Apparatus for microlithography

Industry

CPC
G03F2007/2067

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Current Industry

G03F2007/2067Apparatus for microlithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mould with a mould pattern, and device and method for producing same
- Patent number 11,131,021
- Issue date Sep 28, 2021
- EV Group E. Thallner GmbH
- Dominik Treiblmayr
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method of manufacturing a structure made of a curable ma...
- Patent number 11,014,269
- Issue date May 25, 2021
- Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
- Frank Wippermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
System and method for illuminating edges of an imprint field with a...
- Patent number 10,976,657
- Issue date Apr 13, 2021
- Canon Kabushiki Kaisha
- Amir Tavakkoli Kermani Ghariehali
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Freeform distortion correction
- Patent number 10,935,892
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,591,823
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Keisuke Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus, control method therefor, and method of manuf...
- Patent number 10,583,608
- Issue date Mar 10, 2020
- Canon Kabushiki Kaisha
- Shinichi Hirano
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron flood lithography
- Patent number 10,529,537
- Issue date Jan 7, 2020
- Facebook Technologies, LLC
- Christopher Percival
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,495,980
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,495,981
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,488,759
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,451,973
- Issue date Oct 22, 2019
- ASML Netherlands B.V.
- Bob Streefkerk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scan reflective mirror monitoring system and method, focusing and l...
- Patent number 10,394,142
- Issue date Aug 27, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Jiming Fan
- G02 - OPTICS
Information Patent Grant
Optical system
- Patent number 10,386,733
- Issue date Aug 20, 2019
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, imprint method, and method for manufacturing art...
- Patent number 10,372,034
- Issue date Aug 6, 2019
- Canon Kabushiki Kaisha
- Kazuki Nakagawa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprint apparatus, and method of manufacturing article
- Patent number 10,359,696
- Issue date Jul 23, 2019
- Canon Kabushiki Kaisha
- Yosuke Murakami
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Amplitude monitoring system, focusing and leveling device, and defo...
- Patent number 10,274,848
- Issue date Apr 30, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yazheng Zhuang
- G02 - OPTICS
Information Patent Grant
Illumination method, illumination optical device, and exposure device
- Patent number 10,120,283
- Issue date Nov 6, 2018
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Charged-particle beam exposure method and charged-particle beam cor...
- Patent number 10,056,229
- Issue date Aug 21, 2018
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for generating illuminating radiation
- Patent number 10,048,596
- Issue date Aug 14, 2018
- ASML Netherlands B.V.
- Nan Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin mold
- Patent number 9,840,038
- Issue date Dec 12, 2017
- Toyo Gosei Co., Ltd.
- Risa Wada
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic method with the capability of spectrum engineering to...
- Patent number 9,291,915
- Issue date Mar 22, 2016
- University of Szeged
- Mária Csete
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230120789
- Publication date Apr 20, 2023
- PlayNitride Display Co., Ltd.
- Po-Wei Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION...
- Publication number 20230005738
- Publication date Jan 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kenji YAMAZOE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM
- Publication number 20220236652
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G02 - OPTICS
Information Patent Application
Curing a Shaped Film Using Multiple Images of a Spatial Light Modul...
- Publication number 20220163893
- Publication date May 26, 2022
- Canon Kabushiki Kaisha
- James W. Irving
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Fabricating Devices with Reduced Isolation Regions
- Publication number 20200409273
- Publication date Dec 31, 2020
- Spin Memory, Inc.
- Amitay Levi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL MASKING SYSTEM, PATTERN IMAGING APPARATUS AND DIGITAL MASKI...
- Publication number 20200401048
- Publication date Dec 24, 2020
- Jabil Inc.
- Scott Klimczak
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM
- Publication number 20190354025
- Publication date Nov 21, 2019
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREEFORM DISTORTION CORRECTION
- Publication number 20180329310
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20180101105
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...
- Publication number 20180012730
- Publication date Jan 11, 2018
- Samsung Electronics Co., Ltd.
- SUKJONG BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMPLITUDE MONITORING SYSTEM, FOCUSING AND LEVELING DEVICE, AND DEFO...
- Publication number 20170329242
- Publication date Nov 16, 2017
- Yazheng ZHUANG
- G02 - OPTICS
Information Patent Application
Method and Apparatus for Generating Illuminating Radiation
- Publication number 20170322497
- Publication date Nov 9, 2017
- ASML NETHERLANDS B.V.
- Nan LIN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Metrology Target, Method and Apparatus, Target Design Method, Compu...
- Publication number 20170293233
- Publication date Oct 12, 2017
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20170212422
- Publication date Jul 27, 2017
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20170205714
- Publication date Jul 20, 2017
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel Lithographic Method with the Capability of Spectrum Engineeri...
- Publication number 20140226139
- Publication date Aug 14, 2014
- UNIVERSITY OF SZEGED
- Mária Csete
- G02 - OPTICS
Information Patent Application
ILLUMINATION METHOD, ILLUMINATION OPTICAL DEVICE, AND EXPOSURE DEVICE
- Publication number 20140218703
- Publication date Aug 7, 2014
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mould with a mould pattern, and device and method for producing same

Device and method of manufacturing a structure made of a curable ma...

System and method for illuminating edges of an imprint field with a...

Freeform distortion correction

Substrate processing apparatus and substrate processing method

Lithography apparatus, control method therefor, and method of manuf...

Electron flood lithography

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Scan reflective mirror monitoring system and method, focusing and l...

Optical system

Imprint apparatus, imprint method, and method for manufacturing art...

Imprint apparatus, and method of manufacturing article

Amplitude monitoring system, focusing and leveling device, and defo...

Illumination method, illumination optical device, and exposure device

Reflective optical element

Charged-particle beam exposure method and charged-particle beam cor...

Method and apparatus for generating illuminating radiation

Resin mold

Lithographic method with the capability of spectrum engineering to...

Patents Applicationslast 30 patents

EXPOSURE APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION...

OPTICAL SYSTEM

Curing a Shaped Film Using Multiple Images of a Spatial Light Modul...

Fabricating Devices with Reduced Isolation Regions

DIGITAL MASKING SYSTEM, PATTERN IMAGING APPARATUS AND DIGITAL MASKI...

OPTICAL SYSTEM

FREEFORM DISTORTION CORRECTION

OPTICAL SYSTEM

CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...

AMPLITUDE MONITORING SYSTEM, FOCUSING AND LEVELING DEVICE, AND DEFO...

Method and Apparatus for Generating Illuminating Radiation

Metrology Target, Method and Apparatus, Target Design Method, Compu...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Novel Lithographic Method with the Capability of Spectrum Engineeri...

ILLUMINATION METHOD, ILLUMINATION OPTICAL DEVICE, AND EXPOSURE DEVICE