Zhiying Chen

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tailored electron energy distribution function by new plasma source...
- Patent number 12,014,901
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
- Patent number 11,942,307
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 11,728,135
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for plasma processing
- Patent number 11,393,662
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion angle detector
- Patent number 11,264,212
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid electron beam and RF plasma system for controlled content of...
- Patent number 11,205,562
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium hard mask process
- Patent number 11,183,398
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses having a dielectric injector
- Patent number 11,152,194
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses including multiple electron sources
- Patent number 11,043,362
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 10,998,169
- Issue date May 4, 2021
- Tokyo Electron Limited
- Peter Ventzek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-sustained non-ambipolar direct current (DC) plasma at low power
- Patent number 10,395,903
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-ambipolar electric pressure plasma uniformity control
- Patent number 10,388,528
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-sustained non-ambipolar direct current (DC) plasma at low power
- Patent number 9,978,568
- Issue date May 22, 2018
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-ambipolar plasma enhanced DC/VHF phasor
- Patent number 9,966,239
- Issue date May 8, 2018
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,947,515
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,793,095
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-ambipolar plasma ehncanced DC/VHF phasor
- Patent number 9,697,993
- Issue date Jul 4, 2017
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for providing an anisotropic and mono-energeti...
- Patent number 9,668,332
- Issue date May 30, 2017
- Tokyo Electron Limited
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for providing an anisotropic and mono-energeti...
- Patent number 9,288,890
- Issue date Mar 15, 2016
- Tokyo Electron Limited
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 9,209,032
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low profile magnetic filter
- Patent number 9,111,873
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable capacitance chamber component incorporating ferroelectric...
- Patent number 8,721,833
- Issue date May 13, 2014
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable capacitance chamber component incorporating a semiconducto...
- Patent number 8,486,798
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Radio Frequency (RF) Source and Bias Signal...
- Publication number 20230117812
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUSES INCLUDING MULTIPLE ELECTRON SOURCES
- Publication number 20210082668
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365369
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365372
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tailored Electron Energy Distribution Function by New Plasma Source...
- Publication number 20200135431
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID ELECTRON BEAM AND RF PLASMA SYSTEM FOR CONTROLLED CONTENT OF...
- Publication number 20200135432
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20200058470
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ruthenium Hard Mask Process
- Publication number 20200051833
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER
- Publication number 20180269041
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR PLASMA EHNCANCED DC/VHF PHASOR
- Publication number 20170278684
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL
- Publication number 20160268136
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING AN ANISOTROPIC AND MONO-ENERGETI...
- Publication number 20160198559
- Publication date Jul 7, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...
- Publication number 20160056018
- Publication date Feb 25, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR PLASMA EHNCANCED DC/VHF PHASOR
- Publication number 20150126037
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER
- Publication number 20150041432
- Publication date Feb 12, 2015
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM FOR NON-AMBIPOLAR ELECTRON PLASMA (NEP) TREATMENT...
- Publication number 20140360670
- Publication date Dec 11, 2014
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Surface-Wave Plasma Device
- Publication number 20140262042
- Publication date Sep 18, 2014
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Surface-Wave Plasma Device
- Publication number 20140262041
- Publication date Sep 18, 2014
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING
- Publication number 20140262040
- Publication date Sep 18, 2014
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...
- Publication number 20140273485
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL
- Publication number 20140273538
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW PROFILE MAGNETIC FILTER
- Publication number 20140113454
- Publication date Apr 24, 2014
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING A SEMICONDUCTO...
- Publication number 20130200494
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Zhiying CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING FERROELECTRIC...
- Publication number 20130203258
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Zhiying CHEN
- H01 - BASIC ELECTRIC ELEMENTS

Zhiying Chen

Person

Patents Grantslast 30 patents

Tailored electron energy distribution function by new plasma source...

Plasma processing with radio frequency (RF) source and bias signal...

Electric pressure systems for control of plasma properties and unif...

Apparatuses and methods for plasma processing

Ion angle detector

Hybrid electron beam and RF plasma system for controlled content of...

Ruthenium hard mask process

Plasma processing apparatuses having a dielectric injector

Plasma processing apparatuses including multiple electron sources

Systems and methods of control for plasma processing

Self-sustained non-ambipolar direct current (DC) plasma at low power

Non-ambipolar electric pressure plasma uniformity control

Self-sustained non-ambipolar direct current (DC) plasma at low power

Non-ambipolar plasma enhanced DC/VHF phasor

Microwave surface-wave plasma device

Microwave surface-wave plasma device

Non-ambipolar plasma ehncanced DC/VHF phasor

Method and apparatus for providing an anisotropic and mono-energeti...

Method and apparatus for providing an anisotropic and mono-energeti...

Electric pressure systems for control of plasma properties and unif...

Low profile magnetic filter

Variable capacitance chamber component incorporating ferroelectric...

Variable capacitance chamber component incorporating a semiconducto...

Patents Applicationslast 30 patents

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

Plasma Processing with Radio Frequency (RF) Source and Bias Signal...

PLASMA PROCESSING APPARATUSES INCLUDING MULTIPLE ELECTRON SOURCES

APPARATUSES AND METHODS FOR PLASMA PROCESSING

APPARATUSES AND METHODS FOR PLASMA PROCESSING

Tailored Electron Energy Distribution Function by New Plasma Source...

HYBRID ELECTRON BEAM AND RF PLASMA SYSTEM FOR CONTROLLED CONTENT OF...

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

Ruthenium Hard Mask Process

SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER

NON-AMBIPOLAR PLASMA EHNCANCED DC/VHF PHASOR

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

METHOD AND APPARATUS FOR PROVIDING AN ANISOTROPIC AND MONO-ENERGETI...

ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...

NON-AMBIPOLAR PLASMA EHNCANCED DC/VHF PHASOR

SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER

PROCESSING SYSTEM FOR NON-AMBIPOLAR ELECTRON PLASMA (NEP) TREATMENT...

Microwave Surface-Wave Plasma Device

Microwave Surface-Wave Plasma Device

METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING

ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

LOW PROFILE MAGNETIC FILTER

VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING A SEMICONDUCTO...

VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING FERROELECTRIC...