Zhongkui Tan

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor mask reshaping using a sacrificial layer
- Patent number 12,165,878
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for reverse pulsing
- Patent number 11,798,785
- Issue date Oct 24, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional deposition in etch chamber
- Patent number 11,742,212
- Issue date Aug 29, 2023
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide silicon nitride stack stair step etch
- Patent number 11,646,207
- Issue date May 9, 2023
- Lam Research Corporation
- Ce Qin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 11,049,726
- Issue date Jun 29, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous carbon layer opening process
- Patent number 11,037,784
- Issue date Jun 15, 2021
- Lam Research Corporation
- Ce Qin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 10,943,789
- Issue date Mar 9, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-based deposition for semiconductor processing
- Patent number 10,658,194
- Issue date May 19, 2020
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for anisotropic tungsten etching
- Patent number 10,354,888
- Issue date Jul 16, 2019
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near-substrate supplemental plasma density generation with low bias...
- Patent number 10,242,845
- Issue date Mar 26, 2019
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for plasma etching using bi-modal process gas c...
- Patent number 10,177,003
- Issue date Jan 8, 2019
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge roughness reduction
- Patent number 10,020,183
- Issue date Jul 10, 2018
- Lam Research Corporation
- Yansha Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide silicon nitride stack ion-assisted etch
- Patent number 9,997,366
- Issue date Jun 12, 2018
- Lam Research Corporation
- Zhongkui Tan
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Atomic layer etching in continuous plasma
- Patent number 9,991,128
- Issue date Jun 5, 2018
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Line edge roughness improvement with photon-assisted plasma process
- Patent number 9,859,127
- Issue date Jan 2, 2018
- Lam Research Corporation
- Zhongkui Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line edge roughness improvement with sidewall sputtering
- Patent number 9,852,924
- Issue date Dec 26, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 9,824,896
- Issue date Nov 21, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for independent control of radical density, ion...
- Patent number 9,767,991
- Issue date Sep 19, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for reverse pulsing
- Patent number 9,761,459
- Issue date Sep 12, 2017
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma etching using bi-modal process gas c...
- Patent number 9,691,625
- Issue date Jun 27, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic tungsten etching
- Patent number 9,633,867
- Issue date Apr 25, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for reverse pulsing
- Patent number 9,583,357
- Issue date Feb 28, 2017
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER
- Publication number 20240379375
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Xiaofeng SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHING PRE-PROCESSING AND POST-PROCESSING SUBSTRATE SAMPLES
- Publication number 20240112961
- Publication date Apr 4, 2024
- LAM RESEARCH CORPORATION
- Yu Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20240030000
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20220301853
- Publication date Sep 22, 2022
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MASK RESHAPING USING A SACRIFICIAL LAYER
- Publication number 20220076962
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL DEPOSITION IN ETCH CHAMBER
- Publication number 20220028697
- Publication date Jan 27, 2022
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE SILICON NITRIDE STACK STAIR STEP ETCH
- Publication number 20210407811
- Publication date Dec 30, 2021
- LAM RESEARCH CORPORATION
- Ce QIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20210193474
- Publication date Jun 24, 2021
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
AMORPHOUS CARBON LAYER OPENING PROCESS
- Publication number 20210035796
- Publication date Feb 4, 2021
- LAM RESEARCH CORPORATION
- Ce QIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING FOCUSED DEPOSITION DURING A CLEANING PROCESS OF A PROCESS...
- Publication number 20190341275
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Yansha JIN
- B08 - CLEANING
Information Patent Application
Near-Substrate Supplemental Plasma Density Generation with Low Bias...
- Publication number 20180204708
- Publication date Jul 19, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE SILICON NITRIDE STACK ION-ASSISTED ETCH
- Publication number 20180108532
- Publication date Apr 19, 2018
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20180090334
- Publication date Mar 29, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20180076045
- Publication date Mar 15, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING
- Publication number 20180061659
- Publication date Mar 1, 2018
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20180005803
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Reverse Pulsing
- Publication number 20170372912
- Publication date Dec 28, 2017
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE EDGE ROUGHNESS IMPROVEMENT WITH PHOTON-ASSISTED PLASMA PROCESS
- Publication number 20170358456
- Publication date Dec 14, 2017
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...
- Publication number 20170271166
- Publication date Sep 21, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING IN CONTINUOUS PLASMA
- Publication number 20170229311
- Publication date Aug 10, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR ANISOTROPIC TUNGSTEN ETCHING
- Publication number 20170194166
- Publication date Jul 6, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20170125260
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20170125216
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...
- Publication number 20170125253
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20170040176
- Publication date Feb 9, 2017
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Reverse Pulsing
- Publication number 20170040174
- Publication date Feb 9, 2017
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ANISOTROPIC TUNGSTEN ETCHING
- Publication number 20160196985
- Publication date Jul 7, 2016
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS

Zhongkui Tan

Person

Patents Grantslast 30 patents

Methods and systems for advanced ion control for etching processes

Semiconductor mask reshaping using a sacrificial layer

Systems for reverse pulsing

Directional deposition in etch chamber

Silicon oxide silicon nitride stack stair step etch

Methods and systems for advanced ion control for etching processes

Amorphous carbon layer opening process

Methods and systems for advanced ion control for etching processes

Silicon-based deposition for semiconductor processing

Method and apparatus for anisotropic tungsten etching

Near-substrate supplemental plasma density generation with low bias...

Methods and systems for plasma etching using bi-modal process gas c...

Edge roughness reduction

Silicon oxide silicon nitride stack ion-assisted etch

Atomic layer etching in continuous plasma

Line edge roughness improvement with photon-assisted plasma process

Line edge roughness improvement with sidewall sputtering

Methods and systems for advanced ion control for etching processes

Methods and systems for independent control of radical density, ion...

Systems and methods for reverse pulsing

Methods and systems for plasma etching using bi-modal process gas c...

Method and apparatus for anisotropic tungsten etching

Systems and methods for reverse pulsing

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER

MATCHING PRE-PROCESSING AND POST-PROCESSING SUBSTRATE SAMPLES

SYSTEMS AND METHODS FOR REVERSE PULSING

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

SEMICONDUCTOR MASK RESHAPING USING A SACRIFICIAL LAYER

DIRECTIONAL DEPOSITION IN ETCH CHAMBER

SILICON OXIDE SILICON NITRIDE STACK STAIR STEP ETCH

Methods and Systems for Advanced Ion Control for Etching Processes

AMORPHOUS CARBON LAYER OPENING PROCESS

EDGE RING FOCUSED DEPOSITION DURING A CLEANING PROCESS OF A PROCESS...

Near-Substrate Supplemental Plasma Density Generation with Low Bias...

SILICON OXIDE SILICON NITRIDE STACK ION-ASSISTED ETCH

Methods and Systems for Advanced Ion Control for Etching Processes

Methods and Systems for Advanced Ion Control for Etching Processes

SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING

Methods and Systems for Independent Control of Radical Density, Ion...

Systems and Methods for Reverse Pulsing

LINE EDGE ROUGHNESS IMPROVEMENT WITH PHOTON-ASSISTED PLASMA PROCESS

Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...

ATOMIC LAYER ETCHING IN CONTINUOUS PLASMA

METHOD AND APPARATUS FOR ANISOTROPIC TUNGSTEN ETCHING

Methods and Systems for Advanced Ion Control for Etching Processes

Methods and Systems for Independent Control of Radical Density, Ion...

Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...

SYSTEMS AND METHODS FOR REVERSE PULSING

Systems And Methods For Reverse Pulsing

METHOD AND APPARATUS FOR ANISOTROPIC TUNGSTEN ETCHING