Zihui LI

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Three-color 3D DRAM stack and methods of making
- Patent number 11,764,058
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Arvind Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,637,002
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,239,061
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal silicon etch
- Patent number 11,004,689
- Issue date May 11, 2021
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas-phase selective etching systems and methods
- Patent number 10,573,527
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective atomic layer etching of semiconductor materials
- Patent number 10,497,573
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Prerna Sonthalia Goradia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal silicon etch
- Patent number 10,319,600
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective etching of a silicon material
- Patent number 10,249,507
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Zihui Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for selective etching of a silicon material using HF gas wi...
- Patent number 10,204,796
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for anisotropic control of selective silicon removal
- Patent number 10,170,336
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,991,134
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon selective removal
- Patent number 9,881,805
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective etching of a silicon material using HF gas wi...
- Patent number 9,831,097
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,704,723
- Issue date Jul 11, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,659,792
- Issue date May 23, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective etching of a silicon material
- Patent number 9,653,310
- Issue date May 16, 2017
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anisotropic gap etch
- Patent number 9,502,258
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,449,850
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective tungsten removal
- Patent number 9,412,608
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly selective doped oxide removal method
- Patent number 9,406,523
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of silicon nitride
- Patent number 9,209,012
- Issue date Dec 8, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,184,055
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,153,442
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,093,371
- Issue date Jul 28, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,023,732
- Issue date May 5, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective tungsten removal
- Patent number 8,980,763
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of silicon nitride
- Patent number 8,956,980
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING METHODS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINI...
- Publication number 20240290623
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Bin Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATER...
- Publication number 20240282585
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Bin Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-COLOR 3D DRAM STACK AND METHODS OF MAKING
- Publication number 20230102558
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Arvind Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER ADAPTER
- Publication number 20230005765
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Son T. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS
- Publication number 20220020599
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL SILICON ETCH
- Publication number 20190326123
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS-PHASE SELECTIVE ETCHING SYSTEMS AND METHODS
- Publication number 20190311909
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ATOMIC LAYER ETCHING OF SEMICONDUCTOR MATERIALS
- Publication number 20190287808
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Prerna Sonthalia Goradia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...
- Publication number 20180082849
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Nitin K. INGLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY
- Publication number 20170229291
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL
- Publication number 20170229313
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Zihui LI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...
- Publication number 20170178915
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Nitin K. INGLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL
- Publication number 20170133232
- Publication date May 11, 2017
- Applied Materials, Inc.
- Zihui LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON SELECTIVE REMOVAL
- Publication number 20160260616
- Publication date Sep 8, 2016
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANISOTROPIC GAP ETCH
- Publication number 20160181112
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY
- Publication number 20160148821
- Publication date May 26, 2016
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160064233
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160027673
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD
- Publication number 20150371866
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE SILICON OXIDE PATTERNING
- Publication number 20150371861
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Zihui LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150332930
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150235865
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL
- Publication number 20150179464
- Publication date Jun 25, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH OF SILICON NITRIDE
- Publication number 20150079797
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273481
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140262038
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273489
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273406
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273488
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140271097
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Three-color 3D DRAM stack and methods of making

Methods and systems to enhance process uniformity

Methods and systems to enhance process uniformity

Thermal silicon etch

Gas-phase selective etching systems and methods

Selective atomic layer etching of semiconductor materials

Thermal silicon etch

Methods for selective etching of a silicon material

Methods for selective etching of a silicon material using HF gas wi...

Methods for anisotropic control of selective silicon removal

Processing systems and methods for halide scavenging

Silicon selective removal

Methods for selective etching of a silicon material using HF gas wi...

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Methods for selective etching of a silicon material

Anisotropic gap etch

Processing systems and methods for halide scavenging

Dry-etch for selective tungsten removal

Highly selective doped oxide removal method

Selective etch of silicon nitride

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Dry-etch for selective tungsten removal

Selective etch of silicon nitride

Patents Applicationslast 30 patents

PROCESSING METHODS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINI...

TREATMENTS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATER...

THREE-COLOR 3D DRAM STACK AND METHODS OF MAKING

SEMICONDUCTOR PROCESSING CHAMBER ADAPTER

INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS

THERMAL SILICON ETCH

GAS-PHASE SELECTIVE ETCHING SYSTEMS AND METHODS

SELECTIVE ATOMIC LAYER ETCHING OF SEMICONDUCTOR MATERIALS

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...

METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL USING HF GAS WI...

METHODS FOR SELECTIVE ETCHING OF A SILICON MATERIAL

SILICON SELECTIVE REMOVAL

ANISOTROPIC GAP ETCH

METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD

PROTECTIVE SILICON OXIDE PATTERNING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL

SELECTIVE ETCH OF SILICON NITRIDE

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING