Zoilo C. H. Tan

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Rochester, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Electron-beam and X-ray sensitive polymers and resists
- Patent number 4,568,734
- Issue date Feb 4, 1986
- Eastman Kodak Company
- Zoilo C. Tan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working polymers useful as electron beam resists
- Patent number 4,289,842
- Issue date Sep 15, 1981
- Eastman Kodak Company
- Zoilo C. H. Tan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...