Zhendong LIU

Person

Tracy, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High pressure RF-DC sputtering and methods to improve film uniformi...
- Patent number 10,763,090
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Adolph Miller Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 10,718,049
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target for PVD chamber
- Patent number 10,060,024
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 9,834,840
- Issue date Dec 5, 2017
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target for PVD chamber
- Patent number 9,752,228
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lowering tungsten resistivity by replacing titanium nitride with ti...
- Patent number 9,583,349
- Issue date Feb 28, 2017
- APPLIED MATERIALS, INC.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ultra-uniform sputter deposition using simultaneous RF a...
- Patent number 8,992,741
- Issue date Mar 31, 2015
- Applied Materials, Inc.
- Rongjun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low resistivity tungsten PVD with enhanced ionization and RF power...
- Patent number 8,895,450
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Yong Cao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device with gate electrode stack including low resist...
- Patent number 8,558,299
- Issue date Oct 15, 2013
- Applied Materials, Inc.
- Yong Cao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective offset sputtering
- Patent number 8,460,519
- Issue date Jun 11, 2013
- Applied Materials Inc.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective offset sputtering
- Patent number 8,454,804
- Issue date Jun 4, 2013
- Applied Materials Inc.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate device having a tuned work function and methods of formin...
- Patent number 8,129,280
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Rongjun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition
- Patent number 7,884,032
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20200357616
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Adolph Miller ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION
- Publication number 20180087147
- Publication date Mar 29, 2018
- MUHAMMAD RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target for PVD Chamber
- Publication number 20170350001
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRE-COATED SHIELD USING IN VHF-RF PVD CHAMBERS
- Publication number 20170145553
- Publication date May 25, 2017
- Applied Materials, Inc.
- Zhendong LIU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20170029941
- Publication date Feb 2, 2017
- Applied Materials, Inc.
- Adolph Miller ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOWERING TUNGSTEN RESISTIVITY BY REPLACING TITANIUM NITRIDE WITH TI...
- Publication number 20150206756
- Publication date Jul 23, 2015
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTIVITY TUNGSTEN PVD WITH ENHANCED IONIZATION AND RF POWER...
- Publication number 20140042016
- Publication date Feb 13, 2014
- Applied Materials, Inc.
- Yong CAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOWERING TUNGSTEN RESISTIVITY BY REPLACING TITANIUM NITRIDE WITH TI...
- Publication number 20140001576
- Publication date Jan 2, 2014
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE OFFSET SPUTTERING
- Publication number 20130327641
- Publication date Dec 12, 2013
- Mengqi YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotating Bed to Reduce the Risk of Developing Pressure Ulcers
- Publication number 20120036637
- Publication date Feb 16, 2012
- Hougong Wang
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILM...
- Publication number 20120027954
- Publication date Feb 2, 2012
- Applied Materials, Inc.
- ZHENDONG LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTIVITY TUNGSTEN PVD WITH ENHANCED IONIZATION AND RF POWER...
- Publication number 20110303960
- Publication date Dec 15, 2011
- Applied Materials, Inc.
- YONG CAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION
- Publication number 20110278165
- Publication date Nov 17, 2011
- Applied Materials, Inc.
- MUHAMMAD RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE DEVICE HAVING A TUNED WORK FUNCTION AND METHODS OF FORMIN...
- Publication number 20110018073
- Publication date Jan 27, 2011
- Applied Materials, Inc.
- RONGJUN WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20100252417
- Publication date Oct 7, 2010
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target for PVD Chamber
- Publication number 20100252416
- Publication date Oct 7, 2010
- Applied Materials, Inc.
- Zhendong Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ULTRA-UNIFORM SPUTTER DEPOSITION USING SIMULTANEOUS RF A...
- Publication number 20100032289
- Publication date Feb 11, 2010
- Applied Materials, Inc.
- RONGJUN WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE TARGET
- Publication number 20080116067
- Publication date May 22, 2008
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Protective offset sputtering
- Publication number 20070095651
- Publication date May 3, 2007
- APPLIED MATERIALS, INC.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Protective offset sputtering
- Publication number 20070095650
- Publication date May 3, 2007
- APPLIED MATERIALS, INC.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin film deposition
- Publication number 20070099438
- Publication date May 3, 2007
- APPLIED MATERIALS, INC.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Physical vapor deposition chamber having an adjustable target
- Publication number 20060096851
- Publication date May 11, 2006
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Physical vapor deposition chamber having a rotatable substrate pede...
- Publication number 20060096857
- Publication date May 11, 2006
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Zhendong LIU

Person

Patents Grantslast 30 patents

High pressure RF-DC sputtering and methods to improve film uniformi...

Process kit shield for improved particle reduction

Sputtering target for PVD chamber

Process kit shield for improved particle reduction

Sputtering target for PVD chamber

Lowering tungsten resistivity by replacing titanium nitride with ti...

Method for ultra-uniform sputter deposition using simultaneous RF a...

Low resistivity tungsten PVD with enhanced ionization and RF power...

Semiconductor device with gate electrode stack including low resist...

Protective offset sputtering

Protective offset sputtering

Substrate device having a tuned work function and methods of formin...

Thin film deposition

Patents Applicationslast 30 patents

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION

Sputtering Target for PVD Chamber

PRE-COATED SHIELD USING IN VHF-RF PVD CHAMBERS

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

LOWERING TUNGSTEN RESISTIVITY BY REPLACING TITANIUM NITRIDE WITH TI...

LOW RESISTIVITY TUNGSTEN PVD WITH ENHANCED IONIZATION AND RF POWER...

LOWERING TUNGSTEN RESISTIVITY BY REPLACING TITANIUM NITRIDE WITH TI...

PROTECTIVE OFFSET SPUTTERING

Rotating Bed to Reduce the Risk of Developing Pressure Ulcers

MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILM...

LOW RESISTIVITY TUNGSTEN PVD WITH ENHANCED IONIZATION AND RF POWER...

PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION

SUBSTRATE DEVICE HAVING A TUNED WORK FUNCTION AND METHODS OF FORMIN...

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

Sputtering Target for PVD Chamber

METHOD FOR ULTRA-UNIFORM SPUTTER DEPOSITION USING SIMULTANEOUS RF A...

PHYSICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE TARGET

Protective offset sputtering

Protective offset sputtering

Thin film deposition

Physical vapor deposition chamber having an adjustable target

Physical vapor deposition chamber having a rotatable substrate pede...