PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

CPC
G03F

Parent Industries

Current Industry

G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Sub Industries

G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof G03F3/00Colour separation Correction of tonal value G03F5/00Screening processes Screens therefor G03F7/00Photomechanical G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure device and method
- Patent number 12,366,807
- Issue date Jul 22, 2025
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Display substrate having color filter layer, manufacturing method t...
- Patent number 12,369,478
- Issue date Jul 22, 2025
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Peng Hou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for correcting photomask and method thereof
- Patent number 12,366,799
- Issue date Jul 22, 2025
- Semes Co., Ltd.
- Hyo Won Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for controlling a lithographic process
- Patent number 12,366,809
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Roy Werkman
- G05 - CONTROLLING REGULATING
Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,369,244
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Igor Vladimirovich Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for forming a resist fine pattern
- Patent number 12,365,190
- Issue date Jul 22, 2025
- UNIJET CO., LTD.
- Seog-soon Kim
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithography mask and methods
- Patent number 12,366,798
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving accuracy of imprint force application in impri...
- Patent number 12,366,800
- Issue date Jul 22, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for transfer imprinting
- Patent number 12,366,801
- Issue date Jul 22, 2025
- Arkema France
- Christophe Navarro
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical liquid, rinsing solution, and resist pattern forming method
- Patent number 12,366,805
- Issue date Jul 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 12,368,065
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Seungbeom Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,369,454
- Issue date Jul 22, 2025
- DUK SAN NEOLUX CO., LTD.
- Hye Jung Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,366,797
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Yi Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition containing a heterocyclic compound having a dicyanostyr...
- Patent number 12,366,804
- Issue date Jul 22, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid metrology method and system
- Patent number 12,366,533
- Issue date Jul 22, 2025
- Gilad Barak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,366,802
- Issue date Jul 22, 2025
- DUK SAN NEOLUX CO., LTD.
- Jun Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,366,808
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Radiation source
- Patent number 12,366,810
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection apparatus, detection method, exposure apparatus and artic...
- Patent number 12,366,812
- Issue date Jul 22, 2025
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solvent annealing of an organic planarization layer
- Patent number 12,362,168
- Issue date Jul 15, 2025
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,360,451
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Identification of hot spots or defects by machine learning
- Patent number 12,360,461
- Issue date Jul 15, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Poly(cyanocinnamate)s for structural and optical applications
- Patent number 12,360,455
- Issue date Jul 15, 2025
- Brewer Science, Inc.
- Tony D. Flaim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions for removing photoresists and methods of manufacturing...
- Patent number 12,360,457
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Hyojin Yun
- B08 - CLEANING
Information Patent Grant
Optical assembly, method for deforming an optical element, and proj...
- Patent number 12,360,459
- Issue date Jul 15, 2025
- Carl Zeiss SMT GmbH
- Tim Hoffmann
- G02 - OPTICS
Information Patent Grant
Fiber bundle based optical spot size selector
- Patent number 12,360,463
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ivan Maleev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method thereof
- Patent number 12,360,464
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST...
- Publication number 20250236823
- Publication date Jul 24, 2025
- DONGWOO FINE-CHEM CO., LTD.
- GI JIN KWUN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTOMASK DESIGN METHOD, SEMICONDUCTOR MANUFACTURING PROCESS, AND S...
- Publication number 20250237942
- Publication date Jul 24, 2025
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20250237943
- Publication date Jul 24, 2025
- Canon Kabushiki Kaisha
- MASAKI ISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS
- Publication number 20250237961
- Publication date Jul 24, 2025
- CYMER, LLC
- Rabin Paudel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...
- Publication number 20250237968
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- Stephan Zschäck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS
- Publication number 20250236470
- Publication date Jul 24, 2025
- SHIBAURA MECHATRONICS CORPORATION
- Yukinobu NISHIBE
- B08 - CLEANING
Information Patent Application
ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...
- Publication number 20250237946
- Publication date Jul 24, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate
- Publication number 20250237947
- Publication date Jul 24, 2025
- HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD
- Li YUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20250237948
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN,...
- Publication number 20250237950
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...
- Publication number 20250237958
- Publication date Jul 24, 2025
- DONGWOO FINE-CHEM CO., LTD.
- GI JIN KWUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...
- Publication number 20250237960
- Publication date Jul 24, 2025
- Carl Zeiss SMS Ltd.
- Sergey Oshemkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Manfred Petrus Johannes Maria DIKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20250237965
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM
- Publication number 20250239454
- Publication date Jul 24, 2025
- SCREEN Holdings Co., Ltd.
- Hiroaki ISHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...
- Publication number 20250239494
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- Christian Lutzweiler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- David John McGee
- G02 - OPTICS
Information Patent Application
RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY...
- Publication number 20250236813
- Publication date Jul 24, 2025
- YCCHEM CO., LTD.
- Su Jin LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...
- Publication number 20250236822
- Publication date Jul 24, 2025
- DONGWOO FINE-CHEM CO., LTD.
- GI JIN KWUN
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20250237940
- Publication date Jul 24, 2025
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV APPLICATIONS
- Publication number 20250237941
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Hsun Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SLIP COMPOSITIONS AND COMPONENTS FOR SEMICONDUCTOR WAFER HANDL...
- Publication number 20250237944
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chung-Ming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250237951
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Kotaro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK AND METHOD
- Publication number 20250237966
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chung CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION
- Publication number 20250236719
- Publication date Jul 24, 2025
- Murata Manufacturing Co., Ltd.
- Rikiya SANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Exposure device and method

Metrology system and method for determining a characteristic of one...

Display substrate having color filter layer, manufacturing method t...

Apparatus for correcting photomask and method thereof

Methods and apparatus for controlling a lithographic process

Laser system for source material conditioning in an EUV light source

Apparatus and method for forming a resist fine pattern

Lithography mask and methods

Method for improving accuracy of imprint force application in impri...

Process for transfer imprinting

Chemical liquid, rinsing solution, and resist pattern forming method

Wafer processing apparatus

Method for preparing pixel define layer

EUV photo masks and manufacturing method thereof

Composition containing a heterocyclic compound having a dicyanostyr...

Hybrid metrology method and system

Method for preparing pixel define layer

Substrate holder, lithographic apparatus, device manufacturing meth...

Radiation source

Detection apparatus, detection method, exposure apparatus and artic...

Solvent annealing of an organic planarization layer

Method of manufacturing semiconductor device

Identification of hot spots or defects by machine learning

Stabilized interfaces of inorganic radiation patterning composition...

Poly(cyanocinnamate)s for structural and optical applications

EUV metallic resist performance enhancement via additives

Compositions for removing photoresists and methods of manufacturing...

Optical assembly, method for deforming an optical element, and proj...

Fiber bundle based optical spot size selector

Lithography system and method thereof

Patents Applicationslast 30 patents

PHOTORESIST CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST...

PHOTOMASK DESIGN METHOD, SEMICONDUCTOR MANUFACTURING PROCESS, AND S...

IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...

APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS

SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...

TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS

ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...

Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN,...

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...

METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM

METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

SEMICONDUCTOR PROCESS APPARATUS

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY...

CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...

METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY

PELLICLE FOR EUV APPLICATIONS

ANTI-SLIP COMPOSITIONS AND COMPONENTS FOR SEMICONDUCTOR WAFER HANDL...

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

Composition For Forming Adhesive Film And Patterning Process

ALIGNMENT MARK AND METHOD

RESIN COMPOSITION