Yuval Lubashevsky

Person

Haifa, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annular apodizer for small target overlay measurement
- Patent number 12,105,431
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning overlay metrology using overlay targets having multiple sp...
- Patent number 11,796,925
- Issue date Oct 24, 2023
- KLA Corporation
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Grant
Non-orthogonal target and method for using the same in measuring mi...
- Patent number 11,409,205
- Issue date Aug 9, 2022
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigation of inaccuracies related to grating asymmetries in scatte...
- Patent number 11,112,704
- Issue date Sep 7, 2021
- KLA-Tencor Corporation
- Ido Adam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Diffraction based overlay scatterometry
- Patent number 10,824,079
- Issue date Nov 3, 2020
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Simultaneous capturing of overlay signals from multiple targets
- Patent number 10,401,228
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approaches in first order scatterometry overlay based on introducti...
- Patent number 10,197,389
- Issue date Feb 5, 2019
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Simultaneous capturing of overlay signals from multiple targets
- Patent number 10,048,132
- Issue date Aug 14, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...
- Publication number 20240337953
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES
- Publication number 20240337606
- Publication date Oct 10, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
MULTI-OVERLAY STACKED GRATING METROLOGY TARGET
- Publication number 20240302751
- Publication date Sep 12, 2024
- KLA Corporation
- Jordan Pio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...
- Publication number 20240167813
- Publication date May 23, 2024
- KLA Corporation
- Itay Gdor
- G01 - MEASURING TESTING
Information Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
- Publication number 20240118606
- Publication date Apr 11, 2024
- KLA Corporation
- Itay GDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY
- Publication number 20240068804
- Publication date Feb 29, 2024
- KLA Corporation
- Yuval Lubashevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT SUPERSONIC PROJECTILE TRACKING
- Publication number 20240035782
- Publication date Feb 1, 2024
- Synchrosense Ltd.
- Yuval LUBASHEVSKY
- F41 - WEAPONS
Information Patent Application
SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY...
- Publication number 20230314344
- Publication date Oct 5, 2023
- Yuri Paskover
- G01 - MEASURING TESTING
Information Patent Application
SCANNING SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20230314319
- Publication date Oct 5, 2023
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT
- Publication number 20230236113
- Publication date Jul 27, 2023
- KLA Corporation
- Itay GDOR
- G01 - MEASURING TESTING
Information Patent Application
SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...
- Publication number 20230213875
- Publication date Jul 6, 2023
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Application
Non-Orthogonal Target and Method for Using the Same in Measuring Mi...
- Publication number 20210364935
- Publication date Nov 25, 2021
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mitigation of Inaccuracies Related to Grating Asymmetries in Scatte...
- Publication number 20190033726
- Publication date Jan 31, 2019
- KLA-Tencor Corporation
- Ido Adam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTION BASED OVERLAY SCATTEROMETRY
- Publication number 20190004439
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffraction Based Overlay Scatterometry
- Publication number 20180342063
- Publication date Nov 29, 2018
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Simultaneous Capturing of Overlay Signals From Multiple Targets
- Publication number 20180335346
- Publication date Nov 22, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SIMULTANEOUS CAPTURING OF OVERLAY SIGNALS FROM MULTIPLE TARGETS
- Publication number 20180031424
- Publication date Feb 1, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
New Approaches in First Order Scatterometry Overlay Based on Introd...
- Publication number 20170268869
- Publication date Sep 21, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING

Yuval Lubashevsky

Person

Patents Grantslast 30 patents

Targets for diffraction-based overlay error metrology

Annular apodizer for small target overlay measurement

Scanning overlay metrology using overlay targets having multiple sp...

Non-orthogonal target and method for using the same in measuring mi...

Mitigation of inaccuracies related to grating asymmetries in scatte...

Diffraction based overlay scatterometry

Process compatibility improvement by fill factor modulation

Simultaneous capturing of overlay signals from multiple targets

Approaches in first order scatterometry overlay based on introducti...

Simultaneous capturing of overlay signals from multiple targets

Patents Applicationslast 30 patents

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...

PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES

MULTI-OVERLAY STACKED GRATING METROLOGY TARGET

SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...

IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY

MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY

COMPACT SUPERSONIC PROJECTILE TRACKING

SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY...

SCANNING SCATTEROMETRY OVERLAY METROLOGY

ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT

SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...

Non-Orthogonal Target and Method for Using the Same in Measuring Mi...

Mitigation of Inaccuracies Related to Grating Asymmetries in Scatte...

DIFFRACTION BASED OVERLAY SCATTEROMETRY

Diffraction Based Overlay Scatterometry

Simultaneous Capturing of Overlay Signals From Multiple Targets

Process Compatibility Improvement by Fill Factor Modulation

SIMULTANEOUS CAPTURING OF OVERLAY SIGNALS FROM MULTIPLE TARGETS

New Approaches in First Order Scatterometry Overlay Based on Introd...