and containing one or more carboxylic moiety in the chain

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CPC
C08F2220/283

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CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS

Current Industry

C08F2220/283and containing one or more carboxylic moiety in the chain

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Overcoat compositions and methods for photolithography
- Patent number 11,016,388
- Issue date May 25, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Chang-Young Hong
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Optical laminate
- Patent number 10,690,824
- Issue date Jun 23, 2020
- Sumitomo Chemical Company, Limited
- Shoichi Ozawa
- G02 - OPTICS
Information Patent Grant
Pattern forming material, pattern forming method, and method for ma...
- Patent number 10,672,621
- Issue date Jun 2, 2020
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,627,717
- Issue date Apr 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,613,437
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,613,436
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,606,172
- Issue date Mar 31, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, resist pattern, and process for producing e...
- Patent number 10,578,968
- Issue date Mar 3, 2020
- FUJIFILM Corporation
- Kei Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition
- Patent number 10,564,544
- Issue date Feb 18, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 10,534,263
- Issue date Jan 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 10,534,264
- Issue date Jan 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing photoresist pattern and photoresist composition
- Patent number 10,520,810
- Issue date Dec 31, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,509,314
- Issue date Dec 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,495,968
- Issue date Dec 3, 2019
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,474,030
- Issue date Nov 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coloring composition, cured film, color filter, method of manufactu...
- Patent number 10,444,625
- Issue date Oct 15, 2019
- Fujifilm Corporation
- Suguru Samejima
- G02 - OPTICS
Information Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, ac...
- Patent number 10,423,068
- Issue date Sep 24, 2019
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, resist pattern-forming method and polymer
- Patent number 10,331,031
- Issue date Jun 25, 2019
- JSR Corporation
- Hayato Namai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition, pattern forming process, polymer, and monomer
- Patent number 10,310,376
- Issue date Jun 4, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Wet or damp surface preparation compositions
- Patent number 10,259,947
- Issue date Apr 16, 2019
- 3M Innovative Properties Company
- David J. Neudahl
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film composition, patterning process, and method...
- Patent number 10,241,412
- Issue date Mar 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroko Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, making method, resist composition, and patterning process
- Patent number 10,234,757
- Issue date Mar 19, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Vinylidene fluoride copolymer, method for producing the same, gel e...
- Patent number 10,227,429
- Issue date Mar 12, 2019
- Kureha Corporation
- Keisuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 10,162,262
- Issue date Dec 25, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,126,647
- Issue date Nov 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process using the same
- Patent number 10,126,649
- Issue date Nov 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Lactamic polymer containing an acetoacetate moiety
- Patent number 10,118,981
- Issue date Nov 6, 2018
- ISP Investments LLC
- David K. Hood
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist composition and resist pattern forming process
- Patent number 10,120,279
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon-containing underlayers
- Patent number 10,114,288
- Issue date Oct 30, 2018
- Rohm and Haas Electronic Materials LLC
- Charlotte A. Cutler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming method, resist pattern, and method for manufacturin...
- Patent number 10,114,292
- Issue date Oct 30, 2018
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
WATER DISPERSIBLE COPOLYMERS FOR SCAVENGING FORMALDEHYDE
- Publication number 20200032098
- Publication date Jan 30, 2020
- SWIMC LLC
- YANCHANG GAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL ADHESIVE LAYER, MANUFACTURING METHOD OF OPTICAL ADHESIVE LA...
- Publication number 20200032114
- Publication date Jan 30, 2020
- NITTO DENKO CORPORATION
- Tomoyuki Kimura
- G02 - OPTICS
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200010594
- Publication date Jan 9, 2020
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD FOR MA...
- Publication number 20200006076
- Publication date Jan 2, 2020
- Toshiba Memory Corporation
- Norikatsu Sasao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER AND POSITIVE RESIST COMPOSITION
- Publication number 20190389991
- Publication date Dec 26, 2019
- ZEON CORPORATION
- Takashi TSUTSUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20190361350
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20190292287
- Publication date Sep 26, 2019
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190285984
- Publication date Sep 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuishi TANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20190258168
- Publication date Aug 22, 2019
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Block Copolymer
- Publication number 20190256637
- Publication date Aug 22, 2019
- LG CHEM, LTD.
- No Jin Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20190218321
- Publication date Jul 18, 2019
- Toshiba Memory Corporation
- Ryosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CROSS-LINKING AGENT(S)
- Publication number 20190210965
- Publication date Jul 11, 2019
- GL CHEMTEC VISION INC.
- Musa ALHAKIMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190204741
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua A. Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS
- Publication number 20190204743
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS
- Publication number 20190204742
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Choong-Bong LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190107779
- Publication date Apr 11, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20190033715
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLY(METH)ACRYLAMIDE-BASED COPOLYMERS WITH CARBOXYL-TERMINATED PEND...
- Publication number 20190023935
- Publication date Jan 24, 2019
- Novartis AG
- Frank Chang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20180329298
- Publication date Nov 15, 2018
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20180321585
- Publication date Nov 8, 2018
- JSR Corporation
- Natsuko KINOSHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180292751
- Publication date Oct 11, 2018
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD...
- Publication number 20180284615
- Publication date Oct 4, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroko NAGAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284612
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME
- Publication number 20180284605
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180275518
- Publication date Sep 27, 2018
- FUJIFILM CORPORATION
- Naoki INOUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180267404
- Publication date Sep 20, 2018
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20180224742
- Publication date Aug 9, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIN COMPOSITION, LIGHT CONTROL MATERIAL, OPTICAL WAVEGUI...
- Publication number 20180201713
- Publication date Jul 19, 2018
- Koji IWASAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Curable composition, method for producing cured film, color filter,...
- Publication number 20180188650
- Publication date Jul 5, 2018
- FUJIFILM CORPORATION
- Michihiro OGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180180997
- Publication date Jun 28, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

and containing one or more carboxylic moiety in the chain

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Overcoat compositions and methods for photolithography

Optical laminate

Pattern forming material, pattern forming method, and method for ma...

Resist composition and method of forming resist pattern

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Pattern forming method, resist pattern, and process for producing e...

Photoresist composition

Resin composition and method of forming resist pattern

Resist composition and resist pattern forming method

Process for producing photoresist pattern and photoresist composition

Resist composition and patterning process

Iodine-containing polymers for chemically amplified resist composit...

Resist composition and patterning process

Coloring composition, cured film, color filter, method of manufactu...

Active-light-sensitive or radiation-sensitive resin composition, ac...

Resin composition, resist pattern-forming method and polymer

Resist composition, pattern forming process, polymer, and monomer

Wet or damp surface preparation compositions

Resist underlayer film composition, patterning process, and method...

Polymer, making method, resist composition, and patterning process

Vinylidene fluoride copolymer, method for producing the same, gel e...

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process using the same

Lactamic polymer containing an acetoacetate moiety

Negative resist composition and resist pattern forming process

Silicon-containing underlayers

Pattern forming method, resist pattern, and method for manufacturin...

Patents Applicationslast 30 patents

WATER DISPERSIBLE COPOLYMERS FOR SCAVENGING FORMALDEHYDE

OPTICAL ADHESIVE LAYER, MANUFACTURING METHOD OF OPTICAL ADHESIVE LA...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD FOR MA...

POLYMER AND POSITIVE RESIST COMPOSITION

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

TREATMENT LIQUID AND PATTERN FORMING METHOD

Block Copolymer

PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD

CROSS-LINKING AGENT(S)

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST COMPOSITIONS AND METHODS

PATTERN FORMATION METHODS

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POLY(METH)ACRYLAMIDE-BASED COPOLYMERS WITH CARBOXYL-TERMINATED PEND...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

POLYMER, RESIN COMPOSITION, LIGHT CONTROL MATERIAL, OPTICAL WAVEGUI...

Curable composition, method for producing cured film, color filter,...

RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN