Alignment of the mask or the workpiece

Industry

CPC
H01J2237/31728

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31728Alignment of the mask or the workpiece

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam lithography system and target positioning device
- Patent number 9,082,584
- Issue date Jul 14, 2015
- Mapper Lithography IP B.V.
- Jerry Peijster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 8,878,141
- Issue date Nov 4, 2014
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
Substrate Alignment Through Detection of Rotating Timing Pattern
- Publication number 20160284508
- Publication date Sep 29, 2016
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150364291
- Publication date Dec 17, 2015
- Canon Kabushiki Kaisha
- Shigeki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20150243480
- Publication date Aug 27, 2015
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE
- Publication number 20150162165
- Publication date Jun 11, 2015
- MAPPER LITHOGRAPHY IP BV
- Jerry PEIJSTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Lithography System and Target Positioning Device
- Publication number 20140203187
- Publication date Jul 24, 2014
- Jerry Peijster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20130168569
- Publication date Jul 4, 2013
- Canon Kabushiki Kaisha
- Wataru YAMAGUCHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE
- Publication number 20120056100
- Publication date Mar 8, 2012
- Jerry Peijster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Lithography System and Target Positioning Device
- Publication number 20100044578
- Publication date Feb 25, 2010
- Jerry Peijster
- H01 - BASIC ELECTRIC ELEMENTS

Alignment of the mask or the workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam lithography system and target positioning device

Drawing apparatus, and method of manufacturing article

Patents Applicationslast 30 patents

Substrate Alignment Through Detection of Rotating Timing Pattern

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE

Charged Particle Beam Lithography System and Target Positioning Device

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE

Charged Particle Beam Lithography System and Target Positioning Device