affecting masks

Industry

CPC
H01J2237/31794

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31794affecting masks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method, apparatus and computer program for analyzing and/or process...
- Patent number 12,105,415
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Oliver Jäckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital pattern generator having charge drain coating
- Patent number 10,072,334
- Issue date Sep 11, 2018
- KLA-Tencor Corporation
- William M. Tong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Charge drain coating for electron-optical MEMS
- Patent number 9,824,851
- Issue date Nov 21, 2017
- William M. Tong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Modeling and correcting short-range and long-range effects in E-bea...
- Patent number 9,484,186
- Issue date Nov 1, 2016
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,159,555
- Issue date Oct 13, 2015
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus and method, and article...
- Patent number 8,772,734
- Issue date Jul 8, 2014
- Canon Kabushiki Kaisha
- Toshiro Yamanaka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask for multi-column electron beam exposure, and electron beam exp...
- Patent number 8,196,067
- Issue date Jun 5, 2012
- Advantest Corp.
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Transfer mask for exposure and pattern exchanging method of the same
- Patent number 7,862,959
- Issue date Jan 4, 2011
- Octec Inc.
- Katsuya Okumura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam irradiation device
- Patent number 7,829,863
- Issue date Nov 9, 2010
- Kyoto University
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank for charged particle beam exposure, method of forming ma...
- Patent number 7,588,815
- Issue date Sep 15, 2009
- Dai Nippon Printing Co., Ltd.
- Kenichi Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, method of producing mask, and method of producing semiconduct...
- Patent number 7,556,895
- Issue date Jul 7, 2009
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and equipment for fabri...
- Patent number 7,521,697
- Issue date Apr 21, 2009
- Kabushiki Kaisha Toshiba
- Takeshi Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank for charged particle beam exposure, method of forming ma...
- Patent number 7,479,233
- Issue date Jan 20, 2009
- Dai Nippon Printing Co., Ltd.
- Kenichi Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method for producing thereof and a semiconductor device us...
- Patent number 7,344,805
- Issue date Mar 18, 2008
- Rohm Co., Ltd.
- Hiroshi Kumano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, exposure method and semiconductor device produc...
- Patent number 7,326,940
- Issue date Feb 5, 2008
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and equipment for fabri...
- Patent number 7,267,927
- Issue date Sep 11, 2007
- Kabushiki Kaisha Toshiba
- Takeshi Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ESD-resistant photomask and method of preventing mask ESD damage
- Patent number 7,252,911
- Issue date Aug 7, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of generating mask distortion data, exposure method and meth...
- Patent number 7,175,952
- Issue date Feb 13, 2007
- Sony Corporation
- Shinji Omori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, method of producing mask, and method of producing semiconduct...
- Patent number 7,144,178
- Issue date Dec 5, 2006
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern correction method, semiconductor device manufacturing...
- Patent number 7,109,500
- Issue date Sep 19, 2006
- Sony Corporation
- Shinji Omori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, method of producing mask, and method of producing semiconduct...
- Patent number 7,060,996
- Issue date Jun 13, 2006
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, method of producing mask, and method of producing semiconduct...
- Patent number 7,057,300
- Issue date Jun 6, 2006
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and its manufacturing method, and method for manufacturing sem...
- Patent number 7,022,607
- Issue date Apr 4, 2006
- Sony Corporation
- Masaki Yoshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complementary division condition determining method and program and...
- Patent number 7,010,434
- Issue date Mar 7, 2006
- Sony Corporation
- Isao Ashida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure mask and electron beam exposure method using...
- Patent number 6,972,165
- Issue date Dec 6, 2005
- Sony Corporation
- Ichiro Kagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,964,832
- Issue date Nov 15, 2005
- Hitachi, Ltd.
- Akemi Moniwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure mask, electron beam exposure method, method...
- Patent number 6,958,201
- Issue date Oct 25, 2005
- NEC Electronics Corporation
- Mami Miyasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures useful in electron beam lithography
- Patent number 6,919,150
- Issue date Jul 19, 2005
- Applied Materials, Inc.
- Cheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus, electron beam method, semiconduct...
- Patent number 6,903,355
- Issue date Jun 7, 2005
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing heat-induced distortion of photomasks during lit...
- Patent number 6,878,950
- Issue date Apr 12, 2005
- Applied Materials Inc.
- Bassam Shamoun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20230280647
- Publication date Sep 7, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...
- Publication number 20230238209
- Publication date Jul 27, 2023
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS AND COMPUTER PROGRAM FOR ANALYZING AND/OR PROCESS...
- Publication number 20220050389
- Publication date Feb 17, 2022
- Carl Zeiss SMT GMBH
- Oliver Jäckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RE...
- Publication number 20200402793
- Publication date Dec 24, 2020
- DANMARKS TEKNISKE UNIVERSITET
- Anpan HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGITAL PATTERN GENERATOR HAVING CHARGE DRAIN COATING
- Publication number 20180037993
- Publication date Feb 8, 2018
- William M. Tong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...
- Publication number 20140114634
- Publication date Apr 24, 2014
- Synopsys, Inc.
- Hua Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130253688
- Publication date Sep 26, 2013
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND METHOD, AND ARTICLE...
- Publication number 20130164684
- Publication date Jun 27, 2013
- Canon Kabushiki Kaisha
- Toshiro Yamanaka
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask for multi-column electron beam exposure, and electron beam exp...
- Publication number 20090311613
- Publication date Dec 17, 2009
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Irradiation Device
- Publication number 20090127473
- Publication date May 21, 2009
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for fabricating semiconductor device and equipment for fabri...
- Publication number 20070295918
- Publication date Dec 27, 2007
- Kabushiki Kashia Toshiba
- Takeshi Shibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOI substrate, mask blank for charged particle beam exposure, and m...
- Publication number 20070200174
- Publication date Aug 30, 2007
- DAI NIPPON PRINTING CO. , LTD.
- Kenichi Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask, method of producing mask, and method of producing semiconduct...
- Publication number 20070054202
- Publication date Mar 8, 2007
- SONY CORPORATION
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, method of producing mask, and method of producing semiconduct...
- Publication number 20070054203
- Publication date Mar 8, 2007
- SONY CORPORATION
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, method of producing the same, and method of producing semicon...
- Publication number 20060269850
- Publication date Nov 30, 2006
- Sony Corp
- Masaki Yoshizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, mask, semiconductor device manufacturing method, a...
- Publication number 20060240330
- Publication date Oct 26, 2006
- Masaki Yoshizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask blank for charged particle beam exposure, method of forming ma...
- Publication number 20060124581
- Publication date Jun 15, 2006
- Kenichi Morimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, method of producing the same, and method of producing semicon...
- Publication number 20060079091
- Publication date Apr 13, 2006
- Sony Corporation
- Masaki Yoshizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ESD-resistant photomask and method of preventing mask ESD damage
- Publication number 20050214654
- Publication date Sep 29, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ching-Yu Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, semiconductor device manufacturing method, and semiconductor...
- Publication number 20050145892
- Publication date Jul 7, 2005
- SONY CORPORATION
- Shinichiro Nohdo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method and semiconductor device produc...
- Publication number 20050133734
- Publication date Jun 23, 2005
- Sony Corporation
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask pattern correction method, semiconductor device manufacturing...
- Publication number 20050124078
- Publication date Jun 9, 2005
- Sony Corp.
- Shinji Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Transfer mask for exposure and pattern exchanging method of the same
- Publication number 20050118516
- Publication date Jun 2, 2005
- Octec Inc.
- Katsuya Okumura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Stencil mask, charged particle irradiation apparatus and the method
- Publication number 20050058913
- Publication date Mar 17, 2005
- Tomoyuki Osada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of generating mask distortion data, exposure method and meth...
- Publication number 20050014076
- Publication date Jan 20, 2005
- Shinji Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for fabricating semiconductor device and equipment for fabri...
- Publication number 20040219444
- Publication date Nov 4, 2004
- Takeshi Shibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Complementary division condition determining method and program and...
- Publication number 20040210423
- Publication date Oct 21, 2004
- Isao Ashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, method of producing mask, and method of producing semiconduct...
- Publication number 20040209174
- Publication date Oct 21, 2004
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, method of producing mask, and method of producing semiconduct...
- Publication number 20040209175
- Publication date Oct 21, 2004
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY

affecting masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method, apparatus and computer program for analyzing and/or process...

Digital pattern generator having charge drain coating

Charge drain coating for electron-optical MEMS

Modeling and correcting short-range and long-range effects in E-bea...

Multi charged particle beam writing apparatus and multi charged par...

Charged particle beam lithography apparatus and method, and article...

Mask for multi-column electron beam exposure, and electron beam exp...

Transfer mask for exposure and pattern exchanging method of the same

Electron beam irradiation device

Mask blank for charged particle beam exposure, method of forming ma...

Mask, method of producing mask, and method of producing semiconduct...

Method for fabricating semiconductor device and equipment for fabri...

Mask blank for charged particle beam exposure, method of forming ma...

Mask and method for producing thereof and a semiconductor device us...

Exposure apparatus, exposure method and semiconductor device produc...

Method for fabricating semiconductor device and equipment for fabri...

ESD-resistant photomask and method of preventing mask ESD damage

Method of generating mask distortion data, exposure method and meth...

Mask, method of producing mask, and method of producing semiconduct...

Mask pattern correction method, semiconductor device manufacturing...

Mask, method of producing mask, and method of producing semiconduct...

Mask, method of producing mask, and method of producing semiconduct...

Mask and its manufacturing method, and method for manufacturing sem...

Complementary division condition determining method and program and...

Electron beam exposure mask and electron beam exposure method using...

Semiconductor device and manufacturing method thereof

Electron beam exposure mask, electron beam exposure method, method...

Structures useful in electron beam lithography

Electron beam exposure apparatus, electron beam method, semiconduct...

Method of reducing heat-induced distortion of photomasks during lit...

Patents Applicationslast 30 patents

COMPENSATION RASTER SCANNING

METHOD AND APPARATUS FOR MASK REPAIR

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...

METHOD, APPARATUS AND COMPUTER PROGRAM FOR ANALYZING AND/OR PROCESS...

A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RE...

DIGITAL PATTERN GENERATOR HAVING CHARGE DRAIN COATING

MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND METHOD, AND ARTICLE...

Mask for multi-column electron beam exposure, and electron beam exp...

Electron Beam Irradiation Device

Method for fabricating semiconductor device and equipment for fabri...

SOI substrate, mask blank for charged particle beam exposure, and m...

Mask, method of producing mask, and method of producing semiconduct...

Mask, method of producing mask, and method of producing semiconduct...

Mask, method of producing the same, and method of producing semicon...

Exposure method, mask, semiconductor device manufacturing method, a...

Mask blank for charged particle beam exposure, method of forming ma...

Mask, method of producing the same, and method of producing semicon...

ESD-resistant photomask and method of preventing mask ESD damage

Mask, semiconductor device manufacturing method, and semiconductor...

Exposure apparatus, exposure method and semiconductor device produc...

Mask pattern correction method, semiconductor device manufacturing...

Transfer mask for exposure and pattern exchanging method of the same

Stencil mask, charged particle irradiation apparatus and the method

Method of generating mask distortion data, exposure method and meth...

Method for fabricating semiconductor device and equipment for fabri...

Complementary division condition determining method and program and...

Mask, method of producing mask, and method of producing semiconduct...

Mask, method of producing mask, and method of producing semiconduct...