Zhisong Huang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas distribution system having fast gas switching capabilities
- Patent number 8,673,785
- Issue date Mar 18, 2014
- Lam Research Corporation
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,614,149
- Issue date Dec 24, 2013
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fast gas switching plasma processing apparatus
- Patent number 8,343,876
- Issue date Jan 1, 2013
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,268,118
- Issue date Sep 18, 2012
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma etching performance enhancement
- Patent number 7,977,390
- Issue date Jul 12, 2011
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system having fast gas switching capabilities
- Patent number 7,708,859
- Issue date May 4, 2010
- Lam Research Corporation
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 7,695,632
- Issue date Apr 13, 2010
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical profile fixing
- Patent number 7,682,516
- Issue date Mar 23, 2010
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch profile control
- Patent number 7,645,707
- Issue date Jan 12, 2010
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch with striation control
- Patent number 7,491,647
- Issue date Feb 17, 2009
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for resist strip in presence of low K dielectric material an...
- Patent number 7,452,660
- Issue date Nov 18, 2008
- Lam Research Corporation
- Zhisong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pitch reduction
- Patent number 7,429,533
- Issue date Sep 30, 2008
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dual damascene structure
- Patent number 7,169,695
- Issue date Jan 30, 2007
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma etching performance enhancement
- Patent number 6,833,325
- Issue date Dec 21, 2004
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20120309201
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST GAS SWITCHING PLASMA PROCESSING APPARATUS
- Publication number 20110281435
- Publication date Nov 17, 2011
- LAM RESEARCH CORPORATION
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK OPEN AND ETCH PROFILE CONTROL WITH HARDMASK OPEN
- Publication number 20100327413
- Publication date Dec 30, 2010
- LAM RESEARCH CORPORATION
- Jong Pil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION SYSTEM HAVING FAST GAS SWITCHING CAPABILITIES
- Publication number 20100159707
- Publication date Jun 24, 2010
- LAM RESEARCH CORPORATION
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20100148317
- Publication date Jun 17, 2010
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCH WITH STRIATION CONTROL
- Publication number 20090121324
- Publication date May 14, 2009
- LAM RESEARCH CORPORATION
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Resist Strip in Presence of Low K Dielectric Material an...
- Publication number 20090032192
- Publication date Feb 5, 2009
- LAM RESEARCH CORPORATION
- Zhisong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pitch reduction
- Publication number 20070264830
- Publication date Nov 15, 2007
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical profile fixing
- Publication number 20070075038
- Publication date Apr 5, 2007
- Lam Research Corporation
- S.M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast gas switching plasma processing apparatus
- Publication number 20070066038
- Publication date Mar 22, 2007
- Lam Research Corporation
- S.M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma etching performance enhancement
- Publication number 20070026677
- Publication date Feb 1, 2007
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical dimension reduction and roughness control
- Publication number 20060266478
- Publication date Nov 30, 2006
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch profile control
- Publication number 20060226120
- Publication date Oct 12, 2006
- Lam Research Corporation
- Camelia Rusu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch with striation control
- Publication number 20060194439
- Publication date Aug 31, 2006
- Lam Research Corporation
- S.M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of etch mask feature critical dimensions
- Publication number 20060134917
- Publication date Jun 22, 2006
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-k dielectric etch
- Publication number 20060011578
- Publication date Jan 19, 2006
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas distribution system having fast gas switching capabilities
- Publication number 20050241763
- Publication date Nov 3, 2005
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for plasma etching performance enhancement
- Publication number 20050037624
- Publication date Feb 17, 2005
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a dual damascene structure
- Publication number 20040072430
- Publication date Apr 15, 2004
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma etching performance enhancement
- Publication number 20040072443
- Publication date Apr 15, 2004
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS

Zhisong Huang

Person

Patents Grantslast 30 patents

Gas distribution system having fast gas switching capabilities

Critical dimension reduction and roughness control

Fast gas switching plasma processing apparatus

Critical dimension reduction and roughness control

Method for plasma etching performance enhancement

Gas distribution system having fast gas switching capabilities

Critical dimension reduction and roughness control

Vertical profile fixing

Etch profile control

Etch with striation control

Method for resist strip in presence of low K dielectric material an...

Pitch reduction

Method for forming a dual damascene structure

Method for plasma etching performance enhancement

Patents Applicationslast 30 patents

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

FAST GAS SWITCHING PLASMA PROCESSING APPARATUS

HARDMASK OPEN AND ETCH PROFILE CONTROL WITH HARDMASK OPEN

GAS DISTRIBUTION SYSTEM HAVING FAST GAS SWITCHING CAPABILITIES

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

ETCH WITH STRIATION CONTROL

Method for Resist Strip in Presence of Low K Dielectric Material an...

Pitch reduction

Vertical profile fixing

Fast gas switching plasma processing apparatus

Method for plasma etching performance enhancement

Critical dimension reduction and roughness control

Etch profile control

Etch with striation control

Reduction of etch mask feature critical dimensions

Low-k dielectric etch

Gas distribution system having fast gas switching capabilities

Method for plasma etching performance enhancement

Method for forming a dual damascene structure

Method for plasma etching performance enhancement