Zhiyou Fang

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for cleaning semiconductor wafers
- Patent number 12,068,149
- Issue date Aug 20, 2024
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate heat treatment apparatus
- Patent number 11,854,842
- Issue date Dec 26, 2023
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting apparatus
- Patent number 10,770,335
- Issue date Sep 8, 2020
- ACM Research (Shanghai) Inc.
- Fufa Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20210249257
- Publication date Aug 12, 2021
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HEAT TREATMENT APPARATUS
- Publication number 20200294825
- Publication date Sep 17, 2020
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING APPARATUS
- Publication number 20190311938
- Publication date Oct 10, 2019
- ACM Research (Shanghai) Inc.
- Fufa Chen
- H01 - BASIC ELECTRIC ELEMENTS