Zhuan Liu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical critical dimension target design
- Patent number 9,824,176
- Issue date Nov 21, 2017
- Nanometrics Incorporated
- Jiangtao Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffraction based overlay linearity testing
- Patent number 9,239,523
- Issue date Jan 19, 2016
- Nanometrics Incorporated
- Jie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology with multiple angles of incidence and/or azimuth...
- Patent number 9,115,987
- Issue date Aug 25, 2015
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of a sample using multiple models
- Patent number 8,501,501
- Issue date Aug 6, 2013
- Nanometrics Incorporated
- Ye Feng
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of a sample using multiple models
- Patent number 8,252,608
- Issue date Aug 28, 2012
- Nanometrics Incorporated
- Ye Feng
- G01 - MEASURING TESTING
Information Patent Grant
Modeling conductive patterns using an effective model
- Patent number 8,126,694
- Issue date Feb 28, 2012
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of a sample using multiple models
- Patent number 8,062,910
- Issue date Nov 22, 2011
- Nanometrics Incorporated
- Ye Feng
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of a sample using multiple models
- Patent number 7,465,590
- Issue date Dec 16, 2008
- Nanometrics Incorporated
- Ye Feng
- G01 - MEASURING TESTING
Information Patent Grant
Correction of optical metrology for focus offset
- Patent number 7,450,225
- Issue date Nov 11, 2008
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Grant
Characterizing residue on a sample
- Patent number 7,362,448
- Issue date Apr 22, 2008
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL CRITICAL DIMENSION TARGET DESIGN
- Publication number 20170024509
- Publication date Jan 26, 2017
- Nanometrics Incorporated
- Jiangtao HU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH...
- Publication number 20150153165
- Publication date Jun 4, 2015
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Application
DUAL ANGLES OF INCIDENCE AND AZIMUTH ANGLES OPTICAL METROLOGY
- Publication number 20130242303
- Publication date Sep 19, 2013
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Application
Diffraction Based Overlay Linearity Testing
- Publication number 20110238365
- Publication date Sep 29, 2011
- Nanometrics Incorporated
- Jie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging Diffraction Based Overlay
- Publication number 20090296075
- Publication date Dec 3, 2009
- Nanometrics Incorporated
- Jiangtao Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modeling Conductive Patterns Using An Effective Model
- Publication number 20090276198
- Publication date Nov 5, 2009
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Optical critical dimension target design

Diffraction based overlay linearity testing

Optical metrology with multiple angles of incidence and/or azimuth...

Measurement of a sample using multiple models

Measurement of a sample using multiple models

Modeling conductive patterns using an effective model

Measurement of a sample using multiple models

Measurement of a sample using multiple models

Correction of optical metrology for focus offset

Characterizing residue on a sample

Patents Applicationslast 30 patents

OPTICAL CRITICAL DIMENSION TARGET DESIGN

OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH...

DUAL ANGLES OF INCIDENCE AND AZIMUTH ANGLES OPTICAL METROLOGY

Diffraction Based Overlay Linearity Testing

Imaging Diffraction Based Overlay

Modeling Conductive Patterns Using An Effective Model