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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Industry
CPC
G03F
Parent Industries
G
PHYSICS
G03
Photography
Current Industry
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
Sub Industries
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
G03F3/00
Colour separation Correction of tonal value
G03F5/00
Screening processes Screens therefor
G03F7/00
Photomechanical
G03F9/00
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces
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