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Focused Ion Beam System
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Publication number 20250239433
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Publication date Jul 24, 2025
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JEOL Ltd.
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Norimasa Sakuta
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H01 - BASIC ELECTRIC ELEMENTS
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ION BEAM PROCESSING SYSTEM
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Publication number 20250239432
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Publication date Jul 24, 2025
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Samsung Electronics Co., Ltd.
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Backkyu Choi
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H01 - BASIC ELECTRIC ELEMENTS
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CHARGED PARTICLE BEAM DEVICE
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Publication number 20250239430
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Publication date Jul 24, 2025
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HITACHI HIGH-TECH CORPORATION
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Takafumi MIWA
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H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING METHOD
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Publication number 20250239437
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Publication date Jul 24, 2025
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Hitachi High-Tech Corporation
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Makoto SATAKE
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H01 - BASIC ELECTRIC ELEMENTS
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PLASMA MULTI-WAFER ASHING SYSTEM
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Publication number 20250237959
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Publication date Jul 24, 2025
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Rockwell Collins, Inc.
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Mark J. Reimer
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Shield for an Ion Implanter
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Publication number 20250232949
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Publication date Jul 17, 2025
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Applied Materials, Inc.
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Tseh-Jen Hsieh
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H01 - BASIC ELECTRIC ELEMENTS
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WAFER PROCESSING APPARATUS
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Publication number 20250232966
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Publication date Jul 17, 2025
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Hitachi High-Tech Corporation
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Yutaka KADOMOTO
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B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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ADC CALIBRATION FOR MICROSCOPY
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Publication number 20250233597
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Publication date Jul 17, 2025
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ASML NETHERLANDS B.V.
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Hindrik Willem MOOK
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H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING DEVICE
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Publication number 20250232956
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Publication date Jul 17, 2025
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TOKYO ELECTRON LIMITED
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Nozomu NAGASHIMA
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H01 - BASIC ELECTRIC ELEMENTS
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