Associated circuits

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CPC
H01J37/3444

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3444Associated circuits

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 12,217,949
- Issue date Feb 4, 2025
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed power module with pulse and ion flux control for magnetron s...
- Patent number 12,211,680
- Issue date Jan 28, 2025
- Starfire Industries LLC
- David N. Ruzic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Connection of high-performance pulse discharge plasma generator, es...
- Patent number 12,051,578
- Issue date Jul 30, 2024
- Slovenka Technicka Univerzita V. Bratilasve
- Roman Sykora
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,932,932
- Issue date Mar 19, 2024
- Alluxa, Inc.
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,881,382
- Issue date Jan 23, 2024
- Semes Co., Ltd.
- Jun Pyo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering a layer on a substrate using a high-energy density plasm...
- Patent number 11,823,859
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atmospheric cold plasma jet coating and surface treatment
- Patent number 11,560,627
- Issue date Jan 24, 2023
- Starfire Industries LLC
- Brian Edward Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,479,847
- Issue date Oct 25, 2022
- Alluxa, Inc.
- Michael A. Scobey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film-deposition equipment for detecting shielding mechanism
- Patent number 11,482,403
- Issue date Oct 25, 2022
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive sputtering with HIPIMS
- Patent number 11,380,530
- Issue date Jul 5, 2022
- EVATEC AG
- Juergen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrical transfer in an endblock for a sputter device
- Patent number 11,367,596
- Issue date Jun 21, 2022
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,348,770
- Issue date May 31, 2022
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling ion energy distribution using a pulse generator
- Patent number 11,284,500
- Issue date Mar 22, 2022
- APPLIED MATERIALS, INC.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc suppression and pulsing in high power impulse magnetron sputter...
- Patent number 11,211,234
- Issue date Dec 28, 2021
- EVATEC AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for depositing material on the surface of a substrate
- Patent number 11,193,201
- Issue date Dec 7, 2021
- Deutsches Elektronen-Synchrotron DESY
- Kai Schlage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and sputtering method
- Patent number 11,094,515
- Issue date Aug 17, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Daisuke Suetsugu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,324
- Issue date Aug 3, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,323
- Issue date Aug 3, 2021
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed power module with pulse and ion flux control for magnetron s...
- Patent number 11,069,515
- Issue date Jul 20, 2021
- Starfire Industries LLC
- David N. Ruzic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 11,049,702
- Issue date Jun 29, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power supply circuit and method of operation thereof
- Patent number 11,011,989
- Issue date May 18, 2021
- Delta Electronics, Inc.
- Wei-Hsun Lai
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Sputtering arrangement and sputtering method for optimized distribu...
- Patent number 10,943,774
- Issue date Mar 9, 2021
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Siegfried Krassnitzer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 10,910,203
- Issue date Feb 2, 2021
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
AC power connector, sputtering apparatus and method therefor
- Patent number 10,818,475
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Frank Schnappenberger
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,791,617
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual power feed rotary sputtering cathode
- Patent number 10,699,885
- Issue date Jun 30, 2020
- Buhler AG
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF substrate bias with high power impulse magnetron sputtering (HIP...
- Patent number 10,692,707
- Issue date Jun 23, 2020
- EVATEC AG
- Jürgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition with isotropic neutral and non-isotropic...
- Patent number 10,648,074
- Issue date May 12, 2020
- Applied Materials, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering system and method including an arc detection
- Patent number 10,607,821
- Issue date Mar 31, 2020
- MKS Insturments, Inc.
- Jesse N. Klein
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESS APPARATUS
- Publication number 20240212980
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Jaesuk KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD CONTROL SYSTEM
- Publication number 20230282455
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- Alecia Chantalle Griffin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sputtering System with a Plurality of Cathode Assemblies
- Publication number 20230133160
- Publication date May 4, 2023
- Alluxa, Inc.
- Michael A. Scobey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONNECTION OF HIGH-PERFORMANCE PULSE DISCHARGE PLASMA GENERATOR, ES...
- Publication number 20230124940
- Publication date Apr 20, 2023
- Slovenka Technicka Univerzita V. Bratilasve
- Roman Sykora
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220384165
- Publication date Dec 1, 2022
- Mengxue WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SPUTTER DEPOSITION
- Publication number 20220277940
- Publication date Sep 1, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210351022
- Publication date Nov 11, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...
- Publication number 20210343513
- Publication date Nov 4, 2021
- Starfire Industries LLC
- David N. Ruzic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual Reverse Pulse Sputtering System
- Publication number 20210287888
- Publication date Sep 16, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RATE ENHANCED PULSED DC SPUTTERING SYSTEM
- Publication number 20210111010
- Publication date Apr 15, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210082674
- Publication date Mar 18, 2021
- Keihin Ramtech Co., Ltd.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20210013008
- Publication date Jan 14, 2021
- SEMES CO., LTD.
- Jun Pyo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210005438
- Publication date Jan 7, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY CIRCUIT AND METHOD OF OPERATION THEREOF
- Publication number 20200412244
- Publication date Dec 31, 2020
- Delta Electronics, Inc.
- Wei-Hsun LAI
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR
- Publication number 20200352017
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL POWER FEED ROTARY SPUTTERING CATHODE
- Publication number 20200266038
- Publication date Aug 20, 2020
- Buhler AG
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20200243311
- Publication date Jul 30, 2020
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20200154556
- Publication date May 14, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM
- Publication number 20200066494
- Publication date Feb 27, 2020
- FUJIFILM CORPORATION
- Naoki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus For Depositing Material On The Surface Of A Substrate
- Publication number 20190390327
- Publication date Dec 26, 2019
- DEUTSCHES ELEKTRONEN-SYNCHROTRON DESY
- Kai SCHLAGE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20190350072
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION WITH ISOTROPIC NEUTRAL AND NON-ISOTROPIC...
- Publication number 20190338411
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20190333745
- Publication date Oct 31, 2019
- Keihin Ramtech Co., Ltd.
- Hiroshi IWATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICAL TRANSFER IN AN ENDBLOCK FOR A SPUTTER DEVICE
- Publication number 20190237306
- Publication date Aug 1, 2019
- Soleras Advanced Coatings bvba
- Ivan VAN DE PUTTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...
- Publication number 20180358213
- Publication date Dec 13, 2018
- Starfire Industries LLC
- David N. Ruzic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT
- Publication number 20180342379
- Publication date Nov 29, 2018
- Starfire Industries LLC
- Brian Edward Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Arrangement and Sputtering Method for Optimized Distribu...
- Publication number 20180330931
- Publication date Nov 15, 2018
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Siegfried Krassnitzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE SPUTTERING
- Publication number 20180261428
- Publication date Sep 13, 2018
- GENCOA LTD
- Victor Bellido-Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rate Enhanced Pulsed DC Sputtering System
- Publication number 20180130648
- Publication date May 10, 2018
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Physical Vapor Deposition System with a Source of Isotropic Ion Vel...
- Publication number 20180119272
- Publication date May 3, 2018
- Applied Materials, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Associated circuits

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Magnetically enhanced high density plasma-chemical vapor deposition...

Pulsed power module with pulse and ion flux control for magnetron s...

Dual reverse pulse sputtering system

Connection of high-performance pulse discharge plasma generator, es...

Sputtering system with a plurality of cathode assemblies

Apparatus and method for treating substrate

Sputtering a layer on a substrate using a high-energy density plasm...

Atmospheric cold plasma jet coating and surface treatment

Sputtering system with a plurality of cathode assemblies

Thin-film-deposition equipment for detecting shielding mechanism

Reactive sputtering with HIPIMS

Electrical transfer in an endblock for a sputter device

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Method of controlling ion energy distribution using a pulse generator

Arc suppression and pulsing in high power impulse magnetron sputter...

Apparatus for depositing material on the surface of a substrate

Sputtering apparatus and sputtering method

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Pulsed power module with pulse and ion flux control for magnetron s...

Rate enhanced pulsed DC sputtering system

Power supply circuit and method of operation thereof

Sputtering arrangement and sputtering method for optimized distribu...

Rate enhanced pulsed DC sputtering system

AC power connector, sputtering apparatus and method therefor

Method of controlling ion energy distribution using a pulse generat...

Dual power feed rotary sputtering cathode

RF substrate bias with high power impulse magnetron sputtering (HIP...

Physical vapor deposition with isotropic neutral and non-isotropic...

Sputtering system and method including an arc detection

Patents Applicationslast 30 patents

PLASMA PROCESS APPARATUS

MAGNETIC FIELD CONTROL SYSTEM

Sputtering System with a Plurality of Cathode Assemblies

CONNECTION OF HIGH-PERFORMANCE PULSE DISCHARGE PLASMA GENERATOR, ES...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHOD AND APPARATUS FOR SPUTTER DEPOSITION

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...

Dual Reverse Pulse Sputtering System

RATE ENHANCED PULSED DC SPUTTERING SYSTEM

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

POWER SUPPLY CIRCUIT AND METHOD OF OPERATION THEREOF

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR

DUAL POWER FEED ROTARY SPUTTERING CATHODE

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM

Apparatus For Depositing Material On The Surface Of A Substrate

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

PHYSICAL VAPOR DEPOSITION WITH ISOTROPIC NEUTRAL AND NON-ISOTROPIC...

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

ELECTRICAL TRANSFER IN AN ENDBLOCK FOR A SPUTTER DEVICE

PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...

ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT

Sputtering Arrangement and Sputtering Method for Optimized Distribu...

ION SOURCE SPUTTERING

Rate Enhanced Pulsed DC Sputtering System

Physical Vapor Deposition System with a Source of Isotropic Ion Vel...