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Shanghai, CN
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last 30 patents
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Patent Grant
Method of forming the gate with the LELE double pattern
Patent number
9,171,731
Issue date
Oct 27, 2015
Shanghai Huali Microelectronics Corporation
Jun Huang
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
METHOD OF FORMING THE GATE WITH THE LELE DOUBLE PATTERN
Publication number
20150050801
Publication date
Feb 19, 2015
SHANGHAI HUALI MICROELECTRONICS CORPORATION
Jun HUANG
H01 - BASIC ELECTRIC ELEMENTS