Yuusuke ASANO

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 10,048,586
- Issue date Aug 14, 2018
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 8,697,331
- Issue date Apr 15, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming a resist...
- Patent number 8,535,871
- Issue date Sep 17, 2013
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, fluorine-containing polymer, radiation-sensitive resin co...
- Patent number 8,530,692
- Issue date Sep 10, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...
- Publication number 20120156612
- Publication date Jun 21, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...
- Publication number 20120100480
- Publication date Apr 26, 2012
- JSR Corporation
- Nobuji MATSUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...
- Publication number 20110151378
- Publication date Jun 23, 2011
- JSR Corporation
- Nobuji MATSUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20110104611
- Publication date May 5, 2011
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yuusuke ASANO

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method for forming resist pa...

Compound, polymer, and radiation-sensitive composition

Radiation-sensitive resin composition, method for forming a resist...

Compound, fluorine-containing polymer, radiation-sensitive resin co...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...

COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...

RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...

NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION