Yuzo OKAMURA

Person

Chiyoda-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Glass substrate for mask blank, mask blank and photomask
- Patent number 10,599,031
- Issue date Mar 24, 2020
- AGC Inc.
- Yuzo Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate for mask blank, and method for producing the same
- Patent number 10,241,392
- Issue date Mar 26, 2019
- AGC Inc.
- Yusuke Hirabayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank
- Patent number 10,222,689
- Issue date Mar 5, 2019
- AGC Inc.
- Yuzo Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate for mask blank, mask blank, photomask, and method f...
- Patent number 10,146,125
- Issue date Dec 4, 2018
- AGC Inc.
- Yusuke Hirabayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate for mask blank, mask blank, photomask, and method f...
- Patent number 10,146,126
- Issue date Dec 4, 2018
- AGC Inc.
- Yusuke Hirabayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer substrate, manufacturing method for multilayer substrate...
- Patent number 8,921,017
- Issue date Dec 30, 2014
- Asahi Glass Company, Limited
- Yuzo Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflecting mask blank, method for manufacturing reflective mask bla...
- Patent number 8,916,316
- Issue date Dec 23, 2014
- Asahi Glass Company, Limited
- Yuzo Okamura
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING MATERIAL AND POLISHING METHOD
- Publication number 20210403757
- Publication date Dec 30, 2021
- AGC Inc.
- Yuzo OKAMURA
- B24 - GRINDING POLISHING
Information Patent Application
MASK BLANK
- Publication number 20180239236
- Publication date Aug 23, 2018
- Asahi Glass Company, Limited
- Yuzo Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK AND PHOTOMASK
- Publication number 20180217492
- Publication date Aug 2, 2018
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- B32 - LAYERED PRODUCTS
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, PHOTOMASK, AND METHOD F...
- Publication number 20180149964
- Publication date May 31, 2018
- Asahi Glass Company, Limited
- Yusuke HIRABAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, PHOTOMASK, AND METHOD F...
- Publication number 20170090277
- Publication date Mar 30, 2017
- Asahi Glass Company, Limited
- Yusuke HIRABAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK
- Publication number 20160266482
- Publication date Sep 15, 2016
- Asahi Glass Company, Limited
- Naohiro UMEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK, AND METHOD FOR PRODUCING THE SAME
- Publication number 20160209742
- Publication date Jul 21, 2016
- Asahi Glass Company, Limited
- Yusuke Hirabayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE
- Publication number 20160168020
- Publication date Jun 16, 2016
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
REFLECTING MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLA...
- Publication number 20140186753
- Publication date Jul 3, 2014
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- G01 - MEASURING TESTING
Information Patent Application
MULTILAYER SUBSTRATE, MANUFACTURING METHOD FOR MULTILAYER SUBSTRATE...
- Publication number 20140011123
- Publication date Jan 9, 2014
- Asahi Glass Company, Limited
- Yuzo OKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yuzo OKAMURA

Person

Patents Grantslast 30 patents

Glass substrate for mask blank, mask blank and photomask

Glass substrate for mask blank, and method for producing the same

Mask blank

Glass substrate for mask blank, mask blank, photomask, and method f...

Glass substrate for mask blank, mask blank, photomask, and method f...

Multilayer substrate, manufacturing method for multilayer substrate...

Reflecting mask blank, method for manufacturing reflective mask bla...

Patents Applicationslast 30 patents

POLISHING MATERIAL AND POLISHING METHOD

MASK BLANK

GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK AND PHOTOMASK

GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, PHOTOMASK, AND METHOD F...

GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, PHOTOMASK, AND METHOD F...

GLASS SUBSTRATE FOR MASK BLANK

GLASS SUBSTRATE FOR MASK BLANK, AND METHOD FOR PRODUCING THE SAME

METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE

REFLECTING MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLA...

MULTILAYER SUBSTRATE, MANUFACTURING METHOD FOR MULTILAYER SUBSTRATE...