PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

CPC
G03F

Parent Industries

Current Industry

G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Sub Industries

G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof G03F3/00Colour separation Correction of tonal value G03F5/00Screening processes Screens therefor G03F7/00Photomechanical G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatuses comprising films with free-standing region
- Patent number 12,291,447
- Issue date May 6, 2025
- Canatu Oy
- Bjørn Mikladal
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatuses for disposing of excess material of a photol...
- Patent number 12,292,680
- Issue date May 6, 2025
- Carl Zeiss SMT GmbH
- Michael Budach
- B08 - CLEANING
Information Patent Grant
Width adjustment of EUV radiation beam
- Patent number 12,292,687
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insert for a source chamber of an EUV radiation source
- Patent number 12,292,690
- Issue date May 6, 2025
- Carl Zeiss SMT GmbH
- Michael Hagg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and method
- Patent number 12,292,694
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,292,695
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing interferometer and dual self-referencing interfero...
- Patent number 12,292,697
- Issue date May 6, 2025
- ASML Holding N.V.
- Douglas C. Cappelli
- G01 - MEASURING TESTING
Information Patent Grant
Ion exposure method and apparatus
- Patent number 12,293,924
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation apparatus, computer-readable storage medium, evaluation...
- Patent number 12,293,505
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Fuma Kizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Curable composition, cured product, color filter, solid-state imagi...
- Patent number 12,292,683
- Issue date May 6, 2025
- FUJIFILM Corporation
- Junichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Herringbone microstructure surface pattern for flexographic printin...
- Patent number 12,292,688
- Issue date May 6, 2025
- Esko Software BV
- Wolfgang Sievers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photon upconversion nanocapsules for 3D printing and other applicat...
- Patent number 12,291,662
- Issue date May 6, 2025
- President and Fellows of Harvard College
- Daniel N. Congreve
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,292,686
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image stitching method for stitching product
- Patent number 12,292,692
- Issue date May 6, 2025
- Shanghai Huali Microelectronics Corporation
- Xiaobin Zhu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Evaluation method, substrate processing apparatus, manufacturing me...
- Patent number 12,292,368
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Masami Yonekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, imprint apparatus, and method of manufacturing article
- Patent number 12,292,681
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Naosuke Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion layer for multi-layer photoresist
- Patent number 12,292,684
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,292,685
- Issue date May 6, 2025
- SCREEN Holdings Co., Ltd.
- Jun Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkaline cleaning composition, cleaning method, and manufacturing m...
- Patent number 12,292,689
- Issue date May 6, 2025
- Daxin Materials Corporation
- Hui-yi Tang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Fluid purging system, projection system, illumination system, litho...
- Patent number 12,292,696
- Issue date May 6, 2025
- ASML Netherlands B.V.
- José Nilton Fonseca Junior
- G02 - OPTICS
Information Patent Grant
Hybrid droplet generator for extreme ultraviolet light sources in l...
- Patent number 12,295,088
- Issue date May 6, 2025
- ASML Netherlands B.V.
- Benjamin Andrew Sams
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and device for producing micro- and/or nanostructures
- Patent number 12,292,682
- Issue date May 6, 2025
- EV Group E. Thallner GmbH
- Anna Dudus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Data inspection for digital lithography for HVM using offline and i...
- Patent number 12,292,693
- Issue date May 6, 2025
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Damping arrangement for vibration damping of an element in an optic...
- Patent number 12,287,587
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Marwene Nefzi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method and apparatus for removing contamination
- Patent number 12,287,589
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, and methods thereof
- Patent number 12,287,591
- Issue date Apr 29, 2025
- ASML Netherlands B.V. & ASML Holding N.V.
- Arjan Johannes Anton Beukman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low-temperature direct growth method of multilayer graphene, pellic...
- Patent number 12,287,568
- Issue date Apr 29, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Fluid handling system, method and lithographic apparatus
- Patent number 12,287,580
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Cornelius Maria Rops
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Grant
Method for fabricating anti-reflective layer on quartz surface by u...
- Patent number 12,287,454
- Issue date Apr 29, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Lina Shi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MACHINE VISION SYSTEM UTILIZING AUTOFOCUS AND INSPECTION PROCESSES
- Publication number 20250146949
- Publication date May 8, 2025
- MITUTOYO CORPORATION
- Paul Gerard GLADNICK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROFLUIDIC DEVICES AND ASSOCIATED METHODS
- Publication number 20250145455
- Publication date May 8, 2025
- THE TEXAS A&M UNIVERSITY SYSTEM
- Arum Han
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR EXAMINING A BLANK OF A MICROLITHOGRAPHIC PHOTOMASK
- Publication number 20250147412
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Christof Baur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
- Publication number 20250147415
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Sunyoung LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250147416
- Publication date May 8, 2025
- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
- Myung-Gil KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
- Publication number 20250147429
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20250147435
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250147437
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...
- Publication number 20250149335
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEIGHT MEASUREMENT SENSOR
- Publication number 20250146806
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Mihaita POPINCIUC
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
- Publication number 20250147406
- Publication date May 8, 2025
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
- Publication number 20250147408
- Publication date May 8, 2025
- TEKSCEND PHOTOMASK CORP.
- Naoto YONEMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250147409
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Woo-Yong JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...
- Publication number 20250147417
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
- Publication number 20250147419
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Jungha CHAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Publication number 20250147424
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20250147428
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...
- Publication number 20250147433
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Tsung-Pao FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology in the Presence of CMOS Under Array (CUA) Structures Util...
- Publication number 20250147434
- Publication date May 8, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY
- Publication number 20250147436
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE RELIEF WAVEGUIDES WITH HIGH REFRACTIVE INDEX RESIST
- Publication number 20250147222
- Publication date May 8, 2025
- Magic Leap, Inc.
- Matthew C Traub
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250147405
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT
- Publication number 20250147430
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chih HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250147431
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...
- Publication number 20250147432
- Publication date May 8, 2025
- Resonac Corporation
- Tetsuya KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...
- Publication number 20250147439
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Han LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250147440
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING ARYLAMINE COMPOUND AND ELECTROPHOTOGRAPHIC PH...
- Publication number 20250145557
- Publication date May 8, 2025
- Canon Kabushiki Kaisha
- Naohiro Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method and System for Torsional Optical Manipulation to Remove Part...
- Publication number 20250149326
- Publication date May 8, 2025
- Chun-Jung Chiu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Apparatuses comprising films with free-standing region

Method and apparatuses for disposing of excess material of a photol...

Width adjustment of EUV radiation beam

Insert for a source chamber of an EUV radiation source

Alignment mark and method

EUV wafer defect improvement and method of collecting nonconductive...

Self-referencing interferometer and dual self-referencing interfero...

Ion exposure method and apparatus

Evaluation apparatus, computer-readable storage medium, evaluation...

Curable composition, cured product, color filter, solid-state imagi...

Herringbone microstructure surface pattern for flexographic printin...

Photon upconversion nanocapsules for 3D printing and other applicat...

Semiconductor structure and manufacturing method thereof

Image stitching method for stitching product

Evaluation method, substrate processing apparatus, manufacturing me...

Imprint method, imprint apparatus, and method of manufacturing article

Adhesion layer for multi-layer photoresist

Substrate processing apparatus

Alkaline cleaning composition, cleaning method, and manufacturing m...

Fluid purging system, projection system, illumination system, litho...

Hybrid droplet generator for extreme ultraviolet light sources in l...

Method and device for producing micro- and/or nanostructures

Data inspection for digital lithography for HVM using offline and i...

Method for controlling a lithographic apparatus and associated appa...

Damping arrangement for vibration damping of an element in an optic...

Method and apparatus for removing contamination

Lithographic apparatus, metrology systems, and methods thereof

Low-temperature direct growth method of multilayer graphene, pellic...

Fluid handling system, method and lithographic apparatus

Method for fabricating anti-reflective layer on quartz surface by u...

Patents Applicationslast 30 patents

MACHINE VISION SYSTEM UTILIZING AUTOFOCUS AND INSPECTION PROCESSES

MICROFLUIDIC DEVICES AND ASSOCIATED METHODS

METHOD FOR EXAMINING A BLANK OF A MICROLITHOGRAPHIC PHOTOMASK

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

PHOTORESIST COMPOSITION

DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD

METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...

HEIGHT MEASUREMENT SENSOR

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...

Metrology in the Presence of CMOS Under Array (CUA) Structures Util...

METHODS OF METROLOGY

SURFACE RELIEF WAVEGUIDES WITH HIGH REFRACTIVE INDEX RESIST

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...

CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

METHODS FOR PRODUCING ARYLAMINE COMPOUND AND ELECTROPHOTOGRAPHIC PH...

Method and System for Torsional Optical Manipulation to Remove Part...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...