Ziqing DUAN

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 11,728,168
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 11,488,856
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 11,094,544
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SiBN film for conformal hermetic dielectric encapsulation without d...
- Patent number 11,011,371
- Issue date May 18, 2021
- Applied Materials, Inc.
- Milind Gadre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high modulus and etch selectivity boron carbon hardmask films
- Patent number 10,971,364
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Geometric control of bottom-up pillars for patterning applications
- Patent number 10,930,503
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,930,475
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,886,172
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of lowering wordline resistance
- Patent number 10,854,511
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Yihong Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods of forming self-aligned vias and air gaps
- Patent number 10,840,186
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 10,811,303
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming tungsten pillars
- Patent number 10,784,107
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension control for self-aligned contact patterning
- Patent number 10,770,349
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition and treatment of films for patterning
- Patent number 10,699,952
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition for simplified process flow of pillar formation
- Patent number 10,636,659
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,622,251
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seamless tungsten fill by tungsten oxidation-reduction
- Patent number 10,559,497
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for enabling self-aligned lithography on metal contacts and...
- Patent number 10,490,411
- Issue date Nov 26, 2019
- Applied Materials, Inc.
- Kurtis Leschkies
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 10,418,243
- Issue date Sep 17, 2019
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Borane mediated dehydrogenation process from silane and alkylsilane...
- Patent number 10,410,872
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 10,410,865
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias and air gaps
- Patent number 10,403,542
- Issue date Sep 3, 2019
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas flow profile modulated control of overlay in plasma CVD films
- Patent number 10,373,822
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for wordline separation in 3D-NAND devices
- Patent number 10,354,916
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometric control of bottom-up pillars for patterning applications
- Patent number 10,319,591
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for self-aligned patterning
- Patent number 10,319,604
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition and treatment of films for patterning
- Patent number 10,319,636
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in high aspect ratio structures
- Patent number 10,192,775
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded in-situ charge trapping layers to enable electrostatic chuck...
- Patent number 10,128,088
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge hump reduction faceplate by plasma modulation
- Patent number 10,100,408
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Sungwon Ha
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS
- Publication number 20230317455
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS
- Publication number 20210225650
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Gapfill In High Aspect Ratio Structures
- Publication number 20210028055
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20210013038
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Wordline Separation in 3D-NAND Devices
- Publication number 20200243382
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20190385849
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Self-Aligned Vias And Air Gaps
- Publication number 20190348368
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR WORDLINE SEPARATION IN 3D-NAND DEVICES
- Publication number 20190333810
- Publication date Oct 31, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIBN FILM FOR CONFORMAL HERMETIC DIELECTRIC ENCAPSULATION WITHOUT D...
- Publication number 20190326110
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Milind GADRE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCK...
- Publication number 20190252158
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Geometric Control Of Bottom-Up Pillars For Patterning Applications
- Publication number 20190252188
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Self-Aligned Patterning
- Publication number 20190252206
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition And Treatment Of Films For Patterning
- Publication number 20190252252
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Gapfill In High Aspect Ratio Structures
- Publication number 20190157134
- Publication date May 23, 2019
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS
- Publication number 20190122889
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20190013202
- Publication date Jan 10, 2019
- APPLIED MATERIALS,INC.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Self-Aligned Vias And Air Gaps
- Publication number 20180358260
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Seamless Tungsten Fill By Tungsten Oxidation-Reduction
- Publication number 20180358264
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Wordline Separation in 3D-NAND Devices
- Publication number 20180350671
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Lowering Wordline Resistance
- Publication number 20180350606
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ENABLING SELF-ALIGNED LITHOGRAPHY ON METAL CONTACTS AND...
- Publication number 20180337061
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Kurtis LESCHKIES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Tungsten Pillars
- Publication number 20180323068
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical Dimension Control For Self-Aligned Contact Patterning
- Publication number 20180240706
- Publication date Aug 23, 2018
- Applied Materials, Inc.
- Abhijit Basu Mallick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition And Treatment Of Films For Patterning
- Publication number 20180144980
- Publication date May 24, 2018
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Geometric Control Of Bottom-Up Pillars For Patterning Applications
- Publication number 20180130657
- Publication date May 10, 2018
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Self-Aligned Patterning
- Publication number 20180130671
- Publication date May 10, 2018
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FLOW PROFILE MODULATED CONTROL OF OVERLAY IN PLASMA CVD FILMS
- Publication number 20180096843
- Publication date Apr 5, 2018
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20180096847
- Publication date Apr 5, 2018
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORANE MEDIATED DEHYDROGENATION PROCESS FROM SILANE AND ALKYLSILANE...
- Publication number 20180076042
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Rui CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Gapfill In High Aspect Ratio Structures
- Publication number 20170271196
- Publication date Sep 21, 2017
- Applied Materials, Inc.
- Pramit Manna
- H01 - BASIC ELECTRIC ELEMENTS

Ziqing DUAN

Person

Patents Grantslast 30 patents

Ultra-high modulus and etch selectivity boron-carbon hardmask films

Methods for gapfill in high aspect ratio structures

Methods of forming self-aligned vias

SiBN film for conformal hermetic dielectric encapsulation without d...

Ultra-high modulus and etch selectivity boron carbon hardmask films

Geometric control of bottom-up pillars for patterning applications

Graded in-situ charge trapping layers to enable electrostatic chuck...

Methods for wordline separation in 3D-NAND devices

Methods of lowering wordline resistance

Methods of forming self-aligned vias and air gaps

Methods for gapfill in high aspect ratio structures

Methods of forming tungsten pillars

Critical dimension control for self-aligned contact patterning

Deposition and treatment of films for patterning

Selective deposition for simplified process flow of pillar formation

Methods for wordline separation in 3D-NAND devices

Seamless tungsten fill by tungsten oxidation-reduction

Method for enabling self-aligned lithography on metal contacts and...

Ultra-high modulus and etch selectivity boron-carbon hardmask films

Borane mediated dehydrogenation process from silane and alkylsilane...

Methods of forming self-aligned vias

Methods of forming self-aligned vias and air gaps

Gas flow profile modulated control of overlay in plasma CVD films

Methods for wordline separation in 3D-NAND devices

Geometric control of bottom-up pillars for patterning applications

Methods for self-aligned patterning

Deposition and treatment of films for patterning

Methods for gapfill in high aspect ratio structures

Graded in-situ charge trapping layers to enable electrostatic chuck...

Edge hump reduction faceplate by plasma modulation

Patents Applicationslast 30 patents

ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS

ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS

Methods For Gapfill In High Aspect Ratio Structures

Methods of Forming Tungsten Pillars

Methods for Wordline Separation in 3D-NAND Devices

Methods Of Forming Self-Aligned Vias

Methods Of Forming Self-Aligned Vias And Air Gaps

METHODS FOR WORDLINE SEPARATION IN 3D-NAND DEVICES

SIBN FILM FOR CONFORMAL HERMETIC DIELECTRIC ENCAPSULATION WITHOUT D...

GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCK...

Geometric Control Of Bottom-Up Pillars For Patterning Applications

Methods For Self-Aligned Patterning

Deposition And Treatment Of Films For Patterning

Methods For Gapfill In High Aspect Ratio Structures

ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS

Methods Of Forming Self-Aligned Vias

Methods Of Forming Self-Aligned Vias And Air Gaps

Seamless Tungsten Fill By Tungsten Oxidation-Reduction

Methods For Wordline Separation in 3D-NAND Devices

Methods Of Lowering Wordline Resistance

METHOD FOR ENABLING SELF-ALIGNED LITHOGRAPHY ON METAL CONTACTS AND...

Methods of Forming Tungsten Pillars

Critical Dimension Control For Self-Aligned Contact Patterning

Deposition And Treatment Of Films For Patterning

Geometric Control Of Bottom-Up Pillars For Patterning Applications

Methods For Self-Aligned Patterning

GAS FLOW PROFILE MODULATED CONTROL OF OVERLAY IN PLASMA CVD FILMS

Methods Of Forming Self-Aligned Vias

BORANE MEDIATED DEHYDROGENATION PROCESS FROM SILANE AND ALKYLSILANE...

Methods For Gapfill In High Aspect Ratio Structures