Zhijian Lu

Person

Boxborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Minimizing resist poisoning in the manufacture of semiconductor dev...
- Patent number 7,425,502
- Issue date Sep 16, 2008
- Texas Instruments Incorporated
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Minimizing resist poisoning in the manufacture of semiconductor dev...
- Patent number 7,262,129
- Issue date Aug 28, 2007
- Texas Instruments Incorporated
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of eliminating etch ridges in a dual damascene process
- Patent number 7,192,863
- Issue date Mar 20, 2007
- Texas Instruments Incorporated
- Lu Zhijian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern transfer in device fabrication
- Patent number 7,090,967
- Issue date Aug 15, 2006
- Infineon Technologies AG
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo reticles using channel assist features
- Patent number 6,968,528
- Issue date Nov 22, 2005
- Texas Instruments Incorporated
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A METHOD OF MAKING A MULTILAYER STRUCTURE
- Publication number 20180286598
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Method for Reduction of Resist Poisoning in Via-First Trench-Last D...
- Publication number 20090085120
- Publication date Apr 2, 2009
- TEXAS INSTRUMENTS INCORPORATED
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimizing resist poisoning in the manufacture of semiconductor dev...
- Publication number 20080020580
- Publication date Jan 24, 2008
- TEXAS INSTRUMENTS INCORPORATED
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment of an Etch Stop Layer
- Publication number 20060194447
- Publication date Aug 31, 2006
- TEXAS INSTRUMENTS INCORPORATED
- Ju-Ai Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimizing resist poisoning in the manufacture of semiconductor dev...
- Publication number 20060110901
- Publication date May 25, 2006
- Texas Instruments, Inc.
- Zhijian Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment of an etch stop layer
- Publication number 20060081965
- Publication date Apr 20, 2006
- Ju-Ai Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of eliminating etch ridges in a dual damascene process
- Publication number 20060024956
- Publication date Feb 2, 2006
- Lu Zhijian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extraction of impurities in a semiconductor process with a supercri...
- Publication number 20050241672
- Publication date Nov 3, 2005
- TEXAS INSTRUMENTS INCORPORATED
- Phillip D. Matz
- B08 - CLEANING
Information Patent Application
Wafer processing techniques with enhanced alignment
- Publication number 20050059255
- Publication date Mar 17, 2005
- Infineon Technologies North America Corp.
- Lawrence John Varnerin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduction of resist defects
- Publication number 20040259371
- Publication date Dec 23, 2004
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo reticles using channel assist features
- Publication number 20040197673
- Publication date Oct 7, 2004
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN TRANSFER IN DEVICE FABRICATION
- Publication number 20040126705
- Publication date Jul 1, 2004
- Zhijian Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Minimizing resist poisoning in the manufacture of semiconductor dev...

Minimizing resist poisoning in the manufacture of semiconductor dev...

Method of eliminating etch ridges in a dual damascene process

Pattern transfer in device fabrication

Photo reticles using channel assist features

Patents Applicationslast 30 patents

A METHOD OF MAKING A MULTILAYER STRUCTURE

Method for Reduction of Resist Poisoning in Via-First Trench-Last D...

Minimizing resist poisoning in the manufacture of semiconductor dev...

Plasma Treatment of an Etch Stop Layer

Minimizing resist poisoning in the manufacture of semiconductor dev...

Plasma treatment of an etch stop layer

Method of eliminating etch ridges in a dual damascene process

Extraction of impurities in a semiconductor process with a supercri...

Wafer processing techniques with enhanced alignment

Reduction of resist defects

Photo reticles using channel assist features

PATTERN TRANSFER IN DEVICE FABRICATION