Zhaohui Cheng

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multipole unit and charged particle beam device
- Patent number 11,769,649
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Masanori Mita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and sample observation method
- Patent number 10,840,060
- Issue date Nov 17, 2020
- HITACHI HIGH-TECH CORPORATION
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and aberration correction method for c...
- Patent number 10,727,024
- Issue date Jul 28, 2020
- Hitachi High-Technologies Corporation
- Kotoko Urano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction method, aberration correction system, and cha...
- Patent number 10,446,361
- Issue date Oct 15, 2019
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and sample observation method
- Patent number 9,991,092
- Issue date Jun 5, 2018
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating shape before shrink and CD-SEM apparatus
- Patent number 9,830,524
- Issue date Nov 28, 2017
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Aberration corrector and charged particle beam apparatus using the...
- Patent number 9,287,084
- Issue date Mar 15, 2016
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus for removing charges developed on a...
- Patent number 9,202,665
- Issue date Dec 1, 2015
- Hitachi High-Technologies Corporation
- Hiroyuki Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample observing method and scanning electron microscope
- Patent number 8,309,923
- Issue date Nov 13, 2012
- Hitachi High-Technologies Corporation
- Seiko Omori
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,207,513
- Issue date Jun 26, 2012
- Hitachi High-Technologies Corporation
- Yuko Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized static charge distribution precision measurement method a...
- Patent number 7,928,384
- Issue date Apr 19, 2011
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for inspection and measurement
- Patent number 7,910,884
- Issue date Mar 22, 2011
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,714,288
- Issue date May 11, 2010
- Hitachi High-Technologies Corporation
- Tasuku Yano
- G01 - MEASURING TESTING
Information Patent Grant
Charge control apparatus and measurement apparatus equipped with th...
- Patent number 7,683,319
- Issue date Mar 23, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for scanning and measurement by electron beam
- Patent number 7,655,906
- Issue date Feb 2, 2010
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 7,652,248
- Issue date Jan 26, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer inspection apparatus
- Patent number 7,633,303
- Issue date Dec 15, 2009
- Hitachi High-Technologies Corporation
- Takashi Furukawa
- G01 - MEASURING TESTING
Information Patent Grant
Pattern defect inspection method and apparatus thereof
- Patent number 7,547,884
- Issue date Jun 16, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting patterns
- Patent number 7,394,070
- Issue date Jul 1, 2008
- Hitachi High-Technologies Corporation
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus for circuit pattern
- Patent number 7,218,126
- Issue date May 15, 2007
- Hitachi, Ltd.
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus for circuit pattern of resist material
- Patent number 6,952,105
- Issue date Oct 4, 2005
- Hitachi, Ltd.
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR DEMAGNETIZING MAGNETIC...
- Publication number 20240274395
- Publication date Aug 15, 2024
- Hitachi High-Tech Corporatiom
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Training Method for Learning Apparatus, and Image Generation System
- Publication number 20240144560
- Publication date May 2, 2024
- Hitachi High-Tech Corporation
- Zhaohui CHENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...
- Publication number 20230113759
- Publication date Apr 13, 2023
- Hitachi High-Tech Corporation
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Aberration Correction Method
- Publication number 20220415605
- Publication date Dec 29, 2022
- Hitachi High-Tech Corporation
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multipole Unit and Charged Particle Beam Device
- Publication number 20220270844
- Publication date Aug 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masanori MITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND ABERRATION CORRECTION METHOD FOR C...
- Publication number 20190214222
- Publication date Jul 11, 2019
- Hitachi High-Technologies Corporation
- Kotoko URANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
- Publication number 20180269032
- Publication date Sep 20, 2018
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHA...
- Publication number 20180190469
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE...
- Publication number 20150248944
- Publication date Sep 3, 2015
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR ESTIMATING SHAPE BEFORE SHRINK AND CD-SEM APPARATUS
- Publication number 20150036914
- Publication date Feb 5, 2015
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20140027635
- Publication date Jan 30, 2014
- Hiroyuki Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
- Publication number 20120153145
- Publication date Jun 21, 2012
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE OBSERVING METHOD AND SCANNING ELECTRON MICROSCOPE
- Publication number 20110303843
- Publication date Dec 15, 2011
- Hitachi High-Technologies Corporation
- Seiko Omori
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20100051806
- Publication date Mar 4, 2010
- Hitachi High-Technologies Corporation
- Yuko Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR INSPECTION AND MEASUREMENT
- Publication number 20090179151
- Publication date Jul 16, 2009
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charge control apparatus and measurement apparatus equipped with th...
- Publication number 20090166557
- Publication date Jul 2, 2009
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Localized static charge distribution precision measurement method a...
- Publication number 20090057557
- Publication date Mar 5, 2009
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20080277583
- Publication date Nov 13, 2008
- Hitachi High-Technologies Corporation
- Tasuku Yano
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR WAFER INSPECTION APPARATUS
- Publication number 20080246497
- Publication date Oct 9, 2008
- Takashi Furukawa
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION AND MEASUREMENT APPARATUS
- Publication number 20080017797
- Publication date Jan 24, 2008
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection Apparatus and Inspection Method
- Publication number 20070228276
- Publication date Oct 4, 2007
- HIROSHI MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern defect inspection method and apparatus thereof
- Publication number 20070085005
- Publication date Apr 19, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for scanning and measurement by electron beam
- Publication number 20070040118
- Publication date Feb 22, 2007
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting patterns
- Publication number 20060163477
- Publication date Jul 27, 2006
- Hitachi High-Technologies Corporation
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20060151698
- Publication date Jul 13, 2006
- Hitachi High-Technologies Corporation
- Yuko Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection method and apparatus for circuit pattern
- Publication number 20060028218
- Publication date Feb 9, 2006
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection method and apparatus for circuit pattern of resist material
- Publication number 20050099189
- Publication date May 12, 2005
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Zhaohui Cheng

Person

Patents Grantslast 30 patents

Multipole unit and charged particle beam device

Scanning electron microscope and sample observation method

Charged particle beam device and aberration correction method for c...

Aberration correction method, aberration correction system, and cha...

Scanning electron microscope and sample observation method

Method for estimating shape before shrink and CD-SEM apparatus

Aberration corrector and charged particle beam apparatus using the...

Charged particle beam apparatus for removing charges developed on a...

Sample observing method and scanning electron microscope

Charged particle beam apparatus

Localized static charge distribution precision measurement method a...

Apparatus and method for inspection and measurement

Charged particle beam apparatus

Charge control apparatus and measurement apparatus equipped with th...

Method and apparatus for scanning and measurement by electron beam

Inspection apparatus and inspection method

Semiconductor wafer inspection apparatus

Pattern defect inspection method and apparatus thereof

Method and apparatus for inspecting patterns

Inspection method and apparatus for circuit pattern

Inspection method and apparatus for circuit pattern of resist material

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE AND METHOD FOR DEMAGNETIZING MAGNETIC...

Training Method for Learning Apparatus, and Image Generation System

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...

Charged Particle Beam Device and Aberration Correction Method

Multipole Unit and Charged Particle Beam Device

CHARGED PARTICLE BEAM DEVICE AND ABERRATION CORRECTION METHOD FOR C...

SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD

ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHA...

ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE...

METHOD FOR ESTIMATING SHAPE BEFORE SHRINK AND CD-SEM APPARATUS

CHARGED PARTICLE BEAM APPARATUS

SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD

SAMPLE OBSERVING METHOD AND SCANNING ELECTRON MICROSCOPE

CHARGED PARTICLE BEAM APPARATUS

APPARATUS AND METHOD FOR INSPECTION AND MEASUREMENT

Charge control apparatus and measurement apparatus equipped with th...

Localized static charge distribution precision measurement method a...

Charged particle beam apparatus

SEMICONDUCTOR WAFER INSPECTION APPARATUS

PATTERN INSPECTION AND MEASUREMENT APPARATUS

Inspection Apparatus and Inspection Method

Pattern defect inspection method and apparatus thereof

Method and apparatus for scanning and measurement by electron beam

Method and apparatus for inspecting patterns

Charged particle beam apparatus

Inspection method and apparatus for circuit pattern

Inspection method and apparatus for circuit pattern of resist material