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Adaptation to extreme pressure conditions
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CPC
H01J37/3494
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Parent Industries
H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
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H01J37/3494
Adaptation to extreme pressure conditions
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma generation apparatus
Patent number
10,674,592
Issue date
Jun 2, 2020
Electronics and Telecommunications Research Institute
Yark Yeon Kim
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Collimated deposition apparatus
Patent number
6,521,106
Issue date
Feb 18, 2003
Novellus Systems, Inc.
Geri M. Actor
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Sputtering method and apparatus for depositing a coating onto subst...
Patent number
6,423,191
Issue date
Jul 23, 2002
Thin Films, Ltd.
Boris Sorokov
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetron for low pressure, full face erosion
Patent number
6,228,235
Issue date
May 8, 2001
Applied Materials, Inc.
Avi Tepman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetron for low pressure full face erosion
Patent number
5,907,220
Issue date
May 25, 1999
Applied Materials, Inc.
Avi Tepman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetron plasma processing apparatus and processing method
Patent number
5,888,338
Issue date
Mar 30, 1999
Tokyo Electron Limited
Hiromi Harada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low pressure reactive magnetron sputtering apparatus and method
Patent number
5,851,365
Issue date
Dec 22, 1998
Corning OCA Corporation
Michael A. Scobey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for improved low pressure collimated magnetron...
Patent number
5,702,573
Issue date
Dec 30, 1997
Varian Associates, Inc.
Maximilian Biberger
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetron plasma processing apparatus and processing method
Patent number
5,660,671
Issue date
Aug 26, 1997
Tokyo Electron Limited
Hiromi Harada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Very high vacuum magnetron sputtering method and apparatus for prec...
Patent number
5,656,138
Issue date
Aug 12, 1997
The Optical Corporation of America
Michael A. Scobey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Collimated deposition apparatus and method
Patent number
5,635,036
Issue date
Jun 3, 1997
Varian Associates, Inc.
R. Ernest Demaray
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetron sputtering source for low pressure operation
Patent number
5,593,551
Issue date
Jan 14, 1997
Varian Associates, Inc.
Kwok F. Lai
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Low pressure reactive magnetron sputtering apparatus and method
Patent number
5,525,199
Issue date
Jun 11, 1996
Optical Corporation of America
Michael A. Scobey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Microwave plasma source
Patent number
5,480,533
Issue date
Jan 2, 1996
Matsushita Electric Industrial Co., Ltd.
Yoshikazu Yoshida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetron plasma processing apparatus and processing method
Patent number
5,376,211
Issue date
Dec 27, 1994
Tokyo Electron Limited
Hiromi Harada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Collimated deposition apparatus and method
Patent number
5,330,628
Issue date
Jul 19, 1994
Varian Associates, Inc.
R. Ernest Demaray
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Rotating sputtering apparatus for selected erosion
Patent number
5,252,194
Issue date
Oct 12, 1993
Varian Associates, Inc.
Richard E. Demaray
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetically enhanced sputtering device
Patent number
4,265,729
Issue date
May 5, 1981
Vac-Tec Systems, Inc.
Charles F. Morrison
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Planar magnetron sputtering device
Patent number
4,180,450
Issue date
Dec 25, 1979
Vac-Tec Systems, Inc.
Charles F. Morrison
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Planar magnetron sputtering device
Patent number
4,162,954
Issue date
Jul 31, 1979
Vac-Tec Systems, Inc.
Charles F. Morrison
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA GENERATION APPARATUS
Publication number
20200107430
Publication date
Apr 2, 2020
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
Yark Yeon KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR
Publication number
20180211823
Publication date
Jul 26, 2018
Applied Materials, Inc.
Daniel SEVERIN
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Sputtering method and apparatus for depositing a coating onto subst...
Publication number
20020148941
Publication date
Oct 17, 2002
Boris Sorokov
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...