PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

CPC
G03F

Parent Industries

Current Industry

G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Sub Industries

G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof G03F3/00Colour separation Correction of tonal value G03F5/00Screening processes Screens therefor G03F7/00Photomechanical G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,222,639
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for optimizing mask parameters
- Patent number 12,222,641
- Issue date Feb 11, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Jianfang He
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method for positive tone development
- Patent number 12,222,654
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowing module, gas laser apparatus, and method for manufact...
- Patent number 12,224,549
- Issue date Feb 11, 2025
- Gigaphoton Inc.
- Junichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous digital light processing additive manufacturing of implants
- Patent number 12,220,870
- Issue date Feb 11, 2025
- H. David Dean
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron beam resist composition
- Patent number RE50296
- Issue date Feb 11, 2025
- The University of Manchester
- Scott Lewis
Information Patent Grant
Systems and methods for producing ultrapure water for semiconductor...
- Patent number 12,221,371
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Resin composition, resin sheet, multilayer printed wiring board, an...
- Patent number 12,221,523
- Issue date Feb 11, 2025
- Mitsubishi Gas Chemical Company, Inc.
- Yune Kumazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive composition, color filter and method for forming the...
- Patent number 12,222,642
- Issue date Feb 11, 2025
- ECHEM SOLUTIONS CORP.
- Yi-Sheng Wu
- G02 - OPTICS
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polypeptide, photoresist composition including the same, and method...
- Patent number 12,222,646
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Jinha Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Squeezing device, photoresist supply system and photoresist supply...
- Patent number 12,222,652
- Issue date Feb 11, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengjiao Li
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic printing plate precursor and method of use
- Patent number 12,222,645
- Issue date Feb 11, 2025
- Eastman Kodak Company
- Christopher D. Simpson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining aberration sensitivity of patterns
- Patent number 12,222,656
- Issue date Feb 11, 2025
- ASML Netherlands B.V.
- Jingjing Liu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for measurement of misregistration and ameliora...
- Patent number 12,222,199
- Issue date Feb 11, 2025
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Electrostatic actuation for diffractive optical devices
- Patent number 12,222,491
- Issue date Feb 11, 2025
- Apple Inc.
- Sebastien Bolis
- G02 - OPTICS
Information Patent Grant
Imprinting method, pre-processing apparatus, substrate for imprinti...
- Patent number 12,221,340
- Issue date Feb 11, 2025
- Canon Kabushiki Kaisha
- Hiroshi Sato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,222,647
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system for packaging applications
- Patent number 12,222,659
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Venkatakaushik Voleti
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 12,221,556
- Issue date Feb 11, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,222,640
- Issue date Feb 11, 2025
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stop, optical system and lithography apparatus
- Patent number 12,222,655
- Issue date Feb 11, 2025
- Carl Zeiss SMT GmbH
- Benjahman Julius Modeste
- G02 - OPTICS
Information Patent Grant
Surface relief waveguides with high refractive index resist
- Patent number 12,222,537
- Issue date Feb 11, 2025
- Magic Leap, Inc.
- Matthew C Traub
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20250053077
- Publication date Feb 13, 2025
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK GENERATION MODEL TRAINING METHOD, MASK GENERATION METHOD AND A...
- Publication number 20250053079
- Publication date Feb 13, 2025
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Xingyu MA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ECO-FRIENDLY PHOTORESIST STRIPPER COMPOSITION
- Publication number 20250053093
- Publication date Feb 13, 2025
- SAMYOUNG PURE CHEMICALS CO., LTD.
- Sang Moon YUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRIC METROLOGY TOOL FOR REFLECTIVE WAVEGUIDE
- Publication number 20250053099
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK
- Publication number 20250053104
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE
- Publication number 20250053105
- Publication date Feb 13, 2025
- Nikon Corporation
- Donis G. FLAGELLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACTANTS FOR ELECTRONICS
- Publication number 20250051643
- Publication date Feb 13, 2025
- AdvanSix Resins & Chemicals LLC
- Edward Asirvatham
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MANUFACTURE OF SURFACE RELIEF STRUCTURES
- Publication number 20250053083
- Publication date Feb 13, 2025
- Snap Inc.
- Ian Sturland
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE POD PROVIDED WITH RETICLE SUPPORT FOR ABSORBING DOWNWARD PR...
- Publication number 20250053100
- Publication date Feb 13, 2025
- GUDENG PRECISION INDUSTRIAL CO,. LTD.
- Ming-Chien Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE
- Publication number 20250054774
- Publication date Feb 13, 2025
- Samsung Electronics Co., Ltd.
- Hyeyeong Jo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20250053702
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT REFLECTIVE STRUCTURE INCLUDING NANO-LATTI...
- Publication number 20250053076
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Benny KU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FRAME AND PELLICLE
- Publication number 20250053078
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPRINT LITHOGRAPHY DEFECT MITIGATION METHOD AND MASKED IMPRINT LIT...
- Publication number 20250053081
- Publication date Feb 13, 2025
- LEIA INC.
- Kevin Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE
- Publication number 20250053082
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Yongan XU
- G02 - OPTICS
Information Patent Application
DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS
- Publication number 20250053084
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION
- Publication number 20250053098
- Publication date Feb 13, 2025
- KLA Corporation
- Zhengquan Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...
- Publication number 20250054873
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sung-Hsin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20250051604
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Sunghwan KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...
- Publication number 20250053088
- Publication date Feb 13, 2025
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Extreme ultraviolet mask and method of manufacturing the same

Method and device for optimizing mask parameters

Lithography method for positive tone development

Line narrowing module, gas laser apparatus, and method for manufact...

Continuous digital light processing additive manufacturing of implants

Electron beam resist composition

Systems and methods for producing ultrapure water for semiconductor...

Resin composition, resin sheet, multilayer printed wiring board, an...

Photosensitive composition, color filter and method for forming the...

Method of forming an enhanced unexposed photoresist layer

Polypeptide, photoresist composition including the same, and method...

Squeezing device, photoresist supply system and photoresist supply...

Lithographic printing plate precursor and method of use

Photoresist underlayer and method of manufacturing a semiconductor...

Resist underlayer film forming composition having a disulfide struc...

Method for forming semiconductor structure

Method for determining aberration sensitivity of patterns

Stage apparatus and electron beam lithography system

Systems and methods for measurement of misregistration and ameliora...

Electrostatic actuation for diffractive optical devices

Imprinting method, pre-processing apparatus, substrate for imprinti...

Method of manufacturing a semiconductor device and pattern formatio...

Photoresist composition and method of forming photoresist pattern

Metrology system for packaging applications

Hard-mask forming composition, method for manufacturing electronic...

Reflective mask blank, reflective mask, method of manufacturing ref...

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Stop, optical system and lithography apparatus

Surface relief waveguides with high refractive index resist

Patents Applicationslast 30 patents

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK GENERATION MODEL TRAINING METHOD, MASK GENERATION METHOD AND A...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

ECO-FRIENDLY PHOTORESIST STRIPPER COMPOSITION

Flexible Measurement Models For Model Based Measurements Of Semicon...

ASYMMETRIC METROLOGY TOOL FOR REFLECTIVE WAVEGUIDE

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK

SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

SURFACTANTS FOR ELECTRONICS

MANUFACTURE OF SURFACE RELIEF STRUCTURES

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

RETICLE POD PROVIDED WITH RETICLE SUPPORT FOR ABSORBING DOWNWARD PR...

METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE

PROCESS WINDOW OPTIMIZER

EXTREME ULTRAVIOLET LIGHT REFLECTIVE STRUCTURE INCLUDING NANO-LATTI...

PELLICLE FRAME AND PELLICLE

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

IMPRINT LITHOGRAPHY DEFECT MITIGATION METHOD AND MASKED IMPRINT LIT...

LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE

DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...