Arrangement for selecting ions or species in the plasma

Industry

CPC
H01J37/32422

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32422Arrangement for selecting ions or species in the plasma

Industries

Patents Grantslast 30 patents

Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Wafer bonding apparatus and method
- Patent number 12,211,820
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact low angle ion beam extraction assembly and processing appar...
- Patent number 12,191,117
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,176,185
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead assembly with heated showerhead
- Patent number 12,170,186
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method using potential control of grid and substrate
- Patent number 12,148,626
- Issue date Nov 19, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 12,136,542
- Issue date Nov 5, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam source, surface processing apparatus and surf...
- Patent number 12,125,664
- Issue date Oct 22, 2024
- Oxford Instruments Nanotechnology Tools Limited
- David Pearson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching apparatus and method
- Patent number 12,087,558
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,051,566
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,033,832
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 12,014,904
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated showerhead with thermal control for delivering radical a...
- Patent number 12,000,047
- Issue date Jun 4, 2024
- Lam Research Corporation
- Rachel E. Batzer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and apparatus for chemical vapour deposition
- Patent number 11,970,765
- Issue date Apr 30, 2024
- Ionautics AB
- Henrik Pedersen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 11,955,319
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 11,908,668
- Issue date Feb 20, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,887,817
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods using an inline surface engineering source
- Patent number 11,862,433
- Issue date Jan 2, 2024
- Varlan Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion filter using aperture plate with plurality of zones
- Patent number 11,747,494
- Issue date Sep 5, 2023
- Plasma-Therm LLC
- Leslie Michael Lea
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,721,522
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for controlling radicals using a radical filter
- Patent number 11,721,530
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma pre-clean for selective gap fill
- Patent number 11,721,542
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Yi Xu
- B08 - CLEANING
Information Patent Grant
Plasma system and filter device
- Patent number 11,705,307
- Issue date Jul 18, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Peng Chen
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES
- Publication number 20250054740
- Publication date Feb 13, 2025
- Impedans Ltd
- Paul SCULLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20250046629
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...
- Publication number 20250046577
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Syam Parayil VENUGOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER
- Publication number 20250014868
- Publication date Jan 9, 2025
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Bonding Apparatus and Method
- Publication number 20240387451
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Etching Apparatus And Method
- Publication number 20240379333
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...
- Publication number 20240318312
- Publication date Sep 26, 2024
- LAM RESEARCH CORPORATION
- Rachel E. BATZER
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20240266147
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING IMPROVEMENT
- Publication number 20240266146
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20240249918
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240234093
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Sejin OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240203701
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Soonku Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING ATOMIC LAYER
- Publication number 20240177972
- Publication date May 30, 2024
- Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240145218
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE PLASMA CONTROL
- Publication number 20240120170
- Publication date Apr 11, 2024
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE B...
- Publication number 20240105425
- Publication date Mar 28, 2024
- Samsung Electronics Co., Ltd.
- Seungwan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System And Methods Using An Inline Surface Engineering Source
- Publication number 20240096602
- Publication date Mar 21, 2024
- Varian Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Bombardment with Ions having Targeted Mass using Pulsed B...
- Publication number 20240096600
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240096603
- Publication date Mar 21, 2024
- SEMES CO., LTD.
- Dong-Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240062991
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING WITH MATERIAL MODIFICATION AND REMOVAL
- Publication number 20240055270
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHODS FOR SILICON NANOSHEET SURFACES
- Publication number 20240055265
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...
- Publication number 20240038546
- Publication date Feb 1, 2024
- SHOWA DENKO K.K.
- Kazuma MATSUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Arrangement for selecting ions or species in the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Processing chamber with multiple plasma units

Ion beam source, substrate process apparatus including the same, an...

Systems and methods for metastable activated radical selective stri...

Wafer bonding apparatus and method

Compact low angle ion beam extraction assembly and processing appar...

Remote source pulsing with advanced pulse control

Apparatus and method for processing substrate using plasma

Showerhead assembly with heated showerhead

Atomic layer etch process using plasma in conjunction with a rapid...

Dry etching method using potential control of grid and substrate

Apparatus for ion energy analysis of plasma processes

Charged particle beam source, surface processing apparatus and surf...

Plasma processing apparatus and plasma processing method

Ion beam etching apparatus and method

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Wafer processing apparatus

Integrated showerhead with thermal control for delivering radical a...

Method and apparatus for chemical vapour deposition

Substrate processing system including dual ion filter for downstrea...

Processing chamber with multiple plasma units

Apparatus for ion energy analysis of plasma processes

Plasma processing apparatus and plasma processing method

System and methods using an inline surface engineering source

Ion beam source for optical device fabrication using a segmented io...

Ion filter using aperture plate with plurality of zones

Plasma processing method and plasma processing apparatus

System for controlling radicals using a radical filter

Dual plasma pre-clean for selective gap fill

Plasma system and filter device

Patents Applicationslast 30 patents

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES

ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...

ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

Wafer Bonding Apparatus and Method

Ion Beam Etching Apparatus And Method

ION BEAM ETCH SYSTEM AND METHOD

Apparatus and Methods for Plasma Processing

INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

PLASMA PROCESSING IMPROVEMENT

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

Processing Chamber With Multiple Plasma Units

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR ETCHING ATOMIC LAYER

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HIGH VOLTAGE PLASMA CONTROL

SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE B...

System And Methods Using An Inline Surface Engineering Source

Substrate Bombardment with Ions having Targeted Mass using Pulsed B...

APPARATUS FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING WITH MATERIAL MODIFICATION AND REMOVAL

TREATMENT METHODS FOR SILICON NANOSHEET SURFACES

PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...