 9, 2007
Hitachi High-Technologies Corporation
Tsutomu Iida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing equipment and plasma processing method using the...
Publication number
20010022293
Publication date
Sep 20, 2001
Kenji Maeda
H01 - BASIC ELECTRIC ELEMENTS