Zhibo Yuan

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Low resistivity tungsten film and method of manufacture
- Patent number 12,191,198
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Feihu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual silicide process using ruthenium silicide
- Patent number 12,094,785
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE
- Publication number 20240404888
- Publication date Dec 5, 2024
- Applied Materuals, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL SILICIDE PROCESS USING RUTHENIUM SILICIDE
- Publication number 20230187282
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Thomas Anthony Empante
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Resistivity Tungsten Film And Method Of Manufacture
- Publication number 20220068709
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Feihu Wang
- H01 - BASIC ELECTRIC ELEMENTS