Zhibiao Mao

Person

Shrewsbury, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Phenolic/alicyclic copolymers and photoresists
- Patent number 7,700,256
- Issue date Apr 20, 2010
- Rohm and Haas Electronic Materials LLC
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coatings with increased etch rates
- Patent number 7,183,037
- Issue date Feb 27, 2007
- Shipley Company, L.L.C.
- Zhibiao Mao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers having nitrile and alicyclic leaving groups and photores...
- Patent number 7,090,968
- Issue date Aug 15, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,849,381
- Issue date Feb 1, 2005
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,777,157
- Issue date Aug 17, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymers having nitrile and alicyclic leaving groups and photores...
- Patent number 6,692,888
- Issue date Feb 17, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic/alicyclic copolymers and photoresists
- Patent number 6,492,086
- Issue date Dec 10, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Copolymers having nitrile and alicyclic leaving groups and photores...
- Publication number 20040076906
- Publication date Apr 22, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymers and photoresist compositions comprising same
- Publication number 20030215742
- Publication date Nov 20, 2003
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phenolic/alicyclic copolymers and photoresists
- Publication number 20030207200
- Publication date Nov 6, 2003
- Shipley Company, L.L.C.
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etch resistant antireflective coating compositions
- Publication number 20020028408
- Publication date Mar 7, 2002
- Shipley Company, L.L.C.
- Zhibiao Mao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Zhibiao Mao

Person

Patents Grantslast 30 patents

Phenolic/alicyclic copolymers and photoresists

Antireflective coatings with increased etch rates

Copolymers having nitrile and alicyclic leaving groups and photores...

Copolymers and photoresist compositions comprising same

Copolymers and photoresist compositions comprising same

Copolymers having nitrile and alicyclic leaving groups and photores...

Phenolic/alicyclic copolymers and photoresists

Patents Applicationslast 30 patents

Copolymers having nitrile and alicyclic leaving groups and photores...

Novel copolymers and photoresist compositions comprising same

Phenolic/alicyclic copolymers and photoresists

Etch resistant antireflective coating compositions