Yuuki SUKA

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Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 9,261,783
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist protective film-forming composition and patterning process
- Patent number 9,086,628
- Issue date Jul 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable ester compound, polymer, resist composition, and patt...
- Patent number 8,795,946
- Issue date Aug 5, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 8,697,903
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 8,420,292
- Issue date Apr 16, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20140051024
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi KINSHO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE PATTERN FORMING PROCESS AND NEGATIVE RESIST COMPOSITION
- Publication number 20130130177
- Publication date May 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
- Publication number 20130084517
- Publication date Apr 4, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20130065183
- Publication date Mar 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATT...
- Publication number 20130017484
- Publication date Jan 17, 2013
- Koji HASEGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20120083580
- Publication date Apr 5, 2012
- Takeshi KINSHO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110177455
- Publication date Jul 21, 2011
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Fluorinated ester monomer, making method, fluorinated ester polymer...

Resist protective film-forming composition and patterning process

Polymerizable ester compound, polymer, resist composition, and patt...

Fluorinated ester monomer, making method, fluorinated ester polymer...

Polymer, resist composition, and patterning process

Patents Applicationslast 30 patents

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

NEGATIVE PATTERN FORMING PROCESS AND NEGATIVE RESIST COMPOSITION

RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATT...

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS