Zhifeng Sui

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,721,798
- Issue date May 13, 2014
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,496,756
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interferometric endpoint detection in a substrate etching process
- Patent number 6,905,624
- Issue date Jun 14, 2005
- Applied Materials, Inc.
- Coriolan I. Frum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring substrate processing using reflected radiation
- Patent number 6,831,742
- Issue date Dec 14, 2004
- Applied Materials, Inc.
- Zhifeng Sui
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring dimensions of features at different locations in the pro...
- Patent number 6,829,056
- Issue date Dec 7, 2004
- Michael Barnes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection in substrate fabrication processes
- Patent number 6,813,534
- Issue date Nov 2, 2004
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High switching speed digital faraday rotator device and optical swi...
- Patent number 6,594,068
- Issue date Jul 15, 2003
- Zhifeng Sui
- G02 - OPTICS
Information Patent Grant
Monitoring substrate processing with optical emission and polarized...
- Patent number 6,559,942
- Issue date May 6, 2003
- Applied Materials Inc.
- Zhifeng Sui
- G01 - MEASURING TESTING
Information Patent Grant
Bandpass photon detector
- Patent number 5,995,235
- Issue date Nov 30, 1999
- Applied Materials, Inc.
- Zhifeng Sui
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ROTATIONAL ABSORPTION SPECTRA FOR SEMICONDUCTOR MANUFACTURING PROCE...
- Publication number 20130309785
- Publication date Nov 21, 2013
- Applied Materials, Inc.
- ZHIFENG SUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110265814
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110266256
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION FOR A REACTOR CHAMBER USING A REMOTE PLASMA CHAMBER
- Publication number 20100224322
- Publication date Sep 9, 2010
- Applied Materials, Inc.
- ZHIFENG SUI
- G01 - MEASURING TESTING
Information Patent Application
Interferometric endpoint detection in a substrate etching process
- Publication number 20050006341
- Publication date Jan 13, 2005
- APPLIED MATERIALS, INC.
- Coriolan I. Frum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint detection in substrate fabrication processes
- Publication number 20020183977
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monitoring substrate processing with optical emission and polarized...
- Publication number 20020048019
- Publication date Apr 25, 2002
- Zhifeng Sui
- G01 - MEASURING TESTING
Information Patent Application
High switching speed digital faraday rotator device and optical swi...
- Publication number 20020009254
- Publication date Jan 24, 2002
- Zhifeng Sui
- G02 - OPTICS
Information Patent Application
High switching speed digital faraday rotator device and optical swi...
- Publication number 20020003651
- Publication date Jan 10, 2002
- Zhifeng Sui
- G02 - OPTICS

Zhifeng Sui

Person

Patents Grantslast 30 patents

Methods for processing substrates in process systems having shared...

Methods for processing substrates in process systems having shared...

Interferometric endpoint detection in a substrate etching process

Monitoring substrate processing using reflected radiation

Monitoring dimensions of features at different locations in the pro...

Endpoint detection in substrate fabrication processes

High switching speed digital faraday rotator device and optical swi...

Monitoring substrate processing with optical emission and polarized...

Bandpass photon detector

Patents Applicationslast 30 patents

ROTATIONAL ABSORPTION SPECTRA FOR SEMICONDUCTOR MANUFACTURING PROCE...

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

ENDPOINT DETECTION FOR A REACTOR CHAMBER USING A REMOTE PLASMA CHAMBER

Interferometric endpoint detection in a substrate etching process

Endpoint detection in substrate fabrication processes

Monitoring substrate processing with optical emission and polarized...

High switching speed digital faraday rotator device and optical swi...

High switching speed digital faraday rotator device and optical swi...