Zhou Mei Sheng

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Singapore, SG

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Patents Grantslast 30 patents

Information Patent Grant
Toxic residual gas removal by non-reactive ion sputtering
- Patent number 6,660,642
- Issue date Dec 9, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Zou Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to protect chamber wall from etching by endpoint plasma clean
- Patent number 6,124,927
- Issue date Sep 26, 2000
- Chartered Semiconductor Manufacturing Ltd.
- Qinghua Zhong
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Toxic residual gas removal by non-reactive ion sputtering
- Publication number 20030022504
- Publication date Jan 30, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Zou Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to fabricate a floating gate with a sloping sidewall for a f...
- Publication number 20020000604
- Publication date Jan 3, 2002
- Chartered Semiconductor Manufacturing Ltd.
- Vijai Komar N. Chhagan
- H01 - BASIC ELECTRIC ELEMENTS