Zhibin WANG

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Electrostatic discharge robust design for input device
- Patent number 11,997,777
- Issue date May 28, 2024
- Apple Inc.
- Daniel Jacob Benjamin Bechstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Uniform EUV photoresist patterning utilizing pulsed plasma process
- Patent number 10,727,075
- Issue date Jul 28, 2020
- Applied Materials, Inc.
- Sang Wook Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device fabrication via pulsed plasma
- Patent number 10,580,657
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Chang Wook Doh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device fabrication via pulsed plasma
- Patent number 10,347,500
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Chang Wook Doh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC DISCHARGE ROBUST DESIGN FOR INPUT DEVICE
- Publication number 20220095443
- Publication date Mar 24, 2022
- Apple Inc.
- Daniel Jacob Benjamin BECHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE FABRICATION VIA PULSED PLASMA
- Publication number 20190371617
- Publication date Dec 5, 2019
- Applied Materials, Inc.
- Chang Wook DOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM EUV PHOTORESIST PATTERNING UTILIZING PULSED PLASMA PROCESS
- Publication number 20190198338
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Sang Wook KIM
- H01 - BASIC ELECTRIC ELEMENTS