Zain SAIDIN

Person

San Mateo, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Unique mark and method to determine critical dimension uniformity a...
- Patent number 8,804,137
- Issue date Aug 12, 2014
- KLA-Tencor Corporation
- DongSub Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining locations on a wafer to be reviewed during defect review
- Patent number 7,904,845
- Issue date Mar 8, 2011
- KLA-Tencor Corp.
- Christophe Fouquet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-implemented methods for detecting defects in reticle desig...
- Patent number 7,646,906
- Issue date Jan 12, 2010
- KLA-Tencor Technologies Corp.
- Zain K. Saidin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,440,093
- Issue date Oct 21, 2008
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for modifying a reticle's optical properties
- Patent number 7,303,842
- Issue date Dec 4, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for monitoring a reticle
- Patent number 7,300,729
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for determining and correcting reticle variations
- Patent number 7,300,725
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods for mitigating variances on a patterned wafer u...
- Patent number 7,297,453
- Issue date Nov 20, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,271,891
- Issue date Sep 18, 2007
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for removing optical abberations during an op...
- Patent number 6,844,927
- Issue date Jan 18, 2005
- KLA-Tencor Technologies Corporation
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,731,787
- Issue date May 4, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,381,358
- Issue date Apr 30, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,076,465
- Issue date Jun 20, 2000
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,737,072
- Issue date Apr 7, 1998
- KLA Instruments Corporation
- David Garth Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,563,702
- Issue date Oct 8, 1996
- KLA Instruments Corporation
- David G. Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHODS FOR REAL-TIME THREE-DIMENSIONAL SEM IMAGING A...
- Publication number 20120223227
- Publication date Sep 6, 2012
- Chien-Huei CHEN
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR DETECTING DESIGN AND PROCESS DEFECTS ON A W...
- Publication number 20110276935
- Publication date Nov 10, 2011
- KLA-Tencor Corporation
- Christophe Fouquet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY A...
- Publication number 20110051150
- Publication date Mar 3, 2011
- KLA-Tencor Corporation
- DongSub Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determing reticle defect printability
- Publication number 20090324054
- Publication date Dec 31, 2009
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS, DESIGNS, DEFECT REVIEW TOOLS, AND SYSTEMS FOR DETERMINING...
- Publication number 20080163140
- Publication date Jul 3, 2008
- Christophe Fouquet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20080133160
- Publication date Jun 5, 2008
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20070140548
- Publication date Jun 21, 2007
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and methods for mitigating variances on a patterned wafer u...
- Publication number 20060240336
- Publication date Oct 26, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining and correcting reticle variations
- Publication number 20060234145
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for modifying a reticle's optical properties
- Publication number 20060234139
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Computer-implemented methods for detecting defects in reticle desig...
- Publication number 20060236294
- Publication date Oct 19, 2006
- Zain K. Saidin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for monitoring a reticle
- Publication number 20060234144
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20050140970
- Publication date Jun 30, 2005
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and methods for removing optical abberations during an op...
- Publication number 20040100629
- Publication date May 27, 2004
- KLA-Tencor Technologies, Corporation
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20040096094
- Publication date May 20, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20030138138
- Publication date Jul 24, 2003
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20020126888
- Publication date Sep 12, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING

Zain SAIDIN

Person

Patents Grantslast 30 patents

Unique mark and method to determine critical dimension uniformity a...

Determining locations on a wafer to be reviewed during defect review

Computer-implemented methods for detecting defects in reticle desig...

Apparatus and methods for providing selective defect sensitivity

Systems and methods for modifying a reticle's optical properties

Method for monitoring a reticle

Method for determining and correcting reticle variations

Systems and methods for mitigating variances on a patterned wafer u...

Apparatus and methods for providing selective defect sensitivity

Apparatus and methods for removing optical abberations during an op...

System and method for determining reticle defect printability

System and method for determining reticle defect printability

System and method for determining reticle defect printability

Automated photomask inspection apparatus and method

Automated photomask inspection apparatus and method

Patents Applicationslast 30 patents

APPARATUS AND METHODS FOR REAL-TIME THREE-DIMENSIONAL SEM IMAGING A...

SYSTEMS AND METHODS FOR DETECTING DESIGN AND PROCESS DEFECTS ON A W...

UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY A...

System and method for determing reticle defect printability

METHODS, DESIGNS, DEFECT REVIEW TOOLS, AND SYSTEMS FOR DETERMINING...

System and method for determining reticle defect printability

System and method for determining reticle defect printability

Systems and methods for mitigating variances on a patterned wafer u...

Method for determining and correcting reticle variations

Systems and methods for modifying a reticle's optical properties

Computer-implemented methods for detecting defects in reticle desig...

Method for monitoring a reticle

System and method for determining reticle defect printability

Apparatus and methods for removing optical abberations during an op...

System and method for determining reticle defect printability

System and method for determining reticle defect printability

System and method for determining reticle defect printability