Zhan CHEN

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Onium-containing CMP compositions and methods of use thereof
- Patent number 9,129,907
- Issue date Sep 8, 2015
- Cabot Microelectronics Corporation
- Michael L. White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and methods for polishing silicon nitride materials
- Patent number 8,759,216
- Issue date Jun 24, 2014
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions for polishing silicon-containing substrates
- Patent number 8,597,540
- Issue date Dec 3, 2013
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Grant
Oxidation-stabilized CMP compositions and methods
- Patent number 8,497,209
- Issue date Jul 30, 2013
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and compositions for polishing silicon-containing substrates
- Patent number 8,247,327
- Issue date Aug 21, 2012
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Grant
Oxidation-stabilized CMP compositions and methods
- Patent number 7,732,393
- Issue date Jun 8, 2010
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable selectivity slurries in CMP applications
- Patent number 7,294,576
- Issue date Nov 13, 2007
- Cabot Microelectronics Corporation
- Zhan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITIONS AND METHODS FOR CMP OF TUNGSTEN MATERIALS
- Publication number 20150259804
- Publication date Sep 17, 2015
- Cabot Microelectronics Corporation
- Chih-An LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES
- Publication number 20120280170
- Publication date Nov 8, 2012
- Cabot Microelectronics Corporation
- Francesco DE REGE THESAURO
- B24 - GRINDING POLISHING
Information Patent Application
OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS
- Publication number 20100200802
- Publication date Aug 12, 2010
- Cabot Microelectronics Corporation
- Steven K. GRUMBINE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE...
- Publication number 20100190339
- Publication date Jul 29, 2010
- Zhan Chen
- B24 - GRINDING POLISHING
Information Patent Application
Methods and compositions for polishing silicon-containing substrates
- Publication number 20100029181
- Publication date Feb 4, 2010
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Application
Low-temperature catalyzed formation of segmented nanowire of dielec...
- Publication number 20090093131
- Publication date Apr 9, 2009
- Donghui Lu
- C30 - CRYSTAL GROWTH
Information Patent Application
Silicon oxide polishing method utilizing colloidal silica
- Publication number 20080220610
- Publication date Sep 11, 2008
- Cabot Microelectronics Corporation
- Benjamin Bayer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Onium-containing CMP compositions and methods of use thereof
- Publication number 20080060278
- Publication date Mar 13, 2008
- Michael L. White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Rate-enhanced CMP compositions for dielectric films
- Publication number 20080020680
- Publication date Jan 24, 2008
- Cabot Microelectronics Corporation
- Robert Vacassy
- B24 - GRINDING POLISHING
Information Patent Application
Compositions and methods for polishing silicon nitride materials
- Publication number 20070298612
- Publication date Dec 27, 2007
- Jeffrey Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Oxidation-stabilized CMP compositions and methods
- Publication number 20070219104
- Publication date Sep 20, 2007
- Steven K. Grumbine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition and method to polish silicon nitride
- Publication number 20070209287
- Publication date Sep 13, 2007
- Cabot Microelectronics Corporation
- Zhan Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low-temperature catalyzed formation of segmented nanowire of dielec...
- Publication number 20070004225
- Publication date Jan 4, 2007
- Donghui Lu
- C30 - CRYSTAL GROWTH

Person

Patents Grantslast 30 patents

Onium-containing CMP compositions and methods of use thereof

Compositions and methods for polishing silicon nitride materials

Compositions for polishing silicon-containing substrates

Oxidation-stabilized CMP compositions and methods

Methods and compositions for polishing silicon-containing substrates

Oxidation-stabilized CMP compositions and methods

Tunable selectivity slurries in CMP applications

Patents Applicationslast 30 patents

COMPOSITIONS AND METHODS FOR CMP OF TUNGSTEN MATERIALS

COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES

OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS

COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE...

Methods and compositions for polishing silicon-containing substrates

Low-temperature catalyzed formation of segmented nanowire of dielec...

Silicon oxide polishing method utilizing colloidal silica

Onium-containing CMP compositions and methods of use thereof

Rate-enhanced CMP compositions for dielectric films

Compositions and methods for polishing silicon nitride materials

Oxidation-stabilized CMP compositions and methods

Composition and method to polish silicon nitride

Low-temperature catalyzed formation of segmented nanowire of dielec...