Yuuto Ootsuki

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Cmp polishing slurry and method of polishing substrate
- Patent number 9,293,344
- Issue date Mar 22, 2016
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing cerium oxide, cerium oxide abrasive, method fo...
- Patent number 6,615,499
- Issue date Sep 9, 2003
- Hitachi Chemical Co., Ltd.
- Jun Matsuzawa
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080003925
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...