Zhigang Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support with improved process uniformity
- Patent number 11,984,296
- Issue date May 14, 2024
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 11,195,706
- Issue date Dec 7, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with features for preventing electrical arcing...
- Patent number 11,069,553
- Issue date Jul 20, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with improved process uniformity
- Patent number 10,910,195
- Issue date Feb 2, 2021
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,825,656
- Issue date Nov 3, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly incorporation a gasket for distributin...
- Patent number 10,804,129
- Issue date Oct 13, 2020
- Lam Research Corporation
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion energy control by RF pulse shape
- Patent number 10,755,895
- Issue date Aug 25, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium plug design to reduce arcing
- Patent number 10,741,425
- Issue date Aug 11, 2020
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber with vertical support stem for symmetric conductance and RF...
- Patent number 10,665,435
- Issue date May 26, 2020
- Lam Research Corporation
- Daniel Arthur Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,615,003
- Issue date Apr 7, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma apparatus
- Patent number 10,573,493
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Valentin N. Todorow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Boltless substrate support assembly
- Patent number 10,460,978
- Issue date Oct 29, 2019
- Lam Research Corporation
- Fangli Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber with vertical support stem for symmetric conductance and RF...
- Patent number 10,395,902
- Issue date Aug 27, 2019
- Lam Research Corporation
- Daniel Arthur Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of etch rate using modeling, feedback and impedance match
- Patent number 10,381,201
- Issue date Aug 13, 2019
- Lam Research Corporation
- Bradford J. Lyndaker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Systems and methods for tailoring ion energy distribution function...
- Patent number 10,340,122
- Issue date Jul 2, 2019
- Lam Research Corporation
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi regime plasma wafer processing to increase directionality of...
- Patent number 10,304,662
- Issue date May 28, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 10,283,330
- Issue date May 7, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and liner assembly for tuning electrica...
- Patent number 10,242,847
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- James D. Carducci
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,115,568
- Issue date Oct 30, 2018
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber with vertical support stem for symmetric conductance and RF...
- Patent number 10,049,862
- Issue date Aug 14, 2018
- Lam Research Corporation
- Daniel Arthur Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for tailoring ion energy distribution function...
- Patent number 10,026,592
- Issue date Jul 17, 2018
- Lam Research Corporation
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20240282551
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240266151
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240162015
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20210166914
- Publication date Jun 3, 2021
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ring Structures and Systems for Use in a Plasma Chamber
- Publication number 20200365378
- Publication date Nov 19, 2020
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20200227238
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHAMBER WITH VERTICAL SUPPORT STEM FOR SYMMETRIC CONDUCTANCE AND RF...
- Publication number 20190371579
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Daniel Arthur Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH
- Publication number 20190318919
- Publication date Oct 17, 2019
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...
- Publication number 20190244788
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TAPERED UPPER ELECTRODE FOR UNIFORMITY CONTROL IN PLASMA PROCESSING
- Publication number 20190244793
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Zhigang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi Regime Plasma Wafer Processing to Increase Directionality of...
- Publication number 20190080885
- Publication date Mar 14, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20190057839
- Publication date Feb 21, 2019
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER WITH VERTICAL SUPPORT STEM FOR SYMMETRIC CONDUCTANCE AND RF...
- Publication number 20180323044
- Publication date Nov 8, 2018
- LAM RESEARCH CORPORATION
- Daniel Arthur Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...
- Publication number 20180301320
- Publication date Oct 18, 2018
- LAM RESEARCH CORPORATION
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY INCORPORATING A GASKET FOR DISTRIBUTIN...
- Publication number 20180277412
- Publication date Sep 27, 2018
- Christopher KIMBALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOLTLESS SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20180261492
- Publication date Sep 13, 2018
- Lam Research Corporation
- Fangli Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HELIUM PLUG DESIGN TO REDUCE ARCING
- Publication number 20180240688
- Publication date Aug 23, 2018
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20180190526
- Publication date Jul 5, 2018
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20180082822
- Publication date Mar 22, 2018
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...
- Publication number 20180025891
- Publication date Jan 25, 2018
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...
- Publication number 20180012785
- Publication date Jan 11, 2018
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...
- Publication number 20180005802
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20170271129
- Publication date Sep 21, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH
- Publication number 20170194130
- Publication date Jul 6, 2017
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Energy Control By RF Pulse Shape
- Publication number 20170084429
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314940
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS

Zhigang Chen

Person

Patents Grantslast 30 patents

Substrate support with improved process uniformity

Symmetric VHF source for a plasma reactor

Symmetric VHF source for a plasma reactor

Symmetric plasma process chamber

Systems and methods for achieving a pre-determined factor associate...

Electrostatic chuck with features for preventing electrical arcing...

Symmetric VHF source for a plasma reactor

Substrate support with improved process uniformity

Systems and methods for controlling directionality of ions in an ed...

Electrostatic chuck assembly incorporation a gasket for distributin...

Ion energy control by RF pulse shape

Helium plug design to reduce arcing

Chamber with vertical support stem for symmetric conductance and RF...

Systems and methods for controlling directionality of ions in an ed...

Symmetric plasma process chamber

Symmetric plasma process chamber

Inductively coupled plasma apparatus

Symmetric plasma process chamber

Symmetric plasma process chamber

Boltless substrate support assembly

Symmetric plasma process chamber

Chamber with vertical support stem for symmetric conductance and RF...

Control of etch rate using modeling, feedback and impedance match

Systems and methods for tailoring ion energy distribution function...

Multi regime plasma wafer processing to increase directionality of...

Systems and methods for achieving a pre-determined factor associate...

Plasma processing apparatus and liner assembly for tuning electrica...

Systems and methods for controlling directionality of ions in an ed...

Chamber with vertical support stem for symmetric conductance and RF...

Systems and methods for tailoring ion energy distribution function...

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

Ring Structures and Systems for Use in a Plasma Chamber

Systems And Methods For Controlling Directionality Of Ions In An Ed...

SYMMETRIC PLASMA PROCESS CHAMBER

CHAMBER WITH VERTICAL SUPPORT STEM FOR SYMMETRIC CONDUCTANCE AND RF...

CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH

SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...

TAPERED UPPER ELECTRODE FOR UNIFORMITY CONTROL IN PLASMA PROCESSING

Multi Regime Plasma Wafer Processing to Increase Directionality of...

Systems And Methods For Controlling Directionality Of Ions In An Ed...

CHAMBER WITH VERTICAL SUPPORT STEM FOR SYMMETRIC CONDUCTANCE AND RF...

SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...

ELECTROSTATIC CHUCK ASSEMBLY INCORPORATING A GASKET FOR DISTRIBUTIN...

BOLTLESS SUBSTRATE SUPPORT ASSEMBLY

HELIUM PLUG DESIGN TO REDUCE ARCING

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

Systems And Methods For Controlling Directionality Of Ions In An Ed...

SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...

ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...

SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION...

SYMMETRIC PLASMA PROCESS CHAMBER

CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH

Ion Energy Control By RF Pulse Shape

SYMMETRIC PLASMA PROCESS CHAMBER