Yuya MINOURA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,080,521
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control method and plasma processing apparatus
- Patent number 11,920,242
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 11,749,508
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,688,609
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Yuya Minoura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,811,275
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20240339307
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Yuya MINOURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20230360891
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230335409
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Yuya MINOURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230100292
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- KYURI MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028670
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Yuya Minoura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210375635
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Yuya MINOURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210287886
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Yuya Minoura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210265135
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20190252203
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Member for Plasma Processing Apparatus and Plasma Processing Apparatus
- Publication number 20170133204
- Publication date May 11, 2017
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yuya MINOURA

Person

Patents Grantslast 30 patents

Plasma processing method

Temperature control method and plasma processing apparatus

Plasma processing method

Etching method and plasma processing apparatus

Plasma etching method and plasma etching apparatus

Patents Applicationslast 30 patents

METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...

PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

Member for Plasma Processing Apparatus and Plasma Processing Apparatus