affecting resists

Industry

CPC
H01J2237/31796

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31796affecting resists

Industries

Patents Grantslast 30 patents

Information Patent Grant
Nanofabrication using a new class of electron beam induced surface...
- Patent number 11,377,740
- Issue date Jul 5, 2022
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for determining the parameters of an IC manufacturing proces...
- Patent number 10,295,912
- Issue date May 21, 2019
- Aselta Nanographics
- Mohamed Saib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ebeam non-universal cutter
- Patent number 9,952,511
- Issue date Apr 24, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,899,187
- Issue date Feb 20, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating shape before shrink and CD-SEM apparatus
- Patent number 9,830,524
- Issue date Nov 28, 2017
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method to define multiple layer patterns with a single exposure by...
- Patent number 9,726,983
- Issue date Aug 8, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 9,583,310
- Issue date Feb 28, 2017
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for predicting a growth rate of deposited cont...
- Patent number 9,506,881
- Issue date Nov 29, 2016
- Mapper Lithography IP B.V.
- Marc Smits
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,336,994
- Issue date May 10, 2016
- NuFlare Technology, Inc.
- Yasuo Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam drawing method, computer-readable recording m...
- Patent number 9,236,154
- Issue date Jan 12, 2016
- NuFlare Technology, Inc.
- Sumito Nakada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,063,440
- Issue date Jun 23, 2015
- Nuflare Technology, Inc.
- Yasuo Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam processing with condensed ice
- Patent number 8,790,863
- Issue date Jul 29, 2014
- President and Fellows of Harvard College
- Daniel Branton
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Substrate to be processed having laminated thereon resist film for...
- Patent number 8,563,216
- Issue date Oct 22, 2013
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam pattern forming apparatus and charged particl...
- Patent number 8,502,175
- Issue date Aug 6, 2013
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern writing system and method and abnormality diagnosing method
- Patent number 8,427,919
- Issue date Apr 23, 2013
- Nuflare Technology, Inc.
- Yoshikuni Goshima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and method thereof
- Patent number 8,178,856
- Issue date May 15, 2012
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for modifying patterned photoresist using multi-s...
- Patent number 8,133,804
- Issue date Mar 13, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement effects correction in raster pattern generator
- Patent number 7,476,879
- Issue date Jan 13, 2009
- Applied Materials, Inc.
- Richard L. Lozes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micromachining process, system and product
- Patent number 7,385,209
- Issue date Jun 10, 2008
- Haute Ecole Arc Ne-Be-Ju
- Samuel Jaccard
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Apparatus and method for controlling the beam current of a charged...
- Patent number 7,345,436
- Issue date Mar 18, 2008
- ICT Integrated Circuit Testing Gesellschaft
- Josef Sellmair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography method using new material
- Patent number 7,144,680
- Issue date Dec 5, 2006
- Samsung Electronics Co., Ltd.
- Jong-bong Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing proximity effects in electron beam lithography
- Patent number 7,038,204
- Issue date May 2, 2006
- International Business Machines Corporation
- Christie Roderick Kingsley Marrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for patterning a reticle blank by electron-be...
- Patent number 6,972,417
- Issue date Dec 6, 2005
- Nikon Corporation
- Wakako Suganuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for compensating for scatter/reflection effects in particle...
- Patent number 6,953,644
- Issue date Oct 11, 2005
- Infineon Technologies AG
- Christian Ebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing blur and variation in blur in projected images...
- Patent number 6,906,336
- Issue date Jun 14, 2005
- Nikon Corporation
- Hiroyasu Simizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system comprising a converter plate and means for prote...
- Patent number 6,844,560
- Issue date Jan 18, 2005
- Mapper Lithography IP B.V.
- Marco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple pass write method and reticle
- Patent number 6,713,233
- Issue date Mar 30, 2004
- Micron Technology, Inc.
- Eugene A. DeLaRosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple pass write method and reticle
- Patent number 6,642,530
- Issue date Nov 4, 2003
- Micron Technology, Inc.
- Eugene A. DeLaRosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple pass write method and reticle
- Patent number 6,472,123
- Issue date Oct 29, 2002
- Micron Technology, Inc.
- Eugene A. DeLaRosa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern writing method
- Patent number 6,346,354
- Issue date Feb 12, 2002
- Kabushiki Kaisha Toshiba
- Takayuki Abe
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...
- Publication number 20200190669
- Publication date Jun 18, 2020
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...
- Publication number 20170168401
- Publication date Jun 15, 2017
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM NON-UNIVERSAL CUTTER
- Publication number 20170069461
- Publication date Mar 9, 2017
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Processing With Condensed Ice
- Publication number 20130288182
- Publication date Oct 31, 2013
- President and Fellows of Harvard College
- Daniel Branton
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...
- Publication number 20130177855
- Publication date Jul 11, 2013
- NuFlare Technology, Inc.
- Sumito NAKADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...
- Publication number 20130032707
- Publication date Feb 7, 2013
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20120211674
- Publication date Aug 23, 2012
- NuFlare Technology, Inc.
- Yasuo KATO
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING PATTERNED PHOTORESIST USING MULTI-S...
- Publication number 20120083136
- Publication date Apr 5, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TO BE PROCESSED HAVING LAMINATED THEREON RESIST FILM FOR...
- Publication number 20120021341
- Publication date Jan 26, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...
- Publication number 20120007002
- Publication date Jan 12, 2012
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN WRITING SYSTEM AND METHOD AND ABNORMALITY DIAGNOSING METHOD
- Publication number 20110255388
- Publication date Oct 20, 2011
- NuFlare Technology, Inc.
- Yoshikuni GOSHIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...
- Publication number 20110121208
- Publication date May 26, 2011
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF
- Publication number 20110031387
- Publication date Feb 10, 2011
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Placement effects correction in raster pattern generator
- Publication number 20070085031
- Publication date Apr 19, 2007
- APPLIED MATERIALS, INC.
- Richard L. Lozes
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and method for controlling the beam current of a charged...
- Publication number 20070023672
- Publication date Feb 1, 2007
- Josef Sellmair
- B82 - NANO-TECHNOLOGY
Information Patent Application
Micromachining process, system and product
- Publication number 20060214105
- Publication date Sep 28, 2006
- Samuel Jaccard
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Electron beam lithography method using new material
- Publication number 20060141396
- Publication date Jun 29, 2006
- Samsung Electronics Co., Ltd.
- Jong-bong Park
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for reducing proximity effects in electron beam lithography
- Publication number 20050263722
- Publication date Dec 1, 2005
- Christie Roderick Kingsley Marrian
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for compensating for scatter/reflection effects in particle...
- Publication number 20030228527
- Publication date Dec 11, 2003
- Christian Ebi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods for reducing blur and variation in blur in projected images...
- Publication number 20030059716
- Publication date Mar 27, 2003
- NIKON CORPORATION
- Hiroyasu Simizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multiple pass write method and reticle
- Publication number 20030031941
- Publication date Feb 13, 2003
- Eugene A. DeLaRosa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system comprising a converter platc and means for prote...
- Publication number 20030030014
- Publication date Feb 13, 2003
- Marco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multiple pass write method and reticle
- Publication number 20020071998
- Publication date Jun 13, 2002
- Eugene A. DeLaRosa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam aligner, outgassing collection method and gas analysi...
- Publication number 20020030801
- Publication date Mar 14, 2002
- Masayuki Endo
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for patterning a reticle blank by electron-be...
- Publication number 20020012853
- Publication date Jan 31, 2002
- NIKON CORPORATION
- Wakako Suganuma
- B82 - NANO-TECHNOLOGY

affecting resists

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nanofabrication using a new class of electron beam induced surface...

Method for determining the parameters of an IC manufacturing proces...

Ebeam non-universal cutter

Charged particle beam writing apparatus and charged particle beam w...

Method for estimating shape before shrink and CD-SEM apparatus

Method to define multiple layer patterns with a single exposure by...

Charged particle beam writing apparatus, charged particle beam writ...

Method and apparatus for predicting a growth rate of deposited cont...

Multi charged particle beam writing apparatus and multi charged par...

Charged-particle beam drawing method, computer-readable recording m...

Charged particle beam writing apparatus and charged particle beam w...

Electron beam processing with condensed ice

Substrate to be processed having laminated thereon resist film for...

Charged particle beam pattern forming apparatus and charged particl...

Pattern writing system and method and abnormality diagnosing method

Charged particle beam writing apparatus and method thereof

Method and system for modifying patterned photoresist using multi-s...

Placement effects correction in raster pattern generator

Micromachining process, system and product

Apparatus and method for controlling the beam current of a charged...

Electron beam lithography method using new material

Method for reducing proximity effects in electron beam lithography

Apparatus and methods for patterning a reticle blank by electron-be...

Method for compensating for scatter/reflection effects in particle...

Methods for reducing blur and variation in blur in projected images...

Lithography system comprising a converter plate and means for prote...

Multiple pass write method and reticle

Multiple pass write method and reticle

Multiple pass write method and reticle

Pattern writing method

Patents Applicationslast 30 patents

NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...

METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...

EBEAM NON-UNIVERSAL CUTTER

Electron Beam Processing With Condensed Ice

CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD AND SYSTEM FOR MODIFYING PATTERNED PHOTORESIST USING MULTI-S...

SUBSTRATE TO BE PROCESSED HAVING LAMINATED THEREON RESIST FILM FOR...

CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...

PATTERN WRITING SYSTEM AND METHOD AND ABNORMALITY DIAGNOSING METHOD

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF

Placement effects correction in raster pattern generator

Apparatus and method for controlling the beam current of a charged...

Micromachining process, system and product

Electron beam lithography method using new material

Method for reducing proximity effects in electron beam lithography

Method for compensating for scatter/reflection effects in particle...

Methods for reducing blur and variation in blur in projected images...

Multiple pass write method and reticle

Lithography system comprising a converter platc and means for prote...

Multiple pass write method and reticle

Electron beam aligner, outgassing collection method and gas analysi...

Apparatus and methods for patterning a reticle blank by electron-be...