Yutaro OTOMO

Person

Joetsu-shi, JP

People

Patents Applicationslast 30 patents

Information Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
- Publication number 20240361690
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist Material, Resist Composition, And Patterning Process
- Publication number 20240361691
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
- Publication number 20240360069
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240210830
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240053678
- Publication date Feb 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro Otomo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD
- Publication number 20230296980
- Publication date Sep 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20230296981
- Publication date Sep 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Gentaro HIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD
- Publication number 20230244142
- Publication date Aug 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yutaro OTOMO

Person

Patents Applicationslast 30 patents

Resist Material, Resist Composition, Patterning Process, And Monomer

Resist Material, Resist Composition, And Patterning Process

Monomer, Resist Material, Resist Composition, And Patterning Process

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST MATERIAL AND PATTERN FORMING METHOD

RESIST MATERIAL AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD