Ziwei Fang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Techniques for temperature-controlled ion implantation
- Patent number 8,450,193
- Issue date May 28, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring plasma ion implantation systems for fault detection and...
- Patent number 7,878,145
- Issue date Feb 1, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile adjustment in plasma ion implanter
- Patent number 7,687,787
- Issue date Mar 30, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile adjustment in plasma ion implanter
- Patent number 7,528,389
- Issue date May 5, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for monitoring and controlling a plasma process
- Patent number 7,476,849
- Issue date Jan 13, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for monitoring and controlling a plasma process
- Patent number 7,453,059
- Issue date Nov 18, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for stable and repeatable ion implantation
- Patent number 7,396,746
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Technique for boron implantation
- Patent number 7,397,048
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,528,805
- Issue date Mar 4, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low voltage plasma doping using dual pulses
- Patent number 6,527,918
- Issue date Mar 4, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode for plasma doping system
- Patent number 6,500,496
- Issue date Dec 31, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for low voltage plasma doping using dual pulses
- Patent number 6,335,536
- Issue date Jan 1, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,300,643
- Issue date Oct 9, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode for plasma doping system
- Patent number 6,182,604
- Issue date Feb 6, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Matthew J. Goeckner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Technique for Monitoring and Controlling A PLasma Process
- Publication number 20090283670
- Publication date Nov 19, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping System With Charge Control
- Publication number 20090104761
- Publication date Apr 23, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Yongbae Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE NEUTRALIZATION IN A PLASMA PROCESSING APPARATUS
- Publication number 20090084987
- Publication date Apr 2, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE ADJUSTMENT IN PLASMA ION IMPLANTER
- Publication number 20090061605
- Publication date Mar 5, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION
- Publication number 20080044257
- Publication date Feb 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monitoring plasma ion implantation systems for fault detection and...
- Publication number 20080026133
- Publication date Jan 31, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Monitoring and Controlling a Plasma Process
- Publication number 20070227231
- Publication date Oct 4, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for monitoring and controlling a plasma process
- Publication number 20070210248
- Publication date Sep 13, 2007
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Profile adjustment in plasma ion implanter
- Publication number 20060289799
- Publication date Dec 28, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma ion implantation system with axial electrostatic confinement
- Publication number 20060121704
- Publication date Jun 8, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Technique for boron implantation
- Publication number 20060063360
- Publication date Mar 23, 2006
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch and deposition control for plasma implantation
- Publication number 20050287307
- Publication date Dec 29, 2005
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for stable and repeatable ion implantation
- Publication number 20050260837
- Publication date Nov 24, 2005
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for monitoring plasma parameters in plasma do...
- Publication number 20040016402
- Publication date Jan 29, 2004
- Steven R. Walther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming ultra shallow junctions
- Publication number 20030096490
- Publication date May 22, 2003
- John Borland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing SOI materials
- Publication number 20020098664
- Publication date Jul 25, 2002
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for low voltage plasma doping using dual pulses
- Publication number 20020066668
- Publication date Jun 6, 2002
- Matthew J. Goeckner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose monitor for plasma doping system
- Publication number 20010042827
- Publication date Nov 22, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Techniques for temperature-controlled ion implantation

Monitoring plasma ion implantation systems for fault detection and...

Profile adjustment in plasma ion implanter

Profile adjustment in plasma ion implanter

Technique for monitoring and controlling a plasma process

Technique for monitoring and controlling a plasma process

Methods for stable and repeatable ion implantation

Technique for boron implantation

Dose monitor for plasma doping system

Method and apparatus for low voltage plasma doping using dual pulses

Hollow cathode for plasma doping system

Method and apparatus for low voltage plasma doping using dual pulses

Dose monitor for plasma doping system

Hollow cathode for plasma doping system

Patents Applicationslast 30 patents

Technique for Monitoring and Controlling A PLasma Process

Plasma Doping System With Charge Control

CHARGE NEUTRALIZATION IN A PLASMA PROCESSING APPARATUS

PROFILE ADJUSTMENT IN PLASMA ION IMPLANTER

TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION

Monitoring plasma ion implantation systems for fault detection and...

Technique for Monitoring and Controlling a Plasma Process

Technique for monitoring and controlling a plasma process

Profile adjustment in plasma ion implanter

Plasma ion implantation system with axial electrostatic confinement

Technique for boron implantation

Etch and deposition control for plasma implantation

Methods for stable and repeatable ion implantation

Methods and apparatus for monitoring plasma parameters in plasma do...

Method of forming ultra shallow junctions

Method of producing SOI materials

Method and apparatus for low voltage plasma doping using dual pulses

Dose monitor for plasma doping system