Zachary Baum

Person

Gardiner, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mask layout formation
- Patent number 8,875,063
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating cut mask for double-patterning process
- Patent number 8,365,108
- Issue date Jan 29, 2013
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential alternating phase shift mask optimization
- Patent number 8,181,126
- Issue date May 15, 2012
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,039,203
- Issue date Oct 18, 2011
- Infineon Technologies AG
- Helen Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Local coloring for hierarchical OPC
- Patent number 7,650,587
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential alternating phase shift mask optimization
- Patent number 7,617,473
- Issue date Nov 10, 2009
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase shift mask design for high performance circuitry
- Patent number 7,229,722
- Issue date Jun 12, 2007
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adaptive segment refinement in optical proximity correction
- Patent number 7,043,712
- Issue date May 9, 2006
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS
- Publication number 20120180006
- Publication date Jul 12, 2012
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK LAYOUT FORMATION
- Publication number 20120089953
- Publication date Apr 12, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL ALTERNATING PHASE SHIFT MASK OPTIMIZATION
- Publication number 20100017780
- Publication date Jan 21, 2010
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090081563
- Publication date Mar 26, 2009
- Helen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATING PHASE SHIFT MASK OPTIMIZATION FOR IMPROVED PROCESS WINDOW
- Publication number 20090037866
- Publication date Feb 5, 2009
- International Business Machines Corporation
- Ioana C. Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL COLORING FOR HIERARCHICAL OPC
- Publication number 20080134130
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL ALTERNATING PHASE SHIFT MASK OPTIMIZATION
- Publication number 20060166105
- Publication date Jul 27, 2006
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATING PHASE SHIFT MASK DESIGN FOR HIGH PERFORMANCE CIRCUITRY
- Publication number 20050166175
- Publication date Jul 28, 2005
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADAPTIVE SEGMENT REFINEMENT IN OPTICAL PROXIMITY CORRECTION
- Publication number 20050055658
- Publication date Mar 10, 2005
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING

Zachary Baum

Person

Patents Grantslast 30 patents

Mask layout formation

Generating cut mask for double-patterning process

Differential alternating phase shift mask optimization

Integrated circuits and methods of design and manufacture thereof

Local coloring for hierarchical OPC

Differential alternating phase shift mask optimization

Alternating phase shift mask design for high performance circuitry

Method for adaptive segment refinement in optical proximity correction

Patents Applicationslast 30 patents

GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS

MASK LAYOUT FORMATION

DIFFERENTIAL ALTERNATING PHASE SHIFT MASK OPTIMIZATION

Integrated Circuits and Methods of Design and Manufacture Thereof

ALTERNATING PHASE SHIFT MASK OPTIMIZATION FOR IMPROVED PROCESS WINDOW

LOCAL COLORING FOR HIERARCHICAL OPC

DIFFERENTIAL ALTERNATING PHASE SHIFT MASK OPTIMIZATION

ALTERNATING PHASE SHIFT MASK DESIGN FOR HIGH PERFORMANCE CIRCUITRY

METHOD FOR ADAPTIVE SEGMENT REFINEMENT IN OPTICAL PROXIMITY CORRECTION