Adaptation to extreme pressure conditions

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CPC
H01J37/3494

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3494Adaptation to extreme pressure conditions

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Patents Grantslast 30 patents

Information Patent Grant
Plasma generation apparatus
- Patent number 10,674,592
- Issue date Jun 2, 2020
- Electronics and Telecommunications Research Institute
- Yark Yeon Kim
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Collimated deposition apparatus
- Patent number 6,521,106
- Issue date Feb 18, 2003
- Novellus Systems, Inc.
- Geri M. Actor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering method and apparatus for depositing a coating onto subst...
- Patent number 6,423,191
- Issue date Jul 23, 2002
- Thin Films, Ltd.
- Boris Sorokov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron for low pressure, full face erosion
- Patent number 6,228,235
- Issue date May 8, 2001
- Applied Materials, Inc.
- Avi Tepman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron for low pressure full face erosion
- Patent number 5,907,220
- Issue date May 25, 1999
- Applied Materials, Inc.
- Avi Tepman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,888,338
- Issue date Mar 30, 1999
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low pressure reactive magnetron sputtering apparatus and method
- Patent number 5,851,365
- Issue date Dec 22, 1998
- Corning OCA Corporation
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for improved low pressure collimated magnetron...
- Patent number 5,702,573
- Issue date Dec 30, 1997
- Varian Associates, Inc.
- Maximilian Biberger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,660,671
- Issue date Aug 26, 1997
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very high vacuum magnetron sputtering method and apparatus for prec...
- Patent number 5,656,138
- Issue date Aug 12, 1997
- The Optical Corporation of America
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Collimated deposition apparatus and method
- Patent number 5,635,036
- Issue date Jun 3, 1997
- Varian Associates, Inc.
- R. Ernest Demaray
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering source for low pressure operation
- Patent number 5,593,551
- Issue date Jan 14, 1997
- Varian Associates, Inc.
- Kwok F. Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low pressure reactive magnetron sputtering apparatus and method
- Patent number 5,525,199
- Issue date Jun 11, 1996
- Optical Corporation of America
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source
- Patent number 5,480,533
- Issue date Jan 2, 1996
- Matsushita Electric Industrial Co., Ltd.
- Yoshikazu Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,376,211
- Issue date Dec 27, 1994
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collimated deposition apparatus and method
- Patent number 5,330,628
- Issue date Jul 19, 1994
- Varian Associates, Inc.
- R. Ernest Demaray
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating sputtering apparatus for selected erosion
- Patent number 5,252,194
- Issue date Oct 12, 1993
- Varian Associates, Inc.
- Richard E. Demaray
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced sputtering device
- Patent number 4,265,729
- Issue date May 5, 1981
- Vac-Tec Systems, Inc.
- Charles F. Morrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar magnetron sputtering device
- Patent number 4,180,450
- Issue date Dec 25, 1979
- Vac-Tec Systems, Inc.
- Charles F. Morrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar magnetron sputtering device
- Patent number 4,162,954
- Issue date Jul 31, 1979
- Vac-Tec Systems, Inc.
- Charles F. Morrison
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA GENERATION APPARATUS
- Publication number 20200107430
- Publication date Apr 2, 2020
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Yark Yeon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR
- Publication number 20180211823
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Daniel SEVERIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering method and apparatus for depositing a coating onto subst...
- Publication number 20020148941
- Publication date Oct 17, 2002
- Boris Sorokov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Adaptation to extreme pressure conditions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma generation apparatus

Collimated deposition apparatus

Sputtering method and apparatus for depositing a coating onto subst...

Magnetron for low pressure, full face erosion

Magnetron for low pressure full face erosion

Magnetron plasma processing apparatus and processing method

Low pressure reactive magnetron sputtering apparatus and method

Method and apparatus for improved low pressure collimated magnetron...

Magnetron plasma processing apparatus and processing method

Very high vacuum magnetron sputtering method and apparatus for prec...

Collimated deposition apparatus and method

Magnetron sputtering source for low pressure operation

Low pressure reactive magnetron sputtering apparatus and method

Microwave plasma source

Magnetron plasma processing apparatus and processing method

Collimated deposition apparatus and method

Rotating sputtering apparatus for selected erosion

Magnetically enhanced sputtering device

Planar magnetron sputtering device

Planar magnetron sputtering device

Patents Applicationslast 30 patents

PLASMA GENERATION APPARATUS

APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR

Sputtering method and apparatus for depositing a coating onto subst...