ZHENG JOHN YE

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma enhanced process chamber
- Patent number 12,080,516
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bipolar electrostatic chuck to limit DC discharge
- Patent number 12,057,339
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature bipolar electrostatic chuck
- Patent number 11,901,209
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply signal conditioning for an electrostatic chuck
- Patent number 11,776,835
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature bipolar electrostatic chuck
- Patent number 11,587,817
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,570,879
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF grounding configuration for pedestals
- Patent number 11,569,072
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor substrate supports with improved high temperature chu...
- Patent number 11,501,993
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing using multiple radio frequency power feeds for im...
- Patent number 11,276,562
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF electrostatic chuck filter circuit
- Patent number 11,189,517
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead having a detachable gas distribution plate
- Patent number 11,130,142
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic heater and esc with enhanced wafer edge performance
- Patent number 10,950,477
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,930,475
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of hardmask
- Patent number 10,923,334
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Satya Thokachichu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of achieving high input impedance without usin...
- Patent number 10,879,041
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Voltage-current probe for measuring radio-frequency electrical powe...
- Patent number 10,663,491
- Issue date May 26, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead having a detachable gas distribution plate
- Patent number 10,625,277
- Issue date Apr 21, 2020
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing using multiple radio frequency power feeds for im...
- Patent number 10,580,623
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High impedance RF filter for heater with impedance tuning device
- Patent number 10,450,653
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of processing wafers with compressive or tensi...
- Patent number 10,403,535
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chucking with dielectric constant en...
- Patent number 10,325,800
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Prashant Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High impedance RF filter for heater with impedance tuning device
- Patent number 10,125,422
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Jian J. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,128,088
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge hump reduction faceplate by plasma modulation
- Patent number 10,100,408
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Sungwon Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 9,824,862
- Issue date Nov 21, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20250014934
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...
- Publication number 20240087847
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK
- Publication number 20230207371
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20230170190
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY PLASMA ENHANCED PROCESS CHAMBER
- Publication number 20230162947
- Publication date May 25, 2023
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20230131809
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20220130704
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK
- Publication number 20220122875
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM
- Publication number 20220119952
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Rana Howlader
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK
- Publication number 20220102179
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AN ADVANCED CERAMIC LID WITH EMBEDDED HEATER ELEMENTS AND EMBEDDED...
- Publication number 20210375586
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Abhijit KANGUDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20210296144
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Xing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL RF FOR CONTROLLABLE FILM DEPOSITION
- Publication number 20210159048
- Publication date May 27, 2021
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...
- Publication number 20210111000
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20210059037
- Publication date Feb 25, 2021
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORTS WITH IMPROVED HIGH TEMPERATURE CHU...
- Publication number 20210035843
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Jian Li
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ELECTROSTATIC CHUCK FOR DAMAGE-FREE SUBSTRATE PROCESSING
- Publication number 20210025056
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF ELECTROSTATIC CHUCK FILTER CIRCUIT
- Publication number 20200343123
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Zheng John YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD HAVING A DETACHABLE GAS DISTRIBUTION PLATE
- Publication number 20200238303
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RECURSIVE COILS FOR INDUCTIVELY COUPLED PLASMAS
- Publication number 20200219698
- Publication date Jul 9, 2020
- Applied Materials, Inc.
- Zheng John YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...
- Publication number 20200203132
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE
- Publication number 20200010957
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Jian J. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCKING WITH DIELECTRIC CONSTANT EN...
- Publication number 20190355609
- Publication date Nov 21, 2019
- Applied Materials, Inc.
- Prashant KULSHRESHTHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF HARDMASK
- Publication number 20190341227
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Satya THOKACHICHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF GROUNDING CONFIGURATION FOR PEDESTALS
- Publication number 20190341232
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Satya THOKACHICHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCK...
- Publication number 20190252158
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

ZHENG JOHN YE

Person

Patents Grantslast 30 patents

Dual RF for controllable film deposition

High density plasma enhanced process chamber

Bipolar electrostatic chuck to limit DC discharge

Methods and apparatus for controlling RF parameters at multiple fre...

Symmetric VHF source for a plasma reactor

High temperature bipolar electrostatic chuck

Power supply signal conditioning for an electrostatic chuck

High temperature bipolar electrostatic chuck

Symmetric VHF source for a plasma reactor

Methods and apparatus for controlling RF parameters at multiple fre...

RF grounding configuration for pedestals

Semiconductor substrate supports with improved high temperature chu...

Plasma processing using multiple radio frequency power feeds for im...

RF electrostatic chuck filter circuit

Showerhead having a detachable gas distribution plate

Symmetric VHF source for a plasma reactor

Ceramic heater and esc with enhanced wafer edge performance

Graded in-situ charge trapping layers to enable electrostatic chuck...

Selective deposition of hardmask

Method and apparatus of achieving high input impedance without usin...

Voltage-current probe for measuring radio-frequency electrical powe...

Showerhead having a detachable gas distribution plate

Plasma processing using multiple radio frequency power feeds for im...

High impedance RF filter for heater with impedance tuning device

Method and apparatus of processing wafers with compressive or tensi...

High temperature electrostatic chucking with dielectric constant en...

High impedance RF filter for heater with impedance tuning device

Graded in-situ charge trapping layers to enable electrostatic chuck...

Edge hump reduction faceplate by plasma modulation

Symmetric VHF source for a plasma reactor

Patents Applicationslast 30 patents

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...

HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

RF GROUNDING CONFIGURATION FOR PEDESTALS

HIGH DENSITY PLASMA ENHANCED PROCESS CHAMBER

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK

METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM

POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK

AN ADVANCED CERAMIC LID WITH EMBEDDED HEATER ELEMENTS AND EMBEDDED...

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

DUAL RF FOR CONTROLLABLE FILM DEPOSITION

METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USIN...

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

SEMICONDUCTOR SUBSTRATE SUPPORTS WITH IMPROVED HIGH TEMPERATURE CHU...

ELECTROSTATIC CHUCK FOR DAMAGE-FREE SUBSTRATE PROCESSING

RF ELECTROSTATIC CHUCK FILTER CIRCUIT

SHOWERHEAD HAVING A DETACHABLE GAS DISTRIBUTION PLATE

RECURSIVE COILS FOR INDUCTIVELY COUPLED PLASMAS

PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...

HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE

HIGH TEMPERATURE ELECTROSTATIC CHUCKING WITH DIELECTRIC CONSTANT EN...

SELECTIVE DEPOSITION OF HARDMASK

RF GROUNDING CONFIGURATION FOR PEDESTALS

GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCK...