Zhibiao MAO

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming the gate with the LELE double pattern
- Patent number 9,171,731
- Issue date Oct 27, 2015
- Shanghai Huali Microelectronics Corporation
- Jun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing dual gate oxide devices
- Patent number 8,962,494
- Issue date Feb 24, 2015
- Shanghai Huali Microelectronics Corporation
- Jun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to manufacture trench-first copper interconnection
- Patent number 8,518,825
- Issue date Aug 27, 2013
- Shanghai Huali Microelectronics Corporation
- Zhibiao Mao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING THE GATE WITH THE LELE DOUBLE PATTERN
- Publication number 20150050801
- Publication date Feb 19, 2015
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jun HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING DUAL GATE OXIDE DEVICES
- Publication number 20140342565
- Publication date Nov 20, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING DUAL GATE OXIDE
- Publication number 20140273465
- Publication date Sep 18, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Zhibiao MAO
- H01 - BASIC ELECTRIC ELEMENTS