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Yuuki KOBAYASHI
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Miyagi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma processing apparatus and measurement method
Patent number
9,658,106
Issue date
May 23, 2017
Tokyo Electron Limited
Yuuki Kobayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Doping method, doping apparatus and method of manufacturing semicon...
Patent number
9,472,404
Issue date
Oct 18, 2016
Tokyo Electron Limited
Hirokazu Ueda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pulsed gas plasma doping method and apparatus
Patent number
9,165,771
Issue date
Oct 20, 2015
Tokyo Electron Limited
Peter Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma doping apparatus and plasma doping method
Patent number
9,029,249
Issue date
May 12, 2015
Tokyo Electron Limited
Hirokazu Ueda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Solid state source introduction of dopants and additives for a plas...
Patent number
8,889,534
Issue date
Nov 18, 2014
Tokyo Electron Limited
Peter L. G. Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...
Publication number
20180012763
Publication date
Jan 11, 2018
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
Publication number
20160189963
Publication date
Jun 30, 2016
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND MEASUREMENT METHOD
Publication number
20150318220
Publication date
Nov 5, 2015
TOKYO ELECTRON LIMITED
Yuuki KOBAYASHI
G01 - MEASURING TESTING
Information
Patent Application
DOPING METHOD, DOPING APPARATUS AND METHOD OF MANUFACTURING SEMICON...
Publication number
20150187582
Publication date
Jul 2, 2015
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DOPING APPARATUS, PLASMA DOPING METHOD, SEMICONDUCTOR DEVICE...
Publication number
20140357068
Publication date
Dec 4, 2014
TOKYO ELECTRON LIMITED
Masahiro Horigome
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SOLID STATE SOURCE INTRODUCTION OF DOPANTS AND ADDITIVES FOR A PLAS...
Publication number
20140356984
Publication date
Dec 4, 2014
TOKYO ELECTRON LIMITED
Peter L. G. Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PULSED GAS PLASMA DOPING METHOD AND APPARATUS
Publication number
20140302666
Publication date
Oct 9, 2014
TOKYO ELECTRON LIMITED
Peter VENTZEK
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD
Publication number
20140179028
Publication date
Jun 26, 2014
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DOPING APPARATUS, PLASMA DOPING METHOD, AND METHOD FOR MANUF...
Publication number
20140094024
Publication date
Apr 3, 2014
TOKYO ELECTRON LIMITED
Masahiro OKA
H01 - BASIC ELECTRIC ELEMENTS