applied to semiconductors

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CPC
G01N2021/3568

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GPHYSICS G01Measuring instruments G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

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G01N2021/3568applied to semiconductors

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of characterizing semiconductor materials
- Patent number 12,085,516
- Issue date Sep 10, 2024
- Aurora Solar Technologies (Canada) Inc.
- Hamidreza Ghoddami
- G01 - MEASURING TESTING
Information Patent Grant
Method for producing nitride semiconductor laminate, silicon semico...
- Patent number 11,946,874
- Issue date Apr 2, 2024
- Sumitomo Chemical Company, Limited
- Fumimasa Horikiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ metrology and process control
- Patent number 11,908,718
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring extremely low oxygen concentration in silicon...
- Patent number 11,754,497
- Issue date Sep 12, 2023
- Globalwafers Japan Co., Ltd
- Hiroyuki Saito
- G01 - MEASURING TESTING
Information Patent Grant
System and method to calibrate a plurality of wafer inspection syst...
- Patent number 11,703,459
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Michael Carcasi
- G01 - MEASURING TESTING
Information Patent Grant
Hybrid probe, physical property analysis apparatus including the sa...
- Patent number 11,680,898
- Issue date Jun 20, 2023
- Samsung Electronics Co., Ltd.
- Junbum Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection and metrology using broadband infrared radiation
- Patent number 11,662,646
- Issue date May 30, 2023
- KLA Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of properties of patterned photoresist
- Patent number 11,644,419
- Issue date May 9, 2023
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,626,330
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Yuji Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration method and terminal equipment of terahertz frequency ba...
- Patent number 11,385,175
- Issue date Jul 12, 2022
- THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Yibang Wang
- G01 - MEASURING TESTING
Information Patent Grant
In-situ metrology and process control
- Patent number 11,289,352
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- G01 - MEASURING TESTING
Information Patent Grant
Multi-environment polarized infrared reflectometer for semiconducto...
- Patent number 11,231,362
- Issue date Jan 25, 2022
- KLA Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Passivation of nonlinear optical crystals
- Patent number 11,227,770
- Issue date Jan 18, 2022
- KLA Corporation
- Yung-Ho Alex Chuang
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus and method for biomolecular analysis
- Patent number 11,137,343
- Issue date Oct 5, 2021
- Trustees of Boston University
- M. Selim Ünlü
- G01 - MEASURING TESTING
Information Patent Grant
Detecting the cleanness of wafer after post-CMP cleaning
- Patent number 10,957,609
- Issue date Mar 23, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor metrology based on hyperspectral imaging
- Patent number 10,801,953
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing resistivity standard sample and method for...
- Patent number 10,720,366
- Issue date Jul 21, 2020
- Shin-Etsu Handotai Co., Ltd.
- Fumitaka Kume
- G01 - MEASURING TESTING
Information Patent Grant
Reflective detection method and reflectance detection apparatus
- Patent number 10,471,536
- Issue date Nov 12, 2019
- Disco Corporation
- Taiki Sawabe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System for measuring levels of radiation reflecting from semiconduc...
- Patent number 10,386,310
- Issue date Aug 20, 2019
- Aurora Solar Technologies (Canada) Inc.
- Stephen Warren Blaine
- G01 - MEASURING TESTING
Information Patent Grant
Method and assembly for determining the carbon content in silicon
- Patent number 10,317,338
- Issue date Jun 11, 2019
- Infineon Technologies AG
- Naveen Goud Ganagona
- G01 - MEASURING TESTING
Information Patent Grant
Passivation of nonlinear optical crystals
- Patent number 10,283,366
- Issue date May 7, 2019
- KLA-Tencor Corporation
- Yung-Ho Chuang
- C30 - CRYSTAL GROWTH
Information Patent Grant
Infrared spectroscopic reflectometer for measurement of high aspect...
- Patent number 10,215,693
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Determining oxidation of photoconductor members based on obtained s...
- Patent number 10,215,711
- Issue date Feb 26, 2019
- HP INDIGO B.V.
- Eviatar Golan
- G01 - MEASURING TESTING
Information Patent Grant
Detecting the cleanness of wafer after post-CMP cleaning
- Patent number 10,157,801
- Issue date Dec 18, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal crack detecting method and internal crack detecting apparatus
- Patent number 10,119,921
- Issue date Nov 6, 2018
- Disco Corporation
- Noboru Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quality evaluation method for silicon wafer, and silicon wafer and...
- Patent number 9,995,693
- Issue date Jun 12, 2018
- Sumco Corporation
- Jun Fujise
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon article inspection systems and methods
- Patent number 9,995,677
- Issue date Jun 12, 2018
- Sensors Unlimited, Inc.
- Curt Dvonch
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for extended infrared spectroscopic ellipsometry
- Patent number 9,921,152
- Issue date Mar 20, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Thickness determination and layer characterization using terahertz...
- Patent number 9,909,986
- Issue date Mar 6, 2018
- Applied Research and Photonics, Inc.
- Anis Rahman
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Passivation of nonlinear optical crystals
- Patent number 9,459,215
- Issue date Oct 4, 2016
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250003874
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Yuji OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT APPARATUS AND ACCURATE TEMPERATURE MEASUREMENT METHO...
- Publication number 20240426746
- Publication date Dec 26, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Wenyan WANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR MEASURING ETCHING AMOUNT, AND MEASUREMENT SYSTEM THEREFOR
- Publication number 20240328776
- Publication date Oct 3, 2024
- KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Tadaaki KANEKO
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240321650
- Publication date Sep 26, 2024
- Tokyo Electron Limited
- Yuji OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SENSING MODULE, SYSTEM AND METHOD FOR OPERATING OPTICAL SEN...
- Publication number 20240219235
- Publication date Jul 4, 2024
- LITE-ON SINGAPORE PTE. LTD.
- LAY-THANT KO
- G01 - MEASURING TESTING
Information Patent Application
ULTRAFAST LASER IMAGING WITH BOX LOCK-IN
- Publication number 20240210314
- Publication date Jun 27, 2024
- MONSTR Sense Technologies, LLC
- Eric W. Martin
- G01 - MEASURING TESTING
Information Patent Application
Phase-Resolved Optical Metrology for Substrates
- Publication number 20240201077
- Publication date Jun 20, 2024
- Nedal SALEH
- G01 - MEASURING TESTING
Information Patent Application
Structure of thermal stress release of photo-excited thermal infrar...
- Publication number 20230273123
- Publication date Aug 31, 2023
- Godsmith Microelectronics Inc.
- Jin-Shown SHIE
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL APPARATUS AND SOLID IMMERSION LENS
- Publication number 20220221705
- Publication date Jul 14, 2022
- HAMAMATSU PHOTONICS K. K.
- Soh UENOYAMA
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY
- Publication number 20220187718
- Publication date Jun 16, 2022
- KLA Corporation
- Franz Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
In-Situ Metrology And Process Control
- Publication number 20220181179
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR MEASURING EXTREMELY LOW OXYGEN CONCENTRATION IN SILICON...
- Publication number 20220018761
- Publication date Jan 20, 2022
- GlobalWafers Japan Co., Ltd.
- Hiroyuki SAITO
- G01 - MEASURING TESTING
Information Patent Application
HYBRID PROBE, PHYSICAL PROPERTY ANALYSIS APPARATUS INCLUDING THE SA...
- Publication number 20220011225
- Publication date Jan 13, 2022
- Samsung Electronics Co., Ltd.
- Junbum PARK
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LAMINATE, NITRIDE SE...
- Publication number 20210215621
- Publication date Jul 15, 2021
- SCIOCS COMPANY LIMITED
- Fumimasa HORIKIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION METHOD AND TERMINAL EQUIPMENT OF TERAHERTZ FREQUENCY BA...
- Publication number 20210181102
- Publication date Jun 17, 2021
- THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Yibang Wang
- G01 - MEASURING TESTING
Information Patent Application
In-Situ Metrology And Process Control
- Publication number 20200335369
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Metrology Based On Hyperspectral Imaging
- Publication number 20200225151
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL
- Publication number 20200096675
- Publication date Mar 26, 2020
- VIAVI Solutions Inc.
- Georg OCKENFUSS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Passivation of Nonlinear Optical Crystals
- Publication number 20190198330
- Publication date Jun 27, 2019
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Infrared Spectroscopic Reflectometer For Measurement Of High Aspect...
- Publication number 20180088040
- Publication date Mar 29, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
SILICON ARTICLE INSPECTION SYSTEMS AND METHODS
- Publication number 20180067042
- Publication date Mar 8, 2018
- Sensors Unlimited, Inc.
- Curt Dvonch
- G01 - MEASURING TESTING
Information Patent Application
INTERNAL CRACK DETECTING METHOD AND INTERNAL CRACK DETECTING APPARATUS
- Publication number 20170370856
- Publication date Dec 28, 2017
- Disco Corporation
- Noboru Takeda
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL
- Publication number 20170356841
- Publication date Dec 14, 2017
- Viavi Solutions Inc.
- Georg OCKENFUSS
- G02 - OPTICS
Information Patent Application
Systems And Methods For Extended Infrared Spectroscopic Ellipsometry
- Publication number 20170205342
- Publication date Jul 20, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Detecting the Cleanness of Wafer After Post-CMP Cleaning
- Publication number 20170194217
- Publication date Jul 6, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting Yen
- G01 - MEASURING TESTING
Information Patent Application
THICKNESS DETERMINATION AND LAYER CHARACTERIZATION USING TERAHERTZ...
- Publication number 20150316475
- Publication date Nov 5, 2015
- Applied Research and Photonics, Inc.
- Anis Rahman
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ANALYZING NITRIDE SEMICONDUCTOR LAYER AND METHOD OF MANUF...
- Publication number 20140055783
- Publication date Feb 27, 2014
- Covalent Materials Corporation
- Yoshihata YANASE
- G01 - MEASURING TESTING
Information Patent Application
HYDROGEN PASSIVATION OF NONLINEAR OPTICAL CRYSTALS
- Publication number 20130088706
- Publication date Apr 11, 2013
- KLA-Tencor Corporation
- Yung-Ho Chuang
- C30 - CRYSTAL GROWTH
Information Patent Application
APPARATUS AND METHOD FOR MEASURING SEMICONDUCTOR CARRIER LIFETIME
- Publication number 20120203473
- Publication date Aug 9, 2012
- KOBELCO RESEARCH INSTITUTE, INC.
- Kazushi Hayashi
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR THE DETERMINATION OF IMPURITIES IN SILICON
- Publication number 20120111263
- Publication date May 10, 2012
- WACKER CHEMIE AG
- Kurt BONAUER-KLEPP
- C30 - CRYSTAL GROWTH

applied to semiconductors

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods of characterizing semiconductor materials

Method for producing nitride semiconductor laminate, silicon semico...

In-situ metrology and process control

Method for measuring extremely low oxygen concentration in silicon...

System and method to calibrate a plurality of wafer inspection syst...

Hybrid probe, physical property analysis apparatus including the sa...

Inspection and metrology using broadband infrared radiation

Measurement of properties of patterned photoresist

Film forming method and film forming apparatus

Calibration method and terminal equipment of terahertz frequency ba...

In-situ metrology and process control

Multi-environment polarized infrared reflectometer for semiconducto...

Passivation of nonlinear optical crystals

Apparatus and method for biomolecular analysis

Detecting the cleanness of wafer after post-CMP cleaning

Semiconductor metrology based on hyperspectral imaging

Method for manufacturing resistivity standard sample and method for...

Reflective detection method and reflectance detection apparatus

System for measuring levels of radiation reflecting from semiconduc...

Method and assembly for determining the carbon content in silicon

Passivation of nonlinear optical crystals

Infrared spectroscopic reflectometer for measurement of high aspect...

Determining oxidation of photoconductor members based on obtained s...

Detecting the cleanness of wafer after post-CMP cleaning

Internal crack detecting method and internal crack detecting apparatus

Quality evaluation method for silicon wafer, and silicon wafer and...

Silicon article inspection systems and methods

Systems and methods for extended infrared spectroscopic ellipsometry

Thickness determination and layer characterization using terahertz...

Passivation of nonlinear optical crystals

Patents Applicationslast 30 patents

MEASUREMENT METHOD AND SUBSTRATE PROCESSING APPARATUS

HEAT TREATMENT APPARATUS AND ACCURATE TEMPERATURE MEASUREMENT METHO...

METHOD FOR MEASURING ETCHING AMOUNT, AND MEASUREMENT SYSTEM THEREFOR

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

OPTICAL SENSING MODULE, SYSTEM AND METHOD FOR OPERATING OPTICAL SEN...

ULTRAFAST LASER IMAGING WITH BOX LOCK-IN

Phase-Resolved Optical Metrology for Substrates

Structure of thermal stress release of photo-excited thermal infrar...

OPTICAL APPARATUS AND SOLID IMMERSION LENS

SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY

In-Situ Metrology And Process Control

METHOD FOR MEASURING EXTREMELY LOW OXYGEN CONCENTRATION IN SILICON...

HYBRID PROBE, PHYSICAL PROPERTY ANALYSIS APPARATUS INCLUDING THE SA...

METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LAMINATE, NITRIDE SE...

CALIBRATION METHOD AND TERMINAL EQUIPMENT OF TERAHERTZ FREQUENCY BA...

In-Situ Metrology And Process Control

Semiconductor Metrology Based On Hyperspectral Imaging

OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL

Passivation of Nonlinear Optical Crystals

Infrared Spectroscopic Reflectometer For Measurement Of High Aspect...

SILICON ARTICLE INSPECTION SYSTEMS AND METHODS

INTERNAL CRACK DETECTING METHOD AND INTERNAL CRACK DETECTING APPARATUS

OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL

Systems And Methods For Extended Infrared Spectroscopic Ellipsometry

Detecting the Cleanness of Wafer After Post-CMP Cleaning

THICKNESS DETERMINATION AND LAYER CHARACTERIZATION USING TERAHERTZ...

METHOD OF ANALYZING NITRIDE SEMICONDUCTOR LAYER AND METHOD OF MANUF...

HYDROGEN PASSIVATION OF NONLINEAR OPTICAL CRYSTALS

APPARATUS AND METHOD FOR MEASURING SEMICONDUCTOR CARRIER LIFETIME

METHOD FOR THE DETERMINATION OF IMPURITIES IN SILICON