Zheng GU

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Emeryville, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Real-time autofocus for maskless lithography on substrates
- Patent number 11,067,905
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Diana Valverde-Paniagua
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS, SYSTEM, AND SOFTWARE FOR MASKLESS LITHOGRAPHY SYSTEMS
- Publication number 20230259038
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Zheng GU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL-TIME AUTOFOCUS FOR MASKLESS LITHOGRAPHY ON SUBSTRATES
- Publication number 20210216023
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Diana VALVERDE-PANIAGUA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY