Acrylic acid esters Methacrylic acid esters Haloacrylic acid esters Halomethacrylic acid esters

Industry

CPC
C07C69/653

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Parent Industries

CCHEMISTRY METALLURGY C07Organic chemistry C07CACYCLIC OR CARBOCYCLIC COMPOUNDS C07C69/00Esters of carboxylic acids Esters of carbonic or haloformic acids

Current Industry

C07C69/653Acrylic acid esters Methacrylic acid esters Haloacrylic acid esters Halomethacrylic acid esters

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Compound, resin precursor, cured object, optical element, optical s...
- Patent number 12,139,646
- Issue date Nov 12, 2024
- Nikon Corporation
- Yoshihiro Someya
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Fluorine compounds
- Patent number 11,898,058
- Issue date Feb 13, 2024
- Merck Patent GmbH
- Reiner Friedrich
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Information Patent Grant
Polymerizable compound as well as liquid crystal composition and li...
- Patent number 11,739,270
- Issue date Aug 29, 2023
- DIC Corporation
- Masanao Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
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- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomers, polymers and photoresist compositions
- Patent number 11,480,878
- Issue date Oct 25, 2022
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui Hyun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing compound having unsaturated bond, and surface m...
- Patent number 11,352,457
- Issue date Jun 7, 2022
- TOSOH FINECHEM CORPORATION
- Shinichiro Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Fluorine compounds
- Patent number 11,118,066
- Issue date Sep 14, 2021
- Merck Patent GmbH
- Reiner Friedrich
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Calixarene compound and curable composition
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(Meth)acrylate compound, polymer, resist material, and method for p...
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- Issue date Jun 1, 2021
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Method for producing α-fluoro acrylic acid ester, and composition c...
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- Issue date Apr 20, 2021
- AGC Inc.
- Takashi Akiya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Rapid self-assembled small-sized block polymer material with low qu...
- Patent number 10,975,188
- Issue date Apr 13, 2021
- Fudan University
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Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 10,774,029
- Issue date Sep 15, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
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Information Patent Grant
Polymerizable compound, liquid crystal medium containing same and l...
- Patent number 10,759,997
- Issue date Sep 1, 2020
- SHIJIAZHUANG CHENGZHI YONGHUA DISPLAY MATERIAL CO., LTD.
- Jinsong Meng
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for preparing fluorinated methacrylate compound
- Patent number 10,752,574
- Issue date Aug 25, 2020
- Samhwa Paints Industries Co., Ltd.
- Sung Hyun Ko
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine compounds
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- Issue date Jun 23, 2020
- Merck Patent GmbH
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- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,591,819
- Issue date Mar 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition containing acrylic acid derivative, and method for stab...
- Patent number 10,577,302
- Issue date Mar 3, 2020
- Daikin Industries, Ltd.
- Makoto Matsuura
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Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,527,939
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- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
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Composition
- Patent number 10,173,960
- Issue date Jan 8, 2019
- Daikin Industries, Ltd.
- Tomohito Hamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acrylic acid derivative-containing composition, and method for stab...
- Patent number 10,099,997
- Issue date Oct 16, 2018
- Daikin Industries, Ltd.
- Tomohito Hamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable compound, polymerizable composition and liquid crysta...
- Patent number 10,077,401
- Issue date Sep 18, 2018
- JNC Corporation
- Masahide Kobayashi
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Information Patent Grant
Method for purifying acrylic acid derivative
- Patent number 10,065,917
- Issue date Sep 4, 2018
- Daikin Industries, Ltd.
- Makoto Matsuura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,951,159
- Issue date Apr 24, 2018
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymerisable compounds and the use thereof in liquid-crystal displays
- Patent number 9,938,229
- Issue date Apr 10, 2018
- Merck Patent GmbH
- Eveline Baron
- G02 - OPTICS
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,857,683
- Issue date Jan 2, 2018
- Sumitomo Chemical Company, Limited
- Mitsuyoshi Ochiai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, resin, resist composition and method for producing resist pat...
- Patent number 9,809,669
- Issue date Nov 7, 2017
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reactive monomer, a liquid crystal panel and an electronic equipment
- Patent number 9,725,650
- Issue date Aug 8, 2017
- Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Xiang Li
- G02 - OPTICS
Information Patent Grant
Positive resist composition, resin used for the positive resist com...
- Patent number 9,709,891
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 9,671,692
- Issue date Jun 6, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymerizable compound, polymerizable composition and liquid crysta...
- Patent number 9,637,578
- Issue date May 2, 2017
- JNC Corporation
- Yasuyuki Gotoh
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Method for Producing Fluorine-Containing Polymer and Composition
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...
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COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTE...
- Publication number 20230174688
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- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C07 - ORGANIC CHEMISTRY
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INHIBITORS OF ANTIBIOTIC RESISTANCE MEDIATED BY ARNT
- Publication number 20220259249
- Publication date Aug 18, 2022
- UNIVERSITA DEGLI STUDI DI ROMA "LA SAPIENZA"
- Francesco IMPERI
- C07 - ORGANIC CHEMISTRY
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Liquid Crystal Mixture and Liquid Crystal Display
- Publication number 20220251448
- Publication date Aug 11, 2022
- Merck Patent GmbH
- Lars LIETZAU
- C07 - ORGANIC CHEMISTRY
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COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND...
- Publication number 20220119336
- Publication date Apr 21, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY,...
- Publication number 20210399340
- Publication date Dec 23, 2021
- DAIKIN INDUSTRIES, LTD.
- Yoshiko KUWAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
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FLUORINE COMPOUNDS
- Publication number 20210340383
- Publication date Nov 4, 2021
- Merck Patent GmbH
- Reiner FRIEDRICH
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CON...
- Publication number 20210341839
- Publication date Nov 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...
- Publication number 20210206901
- Publication date Jul 8, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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POLYMERIZABLE COMPOUND AS WELL AS LIQUID CRYSTAL COMPOSITION AND LI...
- Publication number 20200399539
- Publication date Dec 24, 2020
- DIC CORPORATION
- Masanao Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED...
- Publication number 20200283351
- Publication date Sep 10, 2020
- Arkema Inc.
- Benjamin Bin CHEN
- C07 - ORGANIC CHEMISTRY
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(METH)ACRYLATE COMPOUND, POLYMER, RESIST MATERIAL, AND METHOD FOR P...
- Publication number 20200223782
- Publication date Jul 16, 2020
- JNC CORPORATION
- DAISUKE INOKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200004143
- Publication date Jan 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CALIXARENE COMPOUND AND CURABLE COMPOSITION
- Publication number 20190276421
- Publication date Sep 12, 2019
- DIC CORPORATION
- Shinya Yamamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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METHOD FOR PRODUCING ALPHA-FLUORO ACRYLIC ACID ESTER, AND COMPOSITI...
- Publication number 20190263746
- Publication date Aug 29, 2019
- AGC INC.
- Takashi AKIYA
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MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190235381
- Publication date Aug 1, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
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METHOD FOR PURIFYING ACRYLIC ACID DERIVATIVE
- Publication number 20180222843
- Publication date Aug 9, 2018
- DAIKIN INDUSTRIES, LTD.
- Makoto MATSUURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Rapid self-assembled small-sized block polymer material with low qu...
- Publication number 20180208697
- Publication date Jul 26, 2018
- Fudan University
- Hai DENG
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION CONTAINING ACRYLIC ACID DERIVATIVE, AND METHOD FOR STAB...
- Publication number 20180134648
- Publication date May 17, 2018
- DAIKIN INDUSTRIES, LTD.
- Makoto MATSUURA
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COMPOSITION
- Publication number 20180099922
- Publication date Apr 12, 2018
- DAIKIN INDUSTRIES, LTD.
- Tomohito HAMADA
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Information Patent Application
ACRYLIC ACID DERIVATIVE-CONTAINING COMPOSITION, AND METHOD FOR STAB...
- Publication number 20180093940
- Publication date Apr 5, 2018
- DAIKIN INDUSTRIES, LTD.
- Tomohito HAMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20180059545
- Publication date Mar 1, 2018
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui Hyun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE COMPOUNDS
- Publication number 20170349760
- Publication date Dec 7, 2017
- Merck Patent GmbH
- Reiner FRIEDRICH
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FLUORINE COMPOUNDS
- Publication number 20170349761
- Publication date Dec 7, 2017
- Merck Patent GmbH
- Reiner FRIEDRICH
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PRODUCTION METHOD FOR ALPHA-FLUORO ACRYLIC ACID ESTERS
- Publication number 20170267626
- Publication date Sep 21, 2017
- DAIKIN INDUSTRIES, LTD.
- Akihiro GOTOU
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MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170131635
- Publication date May 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
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Information Patent Application
A Reactive Monomer, A Liquid Crystal Panel And An Electronic Equipment
- Publication number 20160340583
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- Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Xiang LI
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COMPOUND, RESIN AND PHOTORESIST COMPOSITION
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- Sumitomo Chemical Company, Limited
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POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION AND LIQUID CRYSTA...
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Acrylic acid esters Methacrylic acid esters Haloacrylic acid esters Halomethacrylic acid esters

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Compound, resin precursor, cured object, optical element, optical s...

Fluorine compounds

Polymerizable compound as well as liquid crystal composition and li...

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Monomers, polymers and photoresist compositions

Fluorine-containing compound having unsaturated bond, and surface m...

Fluorine compounds

Calixarene compound and curable composition

(Meth)acrylate compound, polymer, resist material, and method for p...

Method for producing α-fluoro acrylic acid ester, and composition c...

Rapid self-assembled small-sized block polymer material with low qu...

Compound, resin, resist composition and method for producing resist...

Polymerizable compound, liquid crystal medium containing same and l...

Method for preparing fluorinated methacrylate compound

Fluorine compounds

Monomer, polymer, resist composition, and patterning process

Composition containing acrylic acid derivative, and method for stab...

Monomer, polymer, resist composition, and patterning process

Composition

Acrylic acid derivative-containing composition, and method for stab...

Polymerizable compound, polymerizable composition and liquid crysta...

Method for purifying acrylic acid derivative

Compound, resin, resist composition and method for producing resist...

Polymerisable compounds and the use thereof in liquid-crystal displays

Compound, resin, resist composition and method for producing resist...

Salt, resin, resist composition and method for producing resist pat...

Reactive monomer, a liquid crystal panel and an electronic equipment

Positive resist composition, resin used for the positive resist com...

Compound, resin and photoresist composition

Polymerizable compound, polymerizable composition and liquid crysta...

Patents Applicationslast 30 patents

Method for Producing Fluorine-Containing Polymer and Composition

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTE...

INHIBITORS OF ANTIBIOTIC RESISTANCE MEDIATED BY ARNT

Liquid Crystal Mixture and Liquid Crystal Display

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND...

ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY,...

FLUORINE COMPOUNDS

FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CON...

COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...

POLYMERIZABLE COMPOUND AS WELL AS LIQUID CRYSTAL COMPOSITION AND LI...

HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED...

(METH)ACRYLATE COMPOUND, POLYMER, RESIST MATERIAL, AND METHOD FOR P...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

CALIXARENE COMPOUND AND CURABLE COMPOSITION

METHOD FOR PRODUCING ALPHA-FLUORO ACRYLIC ACID ESTER, AND COMPOSITI...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

METHOD FOR PURIFYING ACRYLIC ACID DERIVATIVE

Rapid self-assembled small-sized block polymer material with low qu...

COMPOSITION CONTAINING ACRYLIC ACID DERIVATIVE, AND METHOD FOR STAB...

COMPOSITION

ACRYLIC ACID DERIVATIVE-CONTAINING COMPOSITION, AND METHOD FOR STAB...

MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS

FLUORINE COMPOUNDS

FLUORINE COMPOUNDS

PRODUCTION METHOD FOR ALPHA-FLUORO ACRYLIC ACID ESTERS

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

A Reactive Monomer, A Liquid Crystal Panel And An Electronic Equipment

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION AND LIQUID CRYSTA...